Deposition and characterization of TiZrV-Pd thin films by dc magnetron sputtering
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摘要
TiZrV film is mainly applied in the ultra-high vacuum pipes of storage rings.Thin film coatings of palladium,which are added onto the TiZrV film to increase the service life of nonevaporable getters and enhance H_2pumping speed,were deposited on the inner face of stainless steel pipes by dc magnetron sputtering using argon gas as the sputtering gas.The TiZrV-Pd film properties were investigated by atomic force microscope(AFM),scanning electron microscope(SEM),X-ray photoelectron spectroscopy(XPS) and X-Ray Diffraction(XRD).The grain size of TiZrV and Pd films were about 0.42-1.3 nm and 8.5-18.25 nm respectively.It was found that the roughness of TiZrV films is small,about 2-4 nm,but for Pd film it is large,about 17-19 nm.The PP At.%of Pd in TiZrV/Pd films varied from 86.84 to 87.56 according to the XPS test results.
TiZrV film is mainly applied in the ultra-high vacuum pipes of storage rings.Thin film coatings of palladium,which are added onto the TiZrV film to increase the service life of nonevaporable getters and enhance H_2pumping speed,were deposited on the inner face of stainless steel pipes by dc magnetron sputtering using argon gas as the sputtering gas.The TiZrV-Pd film properties were investigated by atomic force microscope(AFM),scanning electron microscope(SEM),X-ray photoelectron spectroscopy(XPS) and X-Ray Diffraction(XRD).The grain size of TiZrV and Pd films were about 0.42-1.3 nm and 8.5-18.25 nm respectively.It was found that the roughness of TiZrV films is small,about 2-4 nm,but for Pd film it is large,about 17-19 nm.The PP At.%of Pd in TiZrV/Pd films varied from 86.84 to 87.56 according to the XPS test results.
TiZrV film is mainly applied in the ultra-high vacuum pipes of storage rings.Thin film coatings of palladium,which are added onto the TiZrV film to increase the service life of nonevaporable getters and enhance H_2pumping speed,were deposited on the inner face of stainless steel pipes by dc magnetron sputtering using argon gas as the sputtering gas.The TiZrV-Pd film properties were investigated by atomic force microscope(AFM),scanning electron microscope(SEM),X-ray photoelectron spectroscopy(XPS) and X-Ray Diffraction(XRD).The grain size of TiZrV and Pd films were about 0.42-1.3 nm and 8.5-18.25 nm respectively.It was found that the roughness of TiZrV films is small,about 2-4 nm,but for Pd film it is large,about 17-19 nm.The PP At.%of Pd in TiZrV/Pd films varied from 86.84 to 87.56 according to the XPS test results.
引文
1 Benvenuti C,Chiggiato P,Mongelluzzo A,Prodromides A,Ruzinov V,Scheuerlein C,Taborelli M,Levy F.Journal of Vacuum Science&Technology A:Vacuum,Surfaces,and Films,2001,19(6):2925
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6 Suetsugu Y,Kanazawa K,Shibata K,Hisamatsu H,Oide K,Takasaki F,Dostovalov R V,Krasnov A A,Zolotarev K V,Konstantinov E S,Chernov V A,Bondar A E,Shmakov A N.Accelerators,Spectrometers,Detectors and Associated Equipment,2005,554(1-3):92
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10 Drbohlav J,Matolinova I,Masek K,Matolin V.Vacuum,2005,80(1-3):47
11 Mura M,Paolini C.Vakuum in Forschung und Praxis,2007,19(4):13
12 Paolini C,Mura M,Ravelli F.Journal of Vacuum Science&Technology A:Vacuum,Surfaces,and Films,2008,26(4):1037
13 Benvenuti C,Chiggiato P,Cicoira F,Aminot Y L,Ruzinov V.Vacuum,2004,73(2):139
14 WANG Yong et al.Proceedings of PAC09.Vancouver,BC,Canada.http//epaper.kek.jp/PAC2009/papers/mo6rfp024.pdf
2 Drbohlav J,Matolin V.Vacuum,2003,71(1-2):323
3 Ferreira M J,Seraphim R M,Ramirez A J,Tabacniks M H,Nascente P A P.Physcs Proa,2012,32:840
4 Sutara F,Skala T,Masek K,Matolin V.Vacuum,2009,83(5):824
5 Pimpec F Le,Kirby R E,King F K,Pivi M.Nuclear Instruments and Methods in Physics Research Section A:Accelerators,Spectrometers,Detectors and Associated Equipment,2006,564(1):44
6 Suetsugu Y,Kanazawa K,Shibata K,Hisamatsu H,Oide K,Takasaki F,Dostovalov R V,Krasnov A A,Zolotarev K V,Konstantinov E S,Chernov V A,Bondar A E,Shmakov A N.Accelerators,Spectrometers,Detectors and Associated Equipment,2005,554(1-3):92
7 Pimpec F Le,Kirby R E,King F,Pivi M.Nuclear Instruments and Methods in Physics Research Section A:Accelerators,Spectrometers,Detectors and Associated Equipment,2005,551(2-3):187
8 Anashin V V,Collins I R,Dostovalov R V,Fedorov N V,Krasnov A A,Malyshev O B,Ruzinov V L.Vacuum,2004,75(2):155
9 Mahner E,Hansen J,K(u|¨)hler D,Malabaila M,Taborelli M.Physical Review Special Topics-Accelerators and Beams,2005,8(5):
10 Drbohlav J,Matolinova I,Masek K,Matolin V.Vacuum,2005,80(1-3):47
11 Mura M,Paolini C.Vakuum in Forschung und Praxis,2007,19(4):13
12 Paolini C,Mura M,Ravelli F.Journal of Vacuum Science&Technology A:Vacuum,Surfaces,and Films,2008,26(4):1037
13 Benvenuti C,Chiggiato P,Cicoira F,Aminot Y L,Ruzinov V.Vacuum,2004,73(2):139
14 WANG Yong et al.Proceedings of PAC09.Vancouver,BC,Canada.http//epaper.kek.jp/PAC2009/papers/mo6rfp024.pdf