聚焦离子束刻蚀制造三维软刻蚀母模板的研究
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摘要
研究了一种基于聚焦离子束(FIB)刻蚀法制备软刻蚀用母模板的新方法。该方法采用FIB刻蚀技术在Si基底上制备出15μm×15μm的轮廓清晰的三维结构作为弹性印章的母模板,三甲基氯硅烷(TMCS)作为抗黏连层旋涂于Si基底表面,其后旋涂聚二甲基硅氧烷(PDMS)预聚物复制模铸出与Si基底相反的微三维结构。通过接触角测量仪检测Si样品表面疏水性能,并用原子力显微镜(AFM)对PDMS样品形貌进行检测。研究结果表明,特征图形得到了很好的转移。该方法相对于传统软刻蚀母模板制备方法,加工的三维结构具有操作步骤简单、制备周期短的特点,是一种有效的制备软刻蚀母模板方法。
In this research,we used a new method based on focused ion beam( FIB) etching to fabricate master mold for soft lithography. Three- dimensional structures with an area of 15 μm × 15 μm as the master of elastic stamps were successfully fabricated on the silicon substrate by FIB etching. Trimethyl chlorosilane( TMCS) as an anti- adhesion layer was spin coated on the silicon substrate,and polydimethylsiloxane( PDMS) prepolymer was spin coated on the TMCS and then replicated the adverse of the micro three- dimensional structures of Si specimen. The surface hydrophobic performance of Si specimen was tested by the contact angel measurement instrument and the morphology of PDMS sample surface was tested by atomic force microscope( AFM). The results show that the feature structures were transferred effectively. Compared with other traditional methods,the operating procedure of the method was simpler and shorter preparation period,it was an effective method of preparation of master mold for soft lithography.
In this research,we used a new method based on focused ion beam( FIB) etching to fabricate master mold for soft lithography. Three- dimensional structures with an area of 15 μm × 15 μm as the master of elastic stamps were successfully fabricated on the silicon substrate by FIB etching. Trimethyl chlorosilane( TMCS) as an anti- adhesion layer was spin coated on the silicon substrate,and polydimethylsiloxane( PDMS) prepolymer was spin coated on the TMCS and then replicated the adverse of the micro three- dimensional structures of Si specimen. The surface hydrophobic performance of Si specimen was tested by the contact angel measurement instrument and the morphology of PDMS sample surface was tested by atomic force microscope( AFM). The results show that the feature structures were transferred effectively. Compared with other traditional methods,the operating procedure of the method was simpler and shorter preparation period,it was an effective method of preparation of master mold for soft lithography.
引文
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[12]徐临燕,栗大超,胡小唐,等.基于弯曲测试的纳米结构机械力学特性的表征[J].传感技术学报,2006,19(5):1493-1497.
[13]黄成龙,张继成,刁凯迪,等.单级衍射量子点阵光栅的聚焦离子束直写法制备及光学性能检测[J].物理学报,2014,63(1):018101-1~018101-5.
[14]LEE N,CHOI S,KANG S.Self-assembled monolayer as an antiadhesion layer on a nickel nanostamper in the nanoreplication precess for optoelectronic applications[J].Appl Phys.Lett.,2006,88(7):073101(1-3).
[15]赵高扬,郅晓,常慧丽.玻璃表面超疏水性薄膜的制备[J].功能材料,2007,6(38):1034-1037.
[16]ERBIL H Y,DEMIREL A L,AVCI Y,et al.Transformation of a simple plastic into a superhydrophobic surface[J].Science,2003,299:1377-1380.
[2]马文哲,桑胜波,胡杰,等.聚二甲基硅氧烷薄膜的衬底硅烷化及测试分析[J].现代化工,2013,33(9):142-146.
[3]刘长春,崔大付,赵强,等.基于MEMS技术的PDMS电泳微芯片的研制[J].微细加工技术,2004,3(1):58-62.
[4]赵小力.基于PDMS的自组装及转移印刷制备微结构的研究[D].哈尔滨:哈尔滨工业大学博士学位论文,2007.
[5]卢文娟,张玉林,孔祥东,等.电子束光刻制造软刻蚀用母板的研究[J].光电子·激光,2007,18(7):788-792.
[6]唐海林,丁元萍.聚合物弹性印章的制作工艺[J].纳米技术与精密工程,2008,6(2):118-121.
[7]LEE J N,PARK C,WHITESIDES G M.Solvent compatibility of poly(dimethylsiloxane)-based microfluidic devices[J]Anal.Chem.,2003,75(23):6544-6554.
[8]KOO N,BENDER M,PLACHETKA U,et al.Improved mold fabrication for the definition of high quality nanopatterns by Soft UV-Nanoimprint lithography using diluted PDMS material[J].Microelectronic Engineering,2007,84(5-8):904-908.
[9]BYUN I,PARK J,KIM J,et al.Fabrication of PDMS Nano-stamp by replicating Si Nano-moulds fabricated by interference lithography[J].Key Engineering Materials,2012,516(25):25-29.
[10]CON C,CUI Bo.Effect of mold treatment by solvent on PDMS molding into nanoholes[J].Nanoscale Research Letters,2013,8(1):394-400.
[11]刘首鹏,周锋,金爱子,等.人工裁剪制备石墨纳米结构[J].物理学报,2005,54(9):4251-4256.
[12]徐临燕,栗大超,胡小唐,等.基于弯曲测试的纳米结构机械力学特性的表征[J].传感技术学报,2006,19(5):1493-1497.
[13]黄成龙,张继成,刁凯迪,等.单级衍射量子点阵光栅的聚焦离子束直写法制备及光学性能检测[J].物理学报,2014,63(1):018101-1~018101-5.
[14]LEE N,CHOI S,KANG S.Self-assembled monolayer as an antiadhesion layer on a nickel nanostamper in the nanoreplication precess for optoelectronic applications[J].Appl Phys.Lett.,2006,88(7):073101(1-3).
[15]赵高扬,郅晓,常慧丽.玻璃表面超疏水性薄膜的制备[J].功能材料,2007,6(38):1034-1037.
[16]ERBIL H Y,DEMIREL A L,AVCI Y,et al.Transformation of a simple plastic into a superhydrophobic surface[J].Science,2003,299:1377-1380.