用于直线感应加速器光源焦斑测量的双锥厚针孔结构设计
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摘要
研究设计双锥厚针孔结构体,利用小孔成像测量高能强流直线感应加速器光源的焦斑。建立数值计算模型,根据实际光源特性和实验布局条件,模拟光子穿过厚针孔结构的辐射成像过程,分析光源尺寸、分布和偏轴等对焦斑测量的影响。理论计算结果显示对光源物面的空间分辨率可达5lp/mm。
The structure of thick pinhole with double cones is studied and designed for the spot size measurement of the high-energy intense-current linear induction accelerator(LIA)light source.The theoretical model for numerical calculations is built up according to the parameters of the light source and the practical layout of the experimental measurement.The imaging process of photons penetrating through the thick pinhole structure is simulated,and the impact of the spot size,distribution and off axis on the source spot measurement is analyzed.Calculated results show that the spatial resolution on the source plane reaches 5 lp/mm.
The structure of thick pinhole with double cones is studied and designed for the spot size measurement of the high-energy intense-current linear induction accelerator(LIA)light source.The theoretical model for numerical calculations is built up according to the parameters of the light source and the practical layout of the experimental measurement.The imaging process of photons penetrating through the thick pinhole structure is simulated,and the impact of the spot size,distribution and off axis on the source spot measurement is analyzed.Calculated results show that the spatial resolution on the source plane reaches 5 lp/mm.
引文
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[5]谢红卫,宋顾周,张占宏,等.厚针孔成像模型计算[J].试验与研究,2004,27(2):19-29.(Xie Hongwei,Song Guzhou,Zhang Zhanhong,et al.Simulating of pinhole imaging.Test&Research,2004,27(2):19-29)
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[7]Muller K H.Measurement and characterization of X-ray spot size[R].LA-UR-89-1886,1989.
[8]王毅,李勤,代志勇.蒙特卡罗模拟分析电子束发射度对照射量空间分布影响[J].强激光与粒子束,2017,29:065006.(Wang Yi,Li Qin,Dai Zhiyong.Analysis on influence of beam emittance on spatial distribution of exposure using Monte Carlo simulation.High Power Laser and Particle Beams,2017,29:065006)
[9]Hubbell J H,Seltzer S M.Tables of X-ray mass attenuation coefficients and mass energy-absorption coefficients 1keV to 20 MeV for elements Z=1to 92and 48additional substances of dosimetric interest[R].NISTIR 5632,1995.
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