基于连续弯液面构筑的有序阵列模板复制模塑制备图案化聚合物薄膜
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摘要
基于咖啡环理论,利用微米尺度限制下的弯液面溶剂散逸过程获得表面微结构可控的有序阵列,以此为母模板制备聚二甲基硅氧烷(PDMS)弹性印章,通过复制模塑过程实现阵列结构转移.利用广义YoungLaplace方程建立的理论模型分析弯液面聚合物沉积黏连过程,推导出条纹沉积频率与聚合物分子量、基底滑动速率和溶液浓度的关系,理论计算结果与实验现象一致.
Replica molding technology has a reproducible and high-resolution advantage in fabrication of polymer patterns with the feature sizes of sub-micrometer to micrometer. It is critically desirable to develop a low cost and rapid route for building the initialtemplate. In this report,ordered array which could achieve morphological control was continuously supplied from solvent evaporation-driven process in a micron spacing gap by the coffee-stain theory. We use the patterned array as a mother setof the pattern definition of the soft moldpolydimethylsiloxane( PDMS) and obtain transferred patterns through replica molding technology. We also explore the polymer deposition periodically based on the theoretical model of Young-Laplace equation. The results demonstrate that the deposition frequency is influened by molecular weight of polymer,sliding speed of glass plate and concentration of solution. Trends predicted by these calculations agree with experimental behavior.
Replica molding technology has a reproducible and high-resolution advantage in fabrication of polymer patterns with the feature sizes of sub-micrometer to micrometer. It is critically desirable to develop a low cost and rapid route for building the initialtemplate. In this report,ordered array which could achieve morphological control was continuously supplied from solvent evaporation-driven process in a micron spacing gap by the coffee-stain theory. We use the patterned array as a mother setof the pattern definition of the soft moldpolydimethylsiloxane( PDMS) and obtain transferred patterns through replica molding technology. We also explore the polymer deposition periodically based on the theoretical model of Young-Laplace equation. The results demonstrate that the deposition frequency is influened by molecular weight of polymer,sliding speed of glass plate and concentration of solution. Trends predicted by these calculations agree with experimental behavior.
引文
[1]Song W.,Research of Surface Enhanced Raman Scattering and Wettability on Several Micro-nanostructured Materials,Jilin University,Changchun,2007(宋薇.几种微纳米结构材料的表面增强拉曼光谱及浸润性质研究,长春:吉林大学,2007)
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[12]Xie N.,Theoretical Studies on Block Copolymers Assemble Under the Direction of Patterned Substrates,Fudan University,Shanghai,2012(谢楠.图案化衬底诱导下嵌段共聚物自组装的理论研究,上海:复旦大学,2012)
[13]Lin L.,Research on Fabrication of Artificial Microstructure Photoelectric Functional Materials by Nanoimprint Lithography,Nanjing University,Nanjing,2013(林亮.基于纳米压印技术制备人工微结构光电功能材料工艺研究,南京:南京大学,2013)
[14]Jason K.Y.,David M.,Jennifer K.,Ravi F.S.,Appl.Mater.Interfaces,2014,6,14278—14285
[15]Shi J.X.,The Application of Soft Lithography in Polymer Science,University of Science and Technology of China,Hefei,2008(石锦霞.软刻蚀技术在高分子科学中的应用,合肥:中国科学技术大学,2008)
[16]Wu X.S.,Jin B.K.,He P.S.,Chin.J.Chem.Phys.,2003,16(5),406—410(吴晓松,金邦坤,何平笙.化学物理学报,2003,16(5),406—410)
[17]Qin D.,Xia Y.N.,Whitesides G.M.,Nature Protocols,2010,5,491—502
[18]Liu J.P.,Guo B.,He P.S.,Zhang P.J.,Chinese J.Chem.Physics,2004,17(6),779—782(刘建平,郭斌,何平笙,张其锦.化学物理学报,2004,17(6),779—782)
