聚酰亚胺薄膜的反应离子刻蚀抛光
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摘要
为进一步提高聚酰亚胺薄膜光学器件的表面质量,提出了一种聚酰亚胺薄膜的反应离子刻蚀抛光方法,对其抛光原理和抛光实验进行了研究。利用光刻胶流体的低表面张力及流动特性,通过在聚酰亚胺薄膜表面涂覆光刻胶对其表面缺陷进行填补;结合聚酰亚胺与光刻胶的反应离子高各向异性等比刻蚀工艺,将光刻胶光滑平整表面高保真刻蚀转移至聚酰亚胺表面,从而实现聚酰亚胺薄膜的反应离子刻蚀抛光。实验结果表明:PV、RMS分别为1.347μm和340nm的粗糙表面,通过二次抛光其粗糙度可降低至75nm和13nm;PV、RMS分别为61nm和8nm的表面,其粗糙度可降低至9nm和1nm。该抛光方法能有效提高聚酰亚胺薄膜的表面光洁度,可为以聚酰亚胺薄膜为代表的高分子柔性光学器件的精密加工提供新的工艺思路。
To improve the surface quality of polyimide(PI)optics,apolishing method for polyimide membranes based on Reactive Ion Etching(RIE)was proposed.The working principle and experimental research for the proposed method were discussed in this study.Owing to the low surface tension and mobility of the PR fluid,surface defects on the PI surface were required to be filled by a PR coating.In addition,owing to the highly anisotropic and identical RIE rates for PR and PI,the smooth PR surface could be precisely transferred onto the PI surface.The polishing of PI membranes then was realized.Experimental results indicate that for a surface roughness with PV of 1.347μm and RMS of 340 nm,the respective values can be reduced to 75 nm and 13 nm after double polishing.Furthermore,for a surface roughness with PV of 61 nm and RMS of 8 nm,the values can be reduced to 9 nm and 1 nm,respectively.Hence,the proposed polishing method based on RIE can efficiently improve the surface finish of PI membranes,which in turn can provide novel schemes for precision manufacturing of PI-based flexible polymer devices.
To improve the surface quality of polyimide(PI)optics,apolishing method for polyimide membranes based on Reactive Ion Etching(RIE)was proposed.The working principle and experimental research for the proposed method were discussed in this study.Owing to the low surface tension and mobility of the PR fluid,surface defects on the PI surface were required to be filled by a PR coating.In addition,owing to the highly anisotropic and identical RIE rates for PR and PI,the smooth PR surface could be precisely transferred onto the PI surface.The polishing of PI membranes then was realized.Experimental results indicate that for a surface roughness with PV of 1.347μm and RMS of 340 nm,the respective values can be reduced to 75 nm and 13 nm after double polishing.Furthermore,for a surface roughness with PV of 61 nm and RMS of 8 nm,the values can be reduced to 9 nm and 1 nm,respectively.Hence,the proposed polishing method based on RIE can efficiently improve the surface finish of PI membranes,which in turn can provide novel schemes for precision manufacturing of PI-based flexible polymer devices.
引文
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[17]李显凌.数控非接触式超光滑光学元件加工机床的设计[J].光学精密工程,2012,20(4):719-726.LI X L.Design of CNC non-contact super-smooth polishing machine for optical components[J].Opt.Precision Eng.,2012,20(4):719-726.(in Chinese)
[2]张健,粟孟娟,阴刚华,等.用于太空望远镜的大口径薄膜菲涅尔衍射原件[J].光学精密工程,2016,24(6):1289-1296.ZHANG J,SU M J,YIN G H,et al..Large-diameter membrane Fresnel diffraction elements for space telescope[J].Opt.Precision Eng.,2016,24(6):1289-1296.(in Chinese)
[3]MARKER D K,ETHAN H,PATRICK B G,et al..Large lightweight optical quality windows and filters[J].SPIE,2004,5553:213-220.
