摘要
针对晶圆生产过程中晶圆图数据角度与维度多样性和数量不平衡的特点,提出了基于对抗生成网络的晶圆图缺陷模式识别方法。设计了Radon变换,实现了数据多角度的统一;采用重采样机制实现数据多维度的缩放,得到了标准晶圆缺陷数据。提出了基于对抗生成网络的晶圆缺陷分类方法,利用生成机制平衡各缺陷模式的样本数量,以提升缺陷模式识别精度。试验结果表明,该方法可大幅提升少类样本的识别精度,且在整体识别率上远优于支持向量机和Adaboost算法。
Aiming at the characteristics of wafer map data angle and dimension diversity and quantity imbalance during wafer production processes,a wafer pattern defect recognition method was proposed based on generative adversarial networks.The two-stage wafer defect data pre-processing method was proposed to obtain standard wafer defect data,where Radon transform was designed to solve the multi-angle characteristics of the wafer map,and a resampling mechanism was used to realize the scaling of various data dimensions.The proposed wafer defect classification method used ageneration mechanism to balance the number of samples of each defect type based on a generative adversarial networks,which could improve the defect pattern recognition accuracy.The experimental results show that this method may greatly improve the accuracy of small class samples,and the overall recognition rate is much better than the support vector machine and Adaboost algorithm.
引文
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