摘要
使用射频磁控溅射,以高纯度碳靶材和高纯度甲烷为碳源,在不同射频功率下制备了类金刚石(DLC)薄膜。利用扫描电镜、傅里叶变换红外光谱仪和显微硬度计测试了薄膜的结构与性能。研究结果表明:制备的薄膜致密均匀,随着射频功率的增大薄膜生长速度增大,C原子含量增大;在200W功率制备的薄膜sp~3含量高,其分子结构与性能也就更偏向于金刚石,薄膜维氏硬度达到1038.26 MPa。同时发现,随制备功率的增加,DLC薄膜硬度呈先增大再减小的趋势,薄膜石墨化程度增大。
Diamond-like carbon(DLC) films were prepared using the RF magnetron sputtering with high purity carbon targets and high purity methane as carbon sources under different RF power. The structure and properties of the films were studied by the scanning electron microscopy, Fourier transform infrared spectroscopy and micro-hardness tester. The results show that the films is dense and uniform. With increasing the RF power, the growth rate and the proportion of carbon atom in the film increase. The films prepared at 200 W have high sp~3 content, and its molecular structure and properties are more towards to diamond. The Vickers hardness of the films reaches 1123.42 MPa, and it was found that the hardness of DLC films increases first and then decreases with the increasing RF power. The graphitization degree of the DLC film increased.
引文
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