神龙-Ⅲ直线感应加速器高稳定度恒流源控制系统
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摘要
大功率恒流源是强流直线感应加速器(LIA)的关键设备之一,用于为加速器电感线圈提供大功率准直流驱动电流,其稳定度、纹波系数等指标要求极高。神龙-ⅢLIA恒流源采用串联线性双闭环回路双参量电流调控技术,同时综合应用了以PLC控制器为核心的本地控制、以ARM控制器和工控机为核心的远程控制以及以太网网络通讯技术,实现了强电磁干扰环境下远程控制高稳定性运行。该恒流源在负载0.5～0.6!之间变化、输出电流在50～170A之间变化时调整管压降控制在8V±2V范围内,输出电流纹波和电流稳定度均优于0.5‰。
The high power constant current source is one of the key equipments of the high current linear induction accelerator(LIA)which outputs high power direct current to power the inductor.The requirement of the parameters such as instability,ripple coefficient is very strict.The serial linear dual-loop dual-parameters feedback control technical was applied in the design of the constant current source of Dragon-Ⅲ LIA to adjust the output current.In this device,the local control system based on the PLC controller,the remote control system based on the ARM controller and computer,and the communication system based on the Ethernet were comprehensively applied in the design of the control system,which made its stability very high as it operated under remote control model in high electromagnetic interference circumstance.As the resistance of the load change among 0.5-0.6Ωand the current change among 50-170 A,the voltage drop of the transistor was restricted at 8 V±2 V,and the ripple coefficient and the drift of the current were less than 0.5‰.
The high power constant current source is one of the key equipments of the high current linear induction accelerator(LIA)which outputs high power direct current to power the inductor.The requirement of the parameters such as instability,ripple coefficient is very strict.The serial linear dual-loop dual-parameters feedback control technical was applied in the design of the constant current source of Dragon-Ⅲ LIA to adjust the output current.In this device,the local control system based on the PLC controller,the remote control system based on the ARM controller and computer,and the communication system based on the Ethernet were comprehensively applied in the design of the control system,which made its stability very high as it operated under remote control model in high electromagnetic interference circumstance.As the resistance of the load change among 0.5-0.6Ωand the current change among 50-170 A,the voltage drop of the transistor was restricted at 8 V±2 V,and the ripple coefficient and the drift of the current were less than 0.5‰.
引文
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[4]杨琼松.10MeV LIA大功率高稳定恒流电源的研制[C]//10MeV直线感应加速器文集.1994:146-155.(Yang Qiongsong.Research of constant current source with high power and high stability.Proceedings of the Conference on 10MeV LIA.1994:146-152)
[5]代志勇,章林文,邓建军,等.“神龙-Ⅰ”直线感应加速器束流输运系统设计[J].强激光与粒子束,2001,13(6):78I-784.(Dai Zhiyong,Zhang Linwen,Deng Jianjun,et al.Design of the beam transport system for SL-I LIA.High Power Laser and Particle Beams,2001,13(6):781-784)
[6]赵娟,曹科峰,曹宁翔,等.HL80型低纹波系数大电流程控恒流源研制[J].强激光与粒子束,2010,22(4):807-811.(Zhao Juan,Cao Kefeng,Cao Ningxiang,et al.Development of HL80Low ripple high current computer-controlling constant current source.High Power Laser and Particle Beams,2010,22(4):807-811)
[7]赵娟,李波,于治国,等.大功率恒流源取样电阻设计[J].强激光与粒子束,2012,24(4):925-928.(Zhao Juan,Li Bo,Yu Zhiguo,et al.Design of sampling resistor in high power constant-current source.High Power Laser and Particle Beams,2012,24(4):925-928)
[8]丁卫东,张乔根,邱敏昌,等.高电压恒流源的应用及发展[J].高电压技术,1999,25(4):64-68.(Ding Weidong,Zhang Qiaogen,Qiu Minchang,et al.The Application and development of high voltage constant-current power supply.High Voltage Engineering,1999,25(4):64-68)
[9]赵娟,李波,李玺钦,等.高电磁兼容性大功率恒流源设计与实现[J].强激光与粒子束,2018,30:025007.(Zhao Juan,Li Bo,Li Xiqin,et al.Design and actualization of the high electromagnetic compatibility for high power constant-current supply.High Power Laser and Particle Beams,2018,30:025007)
[10]薛易.高精度程控恒流源设计[J].自动化仪表,2009,30(4):63-65.(XueYi.Design of a high precision program-controlled constant-current source.Process Automation Instrumentation,2009,30(4):63-65)
[11]卫兵,卿燕玲,王敏华,等.一种脉冲高电压测量探头的地电位隔离方法[J].强激光与粒子束,2011,23(8):2234-2238.(Wei Bing,Qing Yanling,Wang Minhua,et al.Ground isolation with common mode inductance for high voltage pulse measurement.High Power Laser and Particle Beams,2011,23(8):2234-2238)