大尺寸全息光栅曝光中条纹平移和周期的锁定
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摘要
采用双光束干涉曝光法制作大尺寸全息光栅时,由于温度变化、空气流动、振动等因素的干扰,曝光条纹相对于光栅基板存在平移和周期变化,从而造成光栅对比度下降。分析了大尺寸光栅曝光过程中条纹的动态变化情况,结果表明:3h内条纹平移和周期变化的均方根值分别为1.87、1.20个条纹周期,对比度的数值模拟结果分别为12.83%、67.37%.构建了由三组条纹监视系统、计算控制系统和两组压电位移台组成的曝光条纹锁定系统,实现了条纹平移和周期的同时锁定.锁定之后得到的光栅槽型和对比度明显优于未锁定时的情形,锁定精度为:平移3σ值为0.009个条纹周期,对比度为99.99%,周期变化均方根值为0.017个条纹周期,对比度为99.77%,满足大尺寸光栅曝光对条纹稳定性的要求.
The position and period of grating fringes will vary against the substrate during double beam interference exposure due to temperature variation,air flow,vibration and other factors in the fabrication of large-size holographic gratings.It will result in the decrease of grating contrast.The dynamic change of fringes was analyzed during large-size grating exposure.The Root-Mean-Square(RMS)errors of fringe translation and period in 3 hours are 1.87 and 1.20 period respectively.The corresponding simulative grating contrasts are 12.83% and 67.37% respectively.A fringe locking system composed of three monitoring subsystems,a computation and control subsystem and two piezo nanopositioners was set up.The translation and period of fringes can be locked at the same time.The groove shape and contrast of gratings are improved significantly after locking.The precision of this fringe locking system:the 3σ value of fringe translation and corresponding contrast are 0.009 period and 99.99% respectively;the RMS error of period change and corresponding contrast are 0.017 period and 99.77% respectively.This locking system satisfies the requirements of fringe stability for the exposure of large-size gratings.
The position and period of grating fringes will vary against the substrate during double beam interference exposure due to temperature variation,air flow,vibration and other factors in the fabrication of large-size holographic gratings.It will result in the decrease of grating contrast.The dynamic change of fringes was analyzed during large-size grating exposure.The Root-Mean-Square(RMS)errors of fringe translation and period in 3 hours are 1.87 and 1.20 period respectively.The corresponding simulative grating contrasts are 12.83% and 67.37% respectively.A fringe locking system composed of three monitoring subsystems,a computation and control subsystem and two piezo nanopositioners was set up.The translation and period of fringes can be locked at the same time.The groove shape and contrast of gratings are improved significantly after locking.The precision of this fringe locking system:the 3σ value of fringe translation and corresponding contrast are 0.009 period and 99.99% respectively;the RMS error of period change and corresponding contrast are 0.017 period and 99.77% respectively.This locking system satisfies the requirements of fringe stability for the exposure of large-size gratings.
引文
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[6]LU Sen,YANG Kai-ming,ZHU Yu,et al.Effect of period setting value on printed phase in scanning beam interference lithography system[J].Acta Photonica Sinica,2017,46(1):0123001.鲁森,杨开明,朱煜,等.干涉条纹相位锁定系统分析及其控制[J].光子学报,2017,46(1):0123001.
[7]SONG Ying,Bayanheshig,QI Xiang-dong,et al.Design of frequency-shift interference fringe locking system in holographic grating exposure[J].Optics and Precision Engineering,2014,22(2):318-324.宋莹,巴音贺希格,齐向东,等.移频式全息光栅曝光干涉条纹锁定系统的设计[J].光学精密工程,2014,22(2):318-324.
[8]LI Chao-ming,CHEN Xin-rong,WU Jian-hong,et al.Research and development of a stabilizing holographic interference fringe system based on linear CCD[C].SPIE,2009,7384:73840C-73840C-6.
[9]李晓阳.大口径全息干涉光场稳定性研究[D].苏州大学,2016.
[10]WANG Lei-jie,ZHANG Ming,LU Sen,et al.Ultra-precision control of homodyne frequency-shifting interference pattern phase locking system[J].Optics and Precision Engineering,2017,25(5):1213-1221.王磊杰,张鸣,鲁森,等.零差移频式干涉图形相位锁定系统的超精密控制[J].光学精密工程,2017,25(5):1213-1221.
[11]YOUNG P P,PRIAMBODO P S,MALDONADO T A,et al.Simple interferometric fringe stabilization by chargecoupled-device-based feedback control[J].Applied Optics,2006,45(19):4563.
[12]GUEST C C,GAYLORD T K.Phase stabilization system for holographic optical data processing[J].Applied Optics,1985,24(14):2140.
[13]WANG Li,LU Bing-heng,DING Yu-cheng,et al.A novel two-step alignment technique for imprint lithography[J].Acta Photonica Sinica,2006,35(10):1608-1612.王莉,卢秉恒,丁玉成,等.压印光刻中的两步对正技术[J].光子学报,2006,35(10):1608-1612.
[14]SONG Ying,ZHAO Xu-long,JIANG Yan-xiu,et al.Design of frequency-shift interference fringe locking system in holographic grating exposure[J].Chinese Journal of Lasers,2017,44(5):1-16.宋莹,赵旭龙,姜岩秀,等.移栅型全息光栅曝光干涉条纹锁定[J].中国激光,2017,44(5):1-16.
[15]LIU Zhen,LI Sheng,FENG Chang.Laser stripe center extraction based on cross-correlation algorithm[J].Chinese Journal of Lasers,2013,40(5):202-207.刘振,李声,冯常.基于互相关算法的激光条纹中心提取[J].中国激光,2013,40(5):202-207.