应用于大面积光刻的激光图案检测系统
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摘要
基于激光干涉光刻的基本原理,设计了新型的可应用于大面积光刻的激光图案检测系统,并阐述了利用电荷耦合元件对光刻图案的CMOS实时检测及实现大面积光刻的方法。实验结果表明,使用激光干涉光刻技术可以产生大面积的亚微米级周期性图案。该方法提供了得到高分辨、无限焦深、大面积光刻的可能性。
The laser interference lithography is applied to design a lithographic patterns detection system for large area lithography by using complementary metal oxide semiconductor(CMOS).Experiments show that laser interference lithography technique is feasible to produce the sub-micron periodic graphics in large area.It shows the potential of interference lithography on high resolution,infinite focal depth and large area.
The laser interference lithography is applied to design a lithographic patterns detection system for large area lithography by using complementary metal oxide semiconductor(CMOS).Experiments show that laser interference lithography technique is feasible to produce the sub-micron periodic graphics in large area.It shows the potential of interference lithography on high resolution,infinite focal depth and large area.
引文
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[2]张锦,冯伯儒,郭永康,等.用于大面积周期性图形制造的激光干涉光刻[J].光电工程,2001,28(6):20-23.Zhang Jin,Feng Boru,Guo Yongkang,et al.Laser interference photolithography for fabricating periodic patterns in large area[J].Opto-electronic Engineering,2001,28(6):20-23.(in Chinese)
[3]Konkola P,Chen C G,Heilmann R K,et al.Nanometer-level repeatable metrology using the Nanoruler[J].Journal of Vacuum Science&Technology B Microelectronics&Nanometer Structures,2003,21(6):3097-3101.
[4]Kikitsu A,Kamata Y,Sakurai M,et al.Recent progress of patterned media[J].IEEE Transactions on Magnetics,2007,43(9):3685-3688.
[5]Cui Bo,Yu Zhaoning,Ge Haixiong,et al.Large area50nm period grating by multiple nanoimprint lithography and spatial frequency doubling[J].Applied Physics Letters,2006,90(4):1-3.
[6]Heilmann R K,Bruccoleri A R,Guan Dong,et al.Fabrication of large-area and low mass critical-angle xray transmission gratings[J].Space Telescopes&Instrumentation Ultraviolet to Gamma Ray,2014,9144:1-8.
[7]Chang C H,Zhao Yong,Heilmann R K,et al.Spatialfrequency multiplication with multilevel interference lithography[J].Journal of Vacuum Science&Technology B,2008,26(6):2135-2138.
[8]Bruccoleri A,Mukherjee P,Heilmann R K,et al.Fabrication of nanoscale,high throughput,high aspect ratio freestanding gratings[J].Journal of Vacuum Science&Technology B Microelectronics&Nanometer Structures,2012,30(6):article No.06FF03.
[9]Ahn M,Heilmann P K,Schattenburg M L.Fabrication of 200nm period blazed transmission gratings on silicon-on-insulator wafers[J].Journal of Vacuum Science&Technology B Microelectronics&Nanometer Structures,2008,26(6):2179-2182.
[10]陈林森,解剑锋,沈雁,等.基于SLM的三维图像激光光刻系统的研制[J].激光与红外,2003,33(5):367-370.Chen Linsen,Xie Jianfeng,Shen Yan,et al.Fabrication of 3Dimage laser printing system with SLM[J].Laser&Infrared,2003,33(5):367-370.(in Chinese)
[11]胡进,浦东林,魏国军,等.基于衍射光栅和空间光调制器的点阵全息光刻方法[J].中国激光,2014,41(6):1-6.Hu Jin,Pu Donglin,Wei Guojun,et al.A method of Dot-matrix holography based on the diffraction gratingand spatial light modulator[J].Chinese Journal of Lasers,2014,41(6):1-6.(in Chinese)
[12]申溯,浦东林,胡进,等.一种基于空间光调制器的微透镜阵列制备技术[J].中国激光,2012,39(3):244-248.Shen Su,Pu Donglin,Hu Jin,et al.Fabrication of microlens arrays based spatial light modulator[J].Chinese Journal of Lasers,2012,39(3):244-248.(in Chinese)
[13]楼益民,陈林森,魏国军,等.基于连续变频技术的三维图像激光打印方法与系统[J].中国激光,2014,41(2):82-85.Lou Yimin,Chen Linsen,Wei Guojun,et al.Method and system of three-dimensional laser printing based on consecutive spatial frequency modulation[J].Chinese Journal of Lasers,2014,41(2):82-85.(in Chinese)