荧光成像技术探测熔石英元件亚表面缺陷
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摘要
提出荧光成像技术用于无损探测熔石英光学元件亚表面缺陷,利用该方法获得不同加工工艺下熔石英光学元件的亚表面缺陷。结合熔石英光学元件损伤性能研究,分析了熔石英光学元件亚表面缺陷与其损伤性能的关联关系。结果表明,熔石英光学元件损伤阈值与荧光缺陷密度呈反比关系,即亚表面荧光缺陷较少的样品损伤性能较好。这说明利用该技术方法可以有效评价熔石英光学元件的损伤性能。该研究结果对光学元件加工技术具有指导意义。
The fluorescence imaging technology is proposed for non-destructive detection of subsurface defects of fused silica optical elements.The subsurface defects of fused silica optical elements under different processing techniques are obtained by this method.Based on the damage properties of fused silica optical elements,the relationship between subsurface defects and damage properties of fused silica optical elements is analyzed.The results show that the damage threshold of fused silica optical elements is inversely proportional to the density of fluorescent defects,that is the samples with less subsurface fluorescence defects have high damage threshold.This shows that the technique can effectively evaluate the damage performance of fused silica optical elements.The results of this study have guiding significance for optical element processing technology.
The fluorescence imaging technology is proposed for non-destructive detection of subsurface defects of fused silica optical elements.The subsurface defects of fused silica optical elements under different processing techniques are obtained by this method.Based on the damage properties of fused silica optical elements,the relationship between subsurface defects and damage properties of fused silica optical elements is analyzed.The results show that the damage threshold of fused silica optical elements is inversely proportional to the density of fluorescent defects,that is the samples with less subsurface fluorescence defects have high damage threshold.This shows that the technique can effectively evaluate the damage performance of fused silica optical elements.The results of this study have guiding significance for optical element processing technology.
引文
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[19]Ye X,Jiang X D,Huang J,et al.Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using onestep self-masking reactive ion etching[J].Scientific Reports,2015,5(1):013023.
[20]Ding J W,Liang B M,Jiang Q,et al.Phase characteristic of near zero refractive index material and its application[J].Laser&Optoelectronics Progress,2017,54(3):031603.丁俊伟,梁斌明,蒋强,等.近零折射率材料相位特性及应用[J].激光与光电子学进展,2017,54(3):031603.
[21]Trost M,Herffurth T,Schmitz D,et al.Evaluation of subsurface damage by light scattering techniques[J].Applied Optics,2013,52(26):6579-6588.
[22]Neauport J,Ambard C,Cormont P,et al.Subsurface damage measurement of ground fused silica parts by HF etching techniques[J].Optics Express,2009,17(22):20448-20456.
[23]Williams W B,Mullany B A,Parker W C,et al.Using quantum dots to tag subsurface damage in lapped and polished glass samples[J].Applied Optics,2009,48(27):5155-5163.
[2]Stevens-Kalceff M A,Wong J.Distribution of defects induced in fused silica by ultraviolet laser pulses before and after treatment with a CO2 laser[J].Journal of Applied Physics,2005,97(11):113519.
[3]Wang Y J,Hu H Y,Li Q G,et al.Study of weak absorption of the thin films coated on the S plates[J].Chinese Journal of Lasers,2001,28(10):937-940.王英剑,胡海洋,李庆国,等.高反射硅镜弱吸收的研究[J].中国激光,2001,28(10):937-940.
[4]Cui H,Liu S J,Zhao Y A,et al.Study on total internal reflection microscopy for subsurface damage[J].Acta Optica Sinica,2014,34(6):0612004.崔辉,刘世杰,赵元安,等.全内反射显微技术探测亚表面缺陷新方法研究[J].光学学报,2014,34(6):0612004.
[5]Xiang Z,Nie C J,Ge J H,et al.Eliminating of subsurface damage structure[J].High Power Laser and Particle Beams,2007,19(3):373-376.项震,聂传继,葛剑虹,等.光学元件亚表面缺陷结构的蚀刻消除[J].强激光与粒子束,2007,19(3):373-376.
