等离子物理气相沉积设备研究及发展现状
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摘要
热喷涂技术是表面工程领域一项重要的分支,在高性能涂层制备中已经得到越来越广泛的应用,特别在制备具有优良特性的热障涂层(Thermal Barrier Coatings,TBCs)中发挥重要作用。等离子物理气相沉积(Plasma Spray-Physical Vapor Deposition,PS-PVD)是基于低压等离子喷涂发展的一种快速多相调控涂层制备技术,可获得薄膜、致密涂层、柱状晶结构涂层。PS-PVD的工艺设备制造是一大难题,国外发展尚不足十年,我国的PS-PVD设备都来自进口,国内开展了相关设备的探索工作。本文从PS-PVD工艺的发展历程入手,重点阐述PS-PVD设备的基本构造及关键技术。最后,对其发展和应用前景进行展望。
Thermal spraying technology is an important branch of surface engineering and has been widely used in high performance coating preparation. Especially in the preparation of excellent properties of thermal barrier coatings(TBCs) play an important role. Plasma Spray-Physical Vapor Deposition(PS-PVD) is a fast multi-phase controlled coating preparation technology based on low pressure plasma spraying. Thin film, dense coating and columnar crystal structure coating can be obtained. PS-PVD process equipment manufacturing is a big problem. Foreign development is still less than ten years, and China's PS-PVD equipment are imported. China carried out the exploration of related equipment. This paper starts with the development process of PS-PVD technology, and expatiates on the basic structure and key technology of PS-PVD equipment.Finally, its development and application prospects are looked ahead.
Thermal spraying technology is an important branch of surface engineering and has been widely used in high performance coating preparation. Especially in the preparation of excellent properties of thermal barrier coatings(TBCs) play an important role. Plasma Spray-Physical Vapor Deposition(PS-PVD) is a fast multi-phase controlled coating preparation technology based on low pressure plasma spraying. Thin film, dense coating and columnar crystal structure coating can be obtained. PS-PVD process equipment manufacturing is a big problem. Foreign development is still less than ten years, and China's PS-PVD equipment are imported. China carried out the exploration of related equipment. This paper starts with the development process of PS-PVD technology, and expatiates on the basic structure and key technology of PS-PVD equipment.Finally, its development and application prospects are looked ahead.
引文
[1]Marek Goral,Slawomir Kotowski,Andrzej Nowotnik,et al PS-PVD deposition of thermal barrier coatings[J].Surface and Coatings Technology,2013,237:51-55.
[2]Konstantin von Niessen,Malko Gindrat.Plasma Spray-PVD:A New Thermal Spray Process to Deposit Out of the Vapor Phase[J].Journal of Thermal Spray Technology,2011,20:736-743.
[3]G Mauer,M O Jarligo,S Rezanka,et al.Novel Opportunities for Thermal Spray by PS-PVD[J].Surface and Coatings Technology,2015,268:52-57.
[4]A Shinozawa,K Eguchi,M Kambara,et al.Feather-like Structured YSZ Coatings at Fast Rates by Plasma Spray Physical Vapor Deposition[J].Journal of Thermal Spray Technology,2010,19:190-197.
[5]S Rezanka,G Mauer,R Va?en.Improved Thermal Cycling Durability of Thermal Barrier Coatings Manufactured by PS-PVD[J].Journal of Thermal Spray Technology,2013,23:182-189.
[6]M Góral,J Sieniawski.The technology of Plasma Spray Physical Vapour Deposition J].Journal of Achievements in Materials and Manufacturing Engineering,2012,55:689-693.
[7]郭洪波,宫声凯,徐惠彬.新型高温/超高温热障涂层及制备技术研究进展[J].航空学报,2014,35(10):2722-2732.
[8]倪立勇,戚鹏,杨震晓,杨杰,吴朝军.超低压等离子喷涂技术及应用[J].热喷涂技术,2014,6(10):7-12.
[9]Mark F Smith,Aaron C Hall,James D Fleetwood,et al.Very Low Pressure Plasma Spray-A Review of an Emerging Technology in the Thermal Spray Community[J].Coatings,2011,1:117-132.
[10]National Aeronautics,Space Administration.Plasma Spray-Physical Vapor Deposition(PS-PVD)Facility[EB/OL](2016-08-20)[2017-06-08]hppt://www.grc.nass.gov/WWW/Structures Materials/DPC/facilities/ps_pvd.html.
[11]江剑峰,朱彬若,赵维娜等.等离子切割电源磁性元件的优化设计[J].电气应用,2017,5(36):72-79.
[12]Oerlikon Metco.Thermal Spray Equipment Guide[DB/OL].(2015-11-05)[2017-06-08]https://www.oerlikon.com/metco.
[13]王振民,黄石生,薛家祥等.等离子喷涂设备的现状与进展[J].中国表面工程,2000,4:5-8.
[14]高阳,杨德明.超低压等离子喷涂喷嘴设计与喷枪特性[J].热喷涂技术,2011,3(3):65-70.
[15]K von Niessen,M Gindrat,A Refke.Vapor Phase Deposition Using Plasma Spray-PVDTM[J].Journal of Thermal Spray Technology,2010,19:502-509.
[16]张东辉,郝勇超.国内外等离子喷涂设备现状及发展趋势[J].航空制造技术,2003,7:23-24.
[17]Fauchais P.Current status and future directions of thermal spray coatings and techniques[M].Nuria Espallargas.Future Development of Thermal Spray Coatings,2015:17-49.
