光控-晶控相结合的膜厚监控法对滤光片膜厚的研究
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摘要
针对光电极值法和石英晶振法各自的弊端,结合两种方法提出了光控-晶控膜厚监控法.在相同工艺条件下,分别使用这三种方法监控905nm窄带滤光片(规整膜系)和830nm截止滤光片(非规整膜系)的膜厚,对制备的滤光片的透射率光谱曲线进行比较.结果表明,光控-晶控膜厚监控法除了各项指标都符合要求外,在曲线通带处获得的平均透过率值比光电极值法和石英晶振法获得的平均透过率值提高了3%~6%,且与理论光谱基本吻合,光谱特性最好.该方法不仅对规整和非规整膜系都能进行监控,且能有效降低膜厚误差,提高光谱特性.
According to the disadvantages of both photoelectric extreme value and quartz crystal oscillation methods,a combination method based on photoelectric and quartz control were presented.To evaluate the performance of the combination method,the films with coating thickness of 905 nm narrow band filter(quarter wave coatings)and 830 nm cutoff filter(non-quarter wave coatings)were monitored using the combination method and individual method respectively under the same process.The combination method shows better performance,compared to the case of using an indiviual method.From the spectral transmittance curves of filters,the average transmittance values in the pass bands increase by 3%~6%by using the combination method.Meanwhile,the transmittance curve achieved by the combination method consists well with the theoretical spectral curve.The results show that this method can not only monitors quarter wave coatings and non-quarter wave coatings,but also effectively reduce the monitoring error and improve the spectral characteristics.
According to the disadvantages of both photoelectric extreme value and quartz crystal oscillation methods,a combination method based on photoelectric and quartz control were presented.To evaluate the performance of the combination method,the films with coating thickness of 905 nm narrow band filter(quarter wave coatings)and 830 nm cutoff filter(non-quarter wave coatings)were monitored using the combination method and individual method respectively under the same process.The combination method shows better performance,compared to the case of using an indiviual method.From the spectral transmittance curves of filters,the average transmittance values in the pass bands increase by 3%~6%by using the combination method.Meanwhile,the transmittance curve achieved by the combination method consists well with the theoretical spectral curve.The results show that this method can not only monitors quarter wave coatings and non-quarter wave coatings,but also effectively reduce the monitoring error and improve the spectral characteristics.
引文
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[16]Shanghai Institute of Optics and Fine Mechanics,the Chinese Academy of Sciences.Optical controlled-crystal controlled integrated film thickness monitoring method:China,103540906[P],2014-01-29,2.中国科学院上海光学精密机械研究所.光控-晶控综合膜厚监控方法:中国,103540906[P],2014-01-29,2.
[17]LI Shan.Study and Fabrication of 905nm Narrow Band-pass Filter[D].Jilin:Changchun University of Science and Technology,2010:13-14.李珊.905nm窄带滤光片的设计与制备[D].吉林:长春理工大学,2010:13-14.
[2]ZHAN Mei-qiong,ZHANG Dong-ping,YANG Jian,et al.Thickness monitoring by quartz crystal oscillation for optical coatings[J].Acta Photonica Sinica,2004,33(5):585-587.占美琼,张东平,杨健,等.石英晶体振荡法监控膜厚研究[J].光子学报,2004,33(5):585-587.
[3]ZHU Mei-Ping,YI Kui,GUO Shi-Hai,et al.Research of an automatic system monitoring thickness of optical thin film[J].Acta Photonica Sinica,2007,36(2):308-310.朱美萍,易葵,郭世海,等.光学薄膜膜厚自动控制系统的研究[J].光子学报,2007,36(2):308-310.
[4]LEEC C,WU K,CHENG C,et al.Improvement of the optical coating process by cutting layers with sensitive monitor wavelengths[J].Optics Express,2005,13(13):4854-4861.
[5]QUAN Gui-qin,HAN Jun,MI Qian.A kind of improve design for system of optical thin-film thickness monitoring control based on the method of photoelectricity limiting value[J].Applied Optics,2002,23(4):30-32.权贵秦,韩军,弥谦.一种基于光电极值法的光学膜厚监控系统的改进设计[J].应用光学,2002,23(4):30-32.
[6]LAI Fa-chun,WU Xiao-chun,ZHUANG Bin-ping,et al.Dual wavelengths monitoring for optical coatings[J].Optics Express,2008,16(13):9437.
[7]LIAO Zhen-xing,YANG Fang,XIA Wen-jian,et al.The progress of optical thin film thickness monitoring[J].Laser Journal,2004,25(4):1012.廖振兴,杨芳,夏文建.光学薄膜膜厚监控方法及其进展[J].激光杂志,2004,25(4):1012.
[8]FU Lian-xiao,WU Yong-gang,ZHENG Xiu-ping,et al.Design and preparation of narrowband filter with central wavelength 121.6nm in vacuum Ultraviolet region[J].Acta Optica Sinica,2008,28(12):2427-2428.付联效,吴永刚,郑秀萍,等.中心波长121.6nm的真空紫外窄带滤光片设计和制备[J].光学学报,2008,28(12):2427-2428.
[9]FU Jing-jing,MA En,LIN Li-jun,et al.Fabrication of edge filter on a testing system for infrared up-conversion materials[J].Laser&Optoelectronics Progress.2015,52(083102):1-3.傅晶晶,马恩,林丽君,等.红外上转换材料测试系统中截止滤光片的研制[J].激光与光电子学进展,2015,52(083102):1-3.
[10]LEE C C,WU K.In situ sensitive optical monitoring with proper error compensation[J].Optics Letters,2007,32(15):2118-2121.
[11]HAN Jun.Research on key technology in thin-film thickness wideband monitoring system[D].Shanxi:Xidian University,2011:15-16.韩军.光学膜厚宽带监控关键技术研究[D].陕西:西安电子科技大学,2011:15-16.
[12]CHENG De-jun,YANG YA-pei,FANG Man.A novel method for monitoring non-normalized coating system[J].Opto-Electronic Engineering,2004,31(6):37-40.陈德军,杨亚培,方曼.一种监控非规整膜系的新方法[J].光电工程,2004,31(6):37-40.
[13]YANG Ya-sheng.Application of extremum method to monitor optical film thickness[J].Semiconductor Optoelectronics,1989,10(2):76.杨亚生.光学薄膜膜厚监控中极值法的应用[J].半导体光电,1989,10(2):76.
[14]LI Zhan-feng,SHANG Li-ping.Film thickness on-line measurement method by quartz crystal differential[J].Chinese Journal of Scientific Instrument,2001,22(3):99-100.李占锋,尚丽平.薄膜厚度的石英晶体差动在线测量方法[J].仪器仪表学报,2001,22(3):99-100.
[15]TANG Jin-fa,GU Pei-fu,LIU Xu,et al.Modern optical thin film technology[M].Hangzhou:Zhejiang University press,2007:260-263.唐晋发,顾培夫,刘旭,等.现代光学薄膜技术[M].杭州:浙江大学出版社,2007:260-263.
[16]Shanghai Institute of Optics and Fine Mechanics,the Chinese Academy of Sciences.Optical controlled-crystal controlled integrated film thickness monitoring method:China,103540906[P],2014-01-29,2.中国科学院上海光学精密机械研究所.光控-晶控综合膜厚监控方法:中国,103540906[P],2014-01-29,2.
[17]LI Shan.Study and Fabrication of 905nm Narrow Band-pass Filter[D].Jilin:Changchun University of Science and Technology,2010:13-14.李珊.905nm窄带滤光片的设计与制备[D].吉林:长春理工大学,2010:13-14.