高密度羟自由基生成技术的研究
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  • 英文篇名:Research on High-density Hydroxyl Radical Generation Technology
  • 作者:李森 ; 尚凯 ; 李璐 ; 周少奇 ; 王世杰 ; 唐楚寒 ; 黄磊
  • 英文作者:LI Sen;SHANG Kai;LI Lu;ZHOU Shao-qi;WANG Shi-jie;TANG Chu-han;HUANG Lei;Guizhou Academy of Sciences;Institute of Geochemistry, Chinese Academy of Sciences;Guizhou Meirui Environmental Technology Co., Ltd.;
  • 关键词:臭氧 ; 羟基自由基 ; 纳米管光催化剂
  • 英文关键词:Ozone;;Hydroxyl radical;;Nanotube photocatalyst
  • 中文刊名:SYHH
  • 英文刊名:Contemporary Chemical Industry
  • 机构:贵州科学院;中国科学院地球化学研究所;贵州美瑞特环保科技有限公司;
  • 出版日期:2019-05-28
  • 出版单位:当代化工
  • 年:2019
  • 期:v.48;No.280
  • 基金:贵州铝土矿及高岭土在处理工业废水中重金属的应用及一体化装置的关键技术研究项目,项目编号(黔科合支撑<2018>2951)
  • 语种:中文;
  • 页:SYHH201905027
  • 页数:5
  • CN:05
  • ISSN:21-1457/TQ
  • 分类号:90-94
摘要
随着晶片等电子元件集成化、小型化和精细化快速发展,半导体行业对加工过程中电子元件表面附着重金属和油类等污染物的清洗技术要求也越来越高。传统的化学清洗法已逐渐被禁用,超声等物理清洗法处理效果较差且已不能满足当前需求。羟基自由基具有强氧化性目前已被广泛应用于高浓度、高稳定结构的有机物清洗,但由于现有单一的电Fenton法、电解氧化法、光电催化法和半导体催化法产生自由基密度较低,氧化能力有限,极大地限制了其应用范围。采用化学发光法将所有生成的氧化剂浓度转化为臭氧浓度后进行对比分析,进行半定性半定量测定,并系统性研究了臭氧、紫外光照射、低兆赫超声和二氧化钛纳米管光催化技术多项联用下,对羟基自由基生成浓度的影响。
        With the rapid development of the integration, miniaturization and refinement of electronic components such as wafers, the semiconductor industry has increasingly high requirements for cleaning technology of heavy metals, oil and other pollutants on the surface of electronic components during processing. The traditional chemical cleaning method has been gradually disabled, and the physical cleaning method such as ultrasound is not effective enough to meet the current needs. Hydroxyl radical has strong oxidability, so it has been widely used in cleaning organic matters with high concentration and high stable structure. In this paper, the concentration of all generated oxidants was converted to ozone by the chemiluminescence method, and then semi-qualitative semi-quantitative comparison and analysis were carried out. The effect of multiple combination of ozone, ultraviolet light irradiation, low MHZ ultrasound and titanium dioxide nanotube photocatalysis on the concentration of hydroxyl radicals was systematically studied.
引文
[1]Bearda T,Mertens P W,Beaudoin S P.Overview of Wafer Contamination and Defectivity[M].Handbook of Silicon Wafer Cleaning Technology,2008.
    [2]Wang J,Balazs M K,Pianetta P,et al.Analytical Techniques for Trace Elemental Analyses on Wafer Surfaces for Monitoring and Controlling Contamination[J].Semiconductor Pure Water and Chemicals Conference,2000,65(2):124-126.
    [3]Gottschalk C,Schweckendiek J.Using dissolved ozone in semiconductor cleaning applications[J].Micro,2004,22(2):81-82,86,88-89.
    [4]Munter R.Advanced oxidation processes——current status and prospects[J].Proc.estonian Acad.sci.chem,2001,32(41):91-101.
    [5]Iijima,T.,Makise,R.and Murata,T.“OH Radical Generator for Waste Water Treatment Containing Recalcitrant Organic Matter”[J].Toshiba Review,2006,61(8):40-43.
    [6]Lelieveld J,Dentener F J,Peters W,et al.Hydroxyl radicals maintain the self-cleansing capacity of the troposphere[J].Atmospheric Chemistry&Physics Discussions,2004,4:2337-2344.
    [7]Rosenfeldt E J,Linden K G,Canonica S,et al.Comparison of the efficiency of*OH radical formation during ozonation and the advanced oxidation processes O3/H2O2 and UV/H2O2[J].Water Research,2006,40(20):3695-3704.
    [8]Lelieveld J,Dentener F J,Peters W,et al.Hydroxyl radicals maintain the self-cleansing capacity of the troposphere[J].Atmospheric Chemistry&Physics Discussions,2004,4(4):3699-3720.
