光固化微压印制作微结构阵列成型工艺
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  • 英文篇名:Fabrication of Microstructure Array by UV Curing Microimprint Lithography
  • 作者:赵长松 ; 贺建芸 ; 李嘉维 ; 张景慧 ; 佟金戈 ; 谢鹏程
  • 英文作者:Zhao Changsong;He Jianyun;Li Jiawei;Zhang Jinghui;Tong Jinge;Xie Pengcheng;College of Mechanical and Electrical Engineering, Beijing University of Chemical Technology;
  • 关键词:微结构阵列 ; 微压印 ; 光化学制造 ; 光敏材料 ; 紫外光固化
  • 英文关键词:Microstructure array;;Microimprint;;Photochemical fabrication;;Photosensitive material;;Ultraviolet-curing
  • 中文刊名:SLKJ
  • 英文刊名:Plastics Science and Technology
  • 机构:北京化工大学机电工程学院;
  • 出版日期:2019-01-03
  • 出版单位:塑料科技
  • 年:2019
  • 期:v.47;No.321
  • 基金:国家自然科学基金(51573017)
  • 语种:中文;
  • 页:SLKJ201901015
  • 页数:5
  • CN:01
  • ISSN:21-1145/TQ
  • 分类号:38-42
摘要
研究了一种光固化微压印制作微结构阵列的工艺。常温下,在自制的模板上涂覆自主研制的专用液态光敏材料,用自主研制的光固化微压印设备进行压印,同时通过紫外光照射固化成型,制备出两种表面微结构阵列—六棱柱形微结构阵列和圆柱形微结构阵列,并对所制备的微结构阵列进行了检验。结果表明:光固化微压印制备的微结构单元具有良好的一致性,微结构阵列复制度高、完整性好。该成型工艺具有高效率、低成本、绿色环保的优势,并且能够满足微结构阵列批量化生产的要求。
        A photochemical microimprinting technology for fabricating microstructure arrays was introduced. Under ambient temperature, the self-made template was used to impress the self-developed liquid photosensitive resin. Meanwhile, the surface microstructure array was prepared by UV irradiation and solidifi cation molding. According to the process requirements, an optical microimprint lithography equipment has been developed, the six prism microstructure array and cylindrical microstructure array were fabricated by this device, and the microstructure of the fabricated arrays was tested. The results show that the microstructural units fabricated by photochemical micropressure have good consistency, and the microstructures have high replication and good integrity. The forming process has the advantage of high effi ciency, low cost, and environmental protection, and can meet the requirements of mass production of microstructural arrays.
引文
[1]罗敏健,谢晋,郑佳华.一种微结构阵列表面的微细、精密和镜面一体化磨削方法:中国,102501152A[P].2012-06-20.
    [2]邹业兵,王智伟,吴天准,等.卷对卷紫外压印超疏水薄膜的工艺及装置[J].集成技术,2017(3):59-67.
    [3]Hobbs D S,Macleod B D,Mirov S B,et al.Laser damage resistant anti-reflection microstructures for mid-infrared metal-ion doped ZnSe gain media[J].Proc SPIE,2012,DOI:10.1117/12.2016402.
    [4]Jiang L.Super-hydrophobic nanoscale interface materials:From natural to artificial[J].Science&Technology Review,2005,23(2):4-8.
    [5]秦歌,王冠,周红梅,等.一种微结构阵列的加工方法:中国,106270853A[P].2017-01-04.
    [6]罗均,谢少荣,龚振邦.面向MEMS的微细加工技术[J].电加工与模具,2001(5):1-6.
    [7]徐飞飞,张效栋,房丰洲.金刚石刀具单点切削单晶硅加工表面特性[J].纳米技术与精密工程,2013,11(6):485-491.
    [8]Cui G,Xu W,Zhou X,et al.Rose-like superhydrophobic surface based on conducting dmitsalt[J].Colloids&Surfaces A:Physicochemical&Engineering Aspects,2006,272(1-2):63-67.
    [9]Dong T,Fu Y,Chen C,et al.Study on bionic moth-eye antireflective cylindrical microstructure on germanium substrate[J].Acta Optica Sinica,2016,DOI:10.3788/AOS201636.0522004.

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