抑制零级串扰的光栅横向剪切干涉测量
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摘要
为降低传统光栅横向剪切干涉仪中双方孔空间滤波器带来的加工和装调难度,设计了一种基于9步式零级相位误差标定的光栅横向剪切干涉测量方法,只需采用可变空间滤波器即可抑制零级串扰对相移相位复原的影响。针对数值孔径为0.125的投影光刻物镜,完成了参数设计和原理验证系统的搭建。通过剪切相位复原和波前重构,实现了该物镜的波像差检测。结果表明:其波像差小于20.32nm。最后对该光栅横向剪切干涉仪进行重复精度实验,其重复精度的方均根值为0.1303nm,系统性能良好。
In order to reduce the difficulties in manufacture and assembly of the spatial filter with two square windows in image plane,we propose a grating lateral shearing interferometry based on a nine step phase shifting method,which is used to calibrate the zero-order phase error.The zero-order crosstalk could be eliminated only by a variable space filter.The parameters are designed and the principle verification system is completed for a projection lithography lens with numerical aperture of 0.125.Then the wavefront aberration measurement of this lens is achieved by the restoration of shearing phase and the reconstruction of wavefront.The results show that the wavefront aberration is less than 20.32 nm.The repeatability precision of the grating lateral shearing interferometer is measured.The root-mean-square value of the repeatability precision is 0.1303 nm,which shows the performance of this system is well.
In order to reduce the difficulties in manufacture and assembly of the spatial filter with two square windows in image plane,we propose a grating lateral shearing interferometry based on a nine step phase shifting method,which is used to calibrate the zero-order phase error.The zero-order crosstalk could be eliminated only by a variable space filter.The parameters are designed and the principle verification system is completed for a projection lithography lens with numerical aperture of 0.125.Then the wavefront aberration measurement of this lens is achieved by the restoration of shearing phase and the reconstruction of wavefront.The results show that the wavefront aberration is less than 20.32 nm.The repeatability precision of the grating lateral shearing interferometer is measured.The root-mean-square value of the repeatability precision is 0.1303 nm,which shows the performance of this system is well.
引文
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[2]Cai Y M,Wang X Z,Bu Y,et al.Optical design of Fourier transform lens for measurement of illumination pupil of lithography tools[J].Chinese Journal of Lasers,2015,42(4):0416001.蔡燕民,王向朝,步扬,等.光刻机照明光瞳测量用傅里叶变换物镜光学设计[J].中国激光,2015,42(4):0416001.
[3]Yao C C,Gong Y.Research on temperature distribution of deep ultraviolet lithographic projection objective[J].Chinese Journal of Lasers,2016,43(5):0516001.姚长呈,巩岩.深紫外光刻投影物镜温度特性研究[J].中国激光,2016,43(5):0516001.
[4]Xu M F,Pang W B,Xu X R,et al.Optical design of high-numerical aperture lithographic lenses[J].Optics and Precision Engineering,2016,24(4):740-746.徐明飞,庞武斌,徐象如,等.高数值孔径投影光刻物镜的光学设计[J].光学精密工程,2016,24(4):740-746.
[5]Zhu B E,Wang X Z,Li S K,et al.High-order aberration measurement method for hyper-NAlithographic projection lens[J].Acta Optica Sinica,2017,37(4):0412003.诸波尔,王向朝,李思坤,等.超高NA光刻投影物镜高阶波像差检测方法[J].光学学报,2017,37(4):0412003.
[6]Fang W,Tang F,Wang X Z,et al.Measurement of wavefront aberration of extreme ultraviolet lithographic projection lens based on Ptychography[J].Acta Optica Sinica,2016,36(10):1012002.方伟,唐锋,王向朝,等.基于Ptychography的极紫外光刻投影物镜波像差检测技术[J].光学学报,2016,36(10):1012002.
[7]Fang C,Xiang Y,Qi K Q,et al.An 11-frame phase shifting algorithm in lateral shearing interferometry[J].Optics Express,2013,21(23):28325-28333.
[8]Dai F,Li J,Wang X,et al.Exact two-dimensional zonal wavefront reconstruction with high spatial resolution in lateral shearing interferometry[J].Optics Communications,2016,367:264-273.
[9]Hasegawa M,Ouchi C,Hasegawa T,et al.Recent progress of EUV wave-front metrology in EUVA[C].SPIE,2004,5533:27-36.
[10]Hegeman P,Christmann X,Visser M,et al.Experimental study of a shearing interferometer concept for at-wavelength characterization of extremeultraviolet optics[J].Applied Optics,2001,40(25):4526-4533.
[11]Futterer G,Lano M,Lindelein N,etal.Lateral shearing interferometer for phase-shift mask measurement at 193nm[C].SPIE,2002,4691:541-551.
[12]Futterer G,Schwiderb J.Uncertainty analysis for phase measurement on PSM with a 193nm commonpath shearing interferometer[C].SPIE,2005,5858:321-333.
[13]Miyakawa R,Naulleau P.Extending shearing interferometry to high-NA for EUV optical testing[C].SPIE,2015,9422:94221J.
[14]Miyakawa R,Naulleau P.Lateral shearing interferometry for high-resolution EUV optical testing[C].SPIE,2011,7969:796939.
[15]Zhu Y,Sugisaki K,Ouchi C,et al.Lateral shearing interferometer for EUVL:theoretical analysis and experiment[C].SPIE,2004,5374:824-832.
[16]Hariharan P.Digital phase-stepping interferometry:effects of multiply reflected beams[J].Applied Optics,1987,26(13):2506-2507.