摘要
以4H-SiC为研究对象,在800℃下,用24keV的H~+和30keV的He~+分别进行H~+单束、He~+单束、先H~+后He~+双束和先He~+后H~+双束辐照,并利用原子力显微镜(AFM)研究辐照对4H-SiC表面形貌的影响.实验表明:H~+辐照的样品表面出现直径平均约为8μm的大凸起,He~+辐照的样品表面则产生了均匀的纳米尺寸的小凸起;H~+辐照在材料表面产生的大凸起在辐照He~+后消失;而He~+预辐照之后再进行H~+辐照,材料表面不会产生大的凸起,并结合X射线衍射(XRD)数据对这种氢氦协同效应进行了解释.结论表明,He~+预辐照对凸起的形成有抑制作用,He~+后辐照则对已产生的凸起有抛光作用.
Single and sequential irradiations of 24 keV H~+ and 30 keV He~+ were performed at 800 ℃ to investigate the effects of irradiations on surface topography of 4H-SiC by using atomic force microscope(AFM).The experimental results show that blisters with diameter of about 8μm were observed on H~+-irradiated specimen while blisters with uniform nano-scale sizes were found on He~+-irradiated one.Large blisters induced by H~+ pre-irradiation disappeared after He~+ post-irradiation,and no blister appeared after H~+ post-irradiation with He~+pre-irradiation.The mechanisms behind the complex synergistic phenomena between H and He are discussed by combing with X-ray diffraction(XRD)data.Thus,it indicates that He~+ pre-irradiation can inhibit H blisters formation,while He~+ post-irradiation can remove the blisters induced by H~+ pre-irradiation.
引文
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