摘要
给出了两种计算界面能各向异性的计算方法.这些方法是基于在定常温度场中温度梯度作用下,通过对含柱状包裹体截面的晶体数值模拟分析而提出的.文中讨论了新方法的误差分析及适用范围.同时,对选择合适的处理含柱状包裹体截面参数给出了一些建议.
Two techniques for calculation of the interfacial energy anisotropy are suggested and examined. The techniques are developed on the basis of analysis of numerical calculations of the shapes of liquid cylindrical inclusions migrating through a crystal under the action of temperature gradient in the case of the stationary thermal conditions. The errors of the suggested techniques and their limits of application are discussed in the paper. Recommendations for selecting the most appropriate cross-sectional areas of cylindrical inclusions for processing are presented.
引文
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