[4]闫勇,金光.空间太阳能电站发展及研究[J].中国光学,2013,6(2):129-134.YAN Y,JIN G.Development and research of solar power system[J].Chinese Optics,2013,6(2):129-134.(in Chinese)
[5]任小龙,董占林,张俊丽,等.国外聚酰亚胺薄膜产品及应用进展[J].绝缘材料,2013,46(3):28-32.REN X L,DONG ZH L,ZHANG J L,et al..Polyimide film product and its application development at abroad[J].Insulation Materials,2013,46(2):28-32.(in Chinese)
[6]吴国光.聚酰亚胺及其薄膜在航空航天中的应用[J].信息记录材料,2012,13(1):28-34.WU G G.Polyimide film and its applications in aerospace[J].Information Recording Materials,2012,13(1):28-34.(in Chinese)
[7]ZHANG Y,WANG B.Transmissive diffractive membrane optic for large aperture lightweight optical telescope[C].International Conference on Optical Instruments and Technology:Optoelectronic Imaging and Processing Technology.International Society for Optics and Photonics,2015.
[8]ZHANG J,SHU M J,YIN G H,et al..Low-cost method of fabricating large-aperture,high efficiency,Fresnel diffractive membrane optic using a modified Moire technique[J].Chinese Optics Letters,2016,14(10):10-14.
[9]郑锦华,吴双,魏新煦,等.研磨抛光表面微孔织构的形成[J].光学精密工程,2016,24(4):788-795.ZHENG J H,WU SH,WEI X X,et al..Formation of surface micro-pore texture by grinding and polishing[J].Opt.Precision Eng.,2016,24(4):788-795.(in Chinese)
[10]秦娜,郑亮,刘亚龙,等.RB-SiC亚表面损伤检测及其旋转超声磨削亚表面损伤特征[J].光学精密工程,2017,25(10):2714-2724.QIN N,ZHENG L,LIU Y L,et al..Subsurface damage detection of RB-SiC and its subsurface damage characteristics in rotating ultrasonic grinding[J].Opt.Precision Eng.,2017,25(10):2714-2724.(in Chinese)
[11]周艳,潘国顺,史晓磊,等.LED蓝宝石衬底抛光表面原子台阶形貌及其周期性研究[J].光学精密工程,2017,25(1):100-106.ZHOU Y,PAN G SH,SHI X L,et al..Atomic step morphology research of LED sapphire substrate polishing surface and its periodicity[J].Opt.Precision Eng.,2017,25(1):100-106.(in Chinese)
[12]居志兰,朱永伟,王建彬,等.抛光介质对固结磨料化学机械抛光水晶的影响[J].光学精密工程,2013,21(4):955-961.JU ZH L,ZHU Y W,WANG J B,et al..Effect of slurries on chemical mechanical polishing of decorative glasses by fixed-abrasive pad[J].Opt.Precision Eng.,2013,21(4):955-961.(in Chinese)
[13]石峰,万稳,戴一帆,等.磁流变抛光对熔石英激光损伤特性的影响[J].光学精密工程,2016,24(12):2931-2937.SHI F,WAN W,DAI Y F,et al..Effect of magnetorheological finishing on laser damage properties of fused silica[J].Opt.Precision Eng.,2016,24(12):2391-2397.(in Chinese)
[14]AUDRAN S,FAURE B,MORTINI B,et al..Study of dynamical formation and shape of microlenses formed by the reflow method[J].SPIE,2006,6135:89-95.
[15]SCHILLING A,MERZ R,OSSMANN C,et al..Surface profile of reflow miecrolenses under the influence of surface tension and gravity[J].Opt.Eng.,2000,39:2171-2176.
[16]谢玉萍,吴鹏,杨正,等.基于移动掩模曝光的聚酰亚胺连续微结构刻蚀工艺研究[J].光子学报,2015,44(9):0922004.XIE YU P,WU P,YANG ZH,et al..Continuous microstructure etching process polyimide based moving mask exposure[J].Acta Photonica Sinica,2015,44(9):0922004.(in Chinese)
[17]李显凌.数控非接触式超光滑光学元件加工机床的设计[J].光学精密工程,2012,20(4):719-726.LI X L.Design of CNC non-contact super-smooth polishing machine for optical components[J].Opt.Precision Eng.,2012,20(4):719-726.(in Chinese)