[6]Norton M A,Hrubesh L W,Wu Z L,et al.Growth of laser-initiated damage in fused silica at 351nm[J].Proceedings of SPIE,2001,4347:468-469.
[7]Xu S Z,LüH B,Tian D B,et al.Effects of acidetching depth on 355 nm laser-induced damage threshold of fused silica[J].High Power Laser and Particle Beams,2008,20(5):760-764.徐世珍,吕海兵,田东斌,等.酸蚀深度对熔石英三倍频激光损伤阈值的影响[J].强激光与粒子束,2008,20(5):760-764.
[8]Suratwala T,Steele R,Feit M D,et al.Effect of rogue particles on the sub-surface damage of fused silica during grinding/polishing[J].Journal of NonCrystalline Solids,2008,354(18):2023-2037.
[9]Hobbs D S,MacLeod B D,Riccobono J R.Update on the development of high performance antireflecting surface relief micro-structures[J].Proceedings of SPIE,2007,6545:65450Y.
[10]Li Y F,Zhang J H,Yang B.Antireflective surfaces based on biomimetic nanopillared arrays[J].Nano Today,2010,5(2):117-127.
[11]Wang X D,Liao Y L,Liu B,et al.Free-standing SU-8subwavelength gratings fabricated by UV curing imprint[J].Microelectronic Engineering,2008,85(5/6):910-913.
[12]Ma W H,Zhang M S,Shun L,et al.Ramanspectroscopy study of PbTiO3thin films grown on Si substrates by metalorganic chemical vapor deposition[J].Applied Physics A:Materials Science&Processing,1996,62(3):281-284.
[13]Jiang P,McFarland M J.Wafer-scale periodic nanohole arrays templated from two-dimensional nonclose-packed colloidal crystals[J].Journal of the American Chemical Society,2005,127(11):3710-3711.
[14]Sun C H,Gonzalez A,Linn N C,et al.Templated biomimetic multifunctional coatings[J].Applied Physics Letters,2008,92(5):051107.
[15]Kamimura T,Akamatsu S,Horibe H,et al.Enhancement of surface-damage resistance by removing subsurface damage in fused silica and its dependence on wavelength[J].Japanese Journal of Applied Physics,2004,43(9A/B):L1229-L1231.
[16]Seeger K,Palmer R E.Fabrication of silicon cones and pillars using rough metal films as plasma etching masks[J].Applied Physics Letters,1999,74(11):1627-1629.
[17]Schulze M,Fuchs H J,Kley E B,et al.New approach for antireflective fused silica surfaces by statistical nanostructures[J].Proceedings of SPIE,2008,6883:68830N.
[18]Zou G J,Zhang B F,Li C X,et al.Chaotic photonic compressed sampling based on optoelectronic oscillator[J].Chinese Journal of Lasers,2017,44(11):1106002.邹广健,张宝富,李诚鑫,等.光电震荡器的混沌光子压缩采样方法[J].中国激光,2017,44(11):1106002.
[19]Ye X,Jiang X D,Huang J,et al.Formation of broadband antireflective and superhydrophilic subwavelength structures on fused silica using onestep self-masking reactive ion etching[J].Scientific Reports,2015,5(1):013023.
[20]Ding J W,Liang B M,Jiang Q,et al.Phase characteristic of near zero refractive index material and its application[J].Laser&Optoelectronics Progress,2017,54(3):031603.丁俊伟,梁斌明,蒋强,等.近零折射率材料相位特性及应用[J].激光与光电子学进展,2017,54(3):031603.
[21]Trost M,Herffurth T,Schmitz D,et al.Evaluation of subsurface damage by light scattering techniques[J].Applied Optics,2013,52(26):6579-6588.
[22]Neauport J,Ambard C,Cormont P,et al.Subsurface damage measurement of ground fused silica parts by HF etching techniques[J].Optics Express,2009,17(22):20448-20456.
[23]Williams W B,Mullany B A,Parker W C,et al.Using quantum dots to tag subsurface damage in lapped and polished glass samples[J].Applied Optics,2009,48(27):5155-5163.