    [9]Hoffmann M R,Choi W,Bahnemann D W.Environmental Applications of Semiconductor Photocatalysis[J].Chemical Reviews,1995,95(1):69-94.
    [10]Jongmin L,Buyong J,Chongmu L.Post-CMP Cleaning for Metallic Contaminant Removal by Using a Remote Plasma and UV/Ozone[J].Journal-Korean Physical Society,2000,37(6):1051-1056.
    [11]Madanshetty S I,Ji H.Detecting large particles in a slurry by measuring acoustic cavitation thresholds[J].Acoustics Research Letters Online,2004,5(4):148-152.
    [12]Park S H,Kim S J,Seo S G,et al.Assessment of Microwave/UV/O3 in the Photo-Catalytic Degradation of Bromothymol Blue in Aqueous Nano TiO2 Particles Dispersions[J].Nanoscale Research Letters,2010,5(10):1627-1632.
    [13]Huang C,Lee S W,Kim T H,et al.Photocatalytic decomposition of benzene with plasma sprayed Ti O2-based coatings on foamed aluminum[J].Journal of the European Ceramic Society,2006,26(12):2231-2239.
    [14]Toma F L,Bertrand G,Klein D,et al.Development of photocatalytic active TiO2 surfaces by thermal spraying of nanopowders[J].Journal of Nanomaterials,2008,2008(1):58.
    [15]Anju S G.Ultrasound assisted semiconductor mediated catalytic degradation of organic pollutants in water:Comparative efficacy of ZnO,Ti O2 and ZnO-TiO2[J].Research Journal of Recent Sciences,2012,13(1):191-201.
    [16]Riesz P,Berdahl D,Christman C L.Free radical generation by ultrasound in aqueous and nonaqueous solutions[J].Environmental Health Perspectives,1985,64(6):233-252.
    [17]Chakinala A G,Gogate P R,Burgess A E,et al.Intensification of hydroxyl radical production in sonochemical reactors[J].Ultrason Sonochem,2007,14(5):509-514.
    [18]Rae J,Ashokkumar M,Eulaerts O,et al.Estimation of ultrasound induced cavitation bubble temperatures in aqueous solutions[J].Ultrason Sonochem,2005,12(5):325-329.
    [19]O’Keeffe S,Fitzpatrick C,Lewis E.An optical fibre based ultra violet and visible absorption spectroscopy system for ozone concentration monitoring[J].Sensors&Actuators B Chemical,2007,125(2):372-378.
    [20]Tsai C H,Stern A,Chiou J F,et al.Rapid and specific detection of hydroxyl radical using an ultraweak chemiluminescence analyzer and a low-level chemiluminescence emitter:Application to hydroxyl radical-scavenging ability of aqueous extracts of food constituents[J].Journal of Agricultural&Food Chemistry,2001,49(5):2137-41.
    [21]Agarwal A,Allamaneni S S,Said T M.Chemiluminescence technique for measuring reactive oxygen species.[J].Reproductive Biomedicine Online,2004,9(4):466-468.
    [22]Guicherit R.Ozone analysis by chemiluminescence measurement[J].Fresenius Zeitschrift Für Analytische Chemie,1971,256(3):177-182.
    [23]Summerfelt S T.Ozonation and UV irradiation-an introduction and examples of current applications[J].Aquacultural Engineering,2003,28(1-2):21-36.
    [24]Chang K L,Sekiguchi K,Wang Q Y,et al.Removal of Ethylene and Secondary Organic Aerosols Using UV-C-254(+)(185)(nm)with TiO2Catalyst[J].Aerosol&Air Quality Research,2013,13(2):618-626.
    [25]Jimenez,A.M,Navas,et al.Chemiluminescence methods(present and future)[J].Grasas Y Aceites,2002,53(1):64-75.
    [26]Hadjimitova V T T,Mileva M,Ribarov S.Effect of some psychotropic drugs on luminol-Dependent chemiluminescence induced by O-2(-),(OH)-O-center dot,HOCI[J].Zeitschrift Fur Naturforschung C AJournal of Biosciences,2002,57(12):1066-1071.
    [27]Zang L Y,Cosma G,Gardner H,et al.Effect of chlorogenic acid on hydroxyl radical[J].Molecular&Cellular Biochemistry,2003,247(1-2):205-210.
    [28]大場,向井,知大.Mechanism and condition of the chemiluminescence of luminol and lucigenin[J].Hiyoshi Review of Natural Science,2010,(48):31-57.
    [29]Song S H,Song X Q,Yang C D,et al.Production of Hydroxyl Radicals and Removal of Petroleum Pollutants in Soil in Stepwise Fenton System[J].Contemporary Chemical Industry,2018,47(05):926-930.

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