多孔硅的表面吸附性能的研究
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  • 英文篇名:Theoretical study on the performance of porous silicon explosion
  • 作者:胡小华 ; 施琼玲 ; 魏锡文 ; 黎学明
  • 英文作者:HU Xiao-hua,SHI Qiong-ling,WEI Xi-wen,LI Xue-ming(College of Chemistry and Chemical Engineering,Chongqing University,Chongqing 400044,China)
  • 关键词:多孔硅 ; 吸附 ; 爆炸
  • 英文关键词:porous silicon;adsorption;explosion
  • 中文刊名:GNCL
  • 英文刊名:Journal of Functional Materials
  • 机构:重庆大学化学化工学院;
  • 出版日期:2012-11-15
  • 出版单位:功能材料
  • 年:2012
  • 期:v.43;No.312
  • 基金:国家自然科学基金资助项目(10476035);; 中央高校基本科研业务费资助项目(CDJX12220001)
  • 语种:中文;
  • 页:GNCL201221031
  • 页数:4
  • CN:21
  • ISSN:50-1099/TH
  • 分类号:129-132
摘要
通过量子化学的DFT方法,采用模型化学方法和Gaussion 03程序,计算了由不同数目硅原子组成的模型分别吸附某几种氢原子、氧原子、硝酸根的模型和多孔硅表面可能存在的SiHx类物质自由基或分子碎片的红外光谱进行了计算,考察了各模型吸附前后的电荷集居数和红外振动光谱,计算结果表明多孔硅表面吸附氢原子、氧原子以及硝酸根可以削弱相关Si—Si键,导致硅氢氧化合物出现,从而氧化或断裂生成Si—H或Si—O一类分子碎片而引起爆炸。
        With the methods of model chemistry and DFT calculation,this paper calculates the model of different number of silicon atoms,which synchronously adsorbe some materials such as H,O,NO-3.And it calculates the vibration frequency of SiHx.This paper analyses the factors of overlap population and FT-IR.The results show that it can cause an explosion for the porous silicon surface adsorption of H,O and nitrate can weaken the Si—Si bond,resulting in the emergence of silicon hydroxide,thus oxidation or rupture to generate Si—H or Si—O molecular fragments.
引文
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