[18]中国农机学会农机维修分会.第十二次全国农机维修学术会议论文集[C]//哈尔滨:《农机使用与维修》杂志社,2005.
[19]王永锋,张东辉,郝勇超.等离子喷涂电源发展概述[J].金属加工,2009,18:31-34.
[20]Bryan J Harder,Dongming Zhu,Michael P Schmitt,et al.Microstructural Effects and Properties of Non-line-of-Sight Coating Processing via Plasma Spray-Physical Vapor Deposition[J].Journal of Thermal Spray Technology,2017,26(6):1052-1061.
[21]王岭,焦健,焦春荣.陶瓷基复合材料环境障涂层研究进展[J].航空制造技术,2014,6:50-53.
[22]Bradley T Richards,Haydn N G Wadley.Plasma spray deposition of tri-layer environmental barrier coatings[J].Journal of the European Ceramic Society,2014,34(12):3069-3083.
[23]邓畅光,邓春明,刘敏等.大气和低压等离子喷涂氧化铝涂层[J].材料工程,2008,05:48-56.
[24]Chang C,Shi J,Huang J,et al.Effects of power level on characteristics of vacuum plasma sprayed hydroxyapatite coating[J].Therm.Spray Technol.,1998,7(4):484-488.
[2]Konstantin von Niessen,Malko Gindrat.Plasma Spray-PVD:A New Thermal Spray Process to Deposit Out of the Vapor Phase[J].Journal of Thermal Spray Technology,2011,20:736-743.
[3]G Mauer,M O Jarligo,S Rezanka,et al.Novel Opportunities for Thermal Spray by PS-PVD[J].Surface and Coatings Technology,2015,268:52-57.
[4]A Shinozawa,K Eguchi,M Kambara,et al.Feather-like Structured YSZ Coatings at Fast Rates by Plasma Spray Physical Vapor Deposition[J].Journal of Thermal Spray Technology,2010,19:190-197.
[5]S Rezanka,G Mauer,R Va?en.Improved Thermal Cycling Durability of Thermal Barrier Coatings Manufactured by PS-PVD[J].Journal of Thermal Spray Technology,2013,23:182-189.
[6]M Góral,J Sieniawski.The technology of Plasma Spray Physical Vapour Deposition J].Journal of Achievements in Materials and Manufacturing Engineering,2012,55:689-693.
[7]郭洪波,宫声凯,徐惠彬.新型高温/超高温热障涂层及制备技术研究进展[J].航空学报,2014,35(10):2722-2732.
[8]倪立勇,戚鹏,杨震晓,杨杰,吴朝军.超低压等离子喷涂技术及应用[J].热喷涂技术,2014,6(10):7-12.
[9]Mark F Smith,Aaron C Hall,James D Fleetwood,et al.Very Low Pressure Plasma Spray-A Review of an Emerging Technology in the Thermal Spray Community[J].Coatings,2011,1:117-132.
[10]National Aeronautics,Space Administration.Plasma Spray-Physical Vapor Deposition(PS-PVD)Facility[EB/OL](2016-08-20)[2017-06-08]hppt://www.grc.nass.gov/WWW/Structures Materials/DPC/facilities/ps_pvd.html.
[11]江剑峰,朱彬若,赵维娜等.等离子切割电源磁性元件的优化设计[J].电气应用,2017,5(36):72-79.
[12]Oerlikon Metco.Thermal Spray Equipment Guide[DB/OL].(2015-11-05)[2017-06-08]https://www.oerlikon.com/metco.
[13]王振民,黄石生,薛家祥等.等离子喷涂设备的现状与进展[J].中国表面工程,2000,4:5-8.
[14]高阳,杨德明.超低压等离子喷涂喷嘴设计与喷枪特性[J].热喷涂技术,2011,3(3):65-70.
[15]K von Niessen,M Gindrat,A Refke.Vapor Phase Deposition Using Plasma Spray-PVDTM[J].Journal of Thermal Spray Technology,2010,19:502-509.
[16]张东辉,郝勇超.国内外等离子喷涂设备现状及发展趋势[J].航空制造技术,2003,7:23-24.
[17]Fauchais P.Current status and future directions of thermal spray coatings and techniques[M].Nuria Espallargas.Future Development of Thermal Spray Coatings,2015:17-49.
[18]中国农机学会农机维修分会.第十二次全国农机维修学术会议论文集[C]//哈尔滨:《农机使用与维修》杂志社,2005.
[19]王永锋,张东辉,郝勇超.等离子喷涂电源发展概述[J].金属加工,2009,18:31-34.
[20]Bryan J Harder,Dongming Zhu,Michael P Schmitt,et al.Microstructural Effects and Properties of Non-line-of-Sight Coating Processing via Plasma Spray-Physical Vapor Deposition[J].Journal of Thermal Spray Technology,2017,26(6):1052-1061.
[21]王岭,焦健,焦春荣.陶瓷基复合材料环境障涂层研究进展[J].航空制造技术,2014,6:50-53.
[22]Bradley T Richards,Haydn N G Wadley.Plasma spray deposition of tri-layer environmental barrier coatings[J].Journal of the European Ceramic Society,2014,34(12):3069-3083.
[23]邓畅光,邓春明,刘敏等.大气和低压等离子喷涂氧化铝涂层[J].材料工程,2008,05:48-56.
[24]Chang C,Shi J,Huang J,et al.Effects of power level on characteristics of vacuum plasma sprayed hydroxyapatite coating[J].Therm.Spray Technol.,1998,7(4):484-488.