[19]Wang Z.,Xing R.B.,Han Y.C.,Li B.Y.,Chem.J.Chinese Universities,2003,24(5),946—948(王哲,邢汝博,韩艳春,李滨耀.高等学校化学学报,2003,24(5),946—948)
[20]Liu J.P.,Yang X.M.,Zhong H.J.,Wang L.X.,Huang Y.,Materials Review,2010,24(10),84—86(刘建平,杨小敏,钟铧均,王龙祥,黄玉.材料导报,2010,24(10),84—86)
[21]Hiroshi Y.,Masatsugu S.,Langmuir,2005,21,1709—1711
[22]Lu N.,Weng Y.Y.,Acta Phys.Sinica,2014,62(22),393—399(陆乃彦,翁雨燕.物理学报,2014,62(22),393—399)
[23]Su B.,Wu Y.Z.,Meng J.H.,LüJ.J.,Journal of Materal Science&Engineering,2013,31(4),621—626(苏博,吴有智,孟军虎,吕晋军.材料科学与工程学报,2013,31(4),621—626)
[24]Venkateshwar R.D.,Madivala G.B.,J.Phys.Chem.B,2015,119,3860—3867
[25]Tadashi K.,Daisaku K.,Masao D.,Langmuir,2008,24,12369—12374
[26]Liu S.S.,Zhang C.H.,Liu J.M.,Acta Phys.Sinica,2010,59(10),6902—6907(刘思思,张朝辉,刘俊铭.物理学报,2010,59(10),6902—6907)
[27]Guillaume B.,Anna H.,Adrian D.,Kavehpour H.P.,Francois L.,Laurent L.,Journal of Colloid and Interface Science,2012,370,155—161
[28]Yasushi M.,Satoshi W.,Minoru T.M.,Langmuir,2015,31,4121—4128
[29]Ye X.D.,Research on Polymer Mold Fabrication and Variant Nano-imprint Lithography,Xi’an Jiaotong University,Xi’an,2010(叶向东.基于聚合物模板的变种压印工艺研究,西安:西安交通大学,2010)
[2]Liu D.Q.,Dirk J.B.,Langmuir,2014,30,13499—13509
[3]Wei L.H.,Ma J.,Graham M.,Kaushik B.,Stanley P.,Journal of the Optical Society of America A,2013,30,252—258
[4]Song W.,Surface Topography on Protein Adsorption and Cell Adhesion,Wuhan University of Technology,Wuhan,2008(宋巍.聚合物表面拓扑结构对蛋白质吸附、细胞黏附的影响,武汉:武汉理工大学,2008)
[5]Chi W.S.,Jeon Y.,Park S.J.,Kim J.H.,Shul Y.G.,Chem.Plus.Chem.,2014,79,1109—1115
[6]Peng C.C.,Ling S.W.,Bei B.K.,Zhi K.X.,Langmuir,2011,27,12597—12605
[7]Huang C.Y.,Construction of Conducting Polymer Patterns Based on the Nanoimprint Lithography,Jilin University,Changchun,2010(黄春玉.基于纳米压印技术构筑导电高分子图案,长春:吉林大学,2010)
[8]Liu J.P.,Shi J.X.,Yang X.M.,He P.S.,Yang H.Y.,Acta Polymerica Sinica,2007,(1),42—46(刘建平,石锦霞,杨小敏,何平笙,杨海洋.高分子学报,2007,(1),42—46)
[9]Ji Q.,Developing Micro and Nano Pattern by Using the Combination of Photolithography and Reaction-induced Phase Separation,Shanghai Jiaotong University,Shanghai,2008(纪强.结合光刻和反应性相分离技术制备微纳米图形的研究,上海:上海交通大学,2008)
[10]Ma Y.,Fabrication of Patterned and Free-Standing Layer-by-Layer Assembled Multilayer Films,Jilin University,Changchun,2007(马莹.图案化和自支持层状组装膜的制备,长春:吉林大学,2007)
[11]Liu X.,Shen Z.,Wu D.P.,Wang Q.,Qin J.H.,Lin B.C.,Chem.J.Chinese Universities,2008,29(2),298—300(刘欣,沈峥,吴大朋,王琪,秦建华,林炳承.高等学校化学学报,2008,29(2),298—300)
[12]Xie N.,Theoretical Studies on Block Copolymers Assemble Under the Direction of Patterned Substrates,Fudan University,Shanghai,2012(谢楠.图案化衬底诱导下嵌段共聚物自组装的理论研究,上海:复旦大学,2012)
[13]Lin L.,Research on Fabrication of Artificial Microstructure Photoelectric Functional Materials by Nanoimprint Lithography,Nanjing University,Nanjing,2013(林亮.基于纳米压印技术制备人工微结构光电功能材料工艺研究,南京:南京大学,2013)
[14]Jason K.Y.,David M.,Jennifer K.,Ravi F.S.,Appl.Mater.Interfaces,2014,6,14278—14285
[15]Shi J.X.,The Application of Soft Lithography in Polymer Science,University of Science and Technology of China,Hefei,2008(石锦霞.软刻蚀技术在高分子科学中的应用,合肥:中国科学技术大学,2008)
[16]Wu X.S.,Jin B.K.,He P.S.,Chin.J.Chem.Phys.,2003,16(5),406—410(吴晓松,金邦坤,何平笙.化学物理学报,2003,16(5),406—410)
[17]Qin D.,Xia Y.N.,Whitesides G.M.,Nature Protocols,2010,5,491—502
[18]Liu J.P.,Guo B.,He P.S.,Zhang P.J.,Chinese J.Chem.Physics,2004,17(6),779—782(刘建平,郭斌,何平笙,张其锦.化学物理学报,2004,17(6),779—782)
[19]Wang Z.,Xing R.B.,Han Y.C.,Li B.Y.,Chem.J.Chinese Universities,2003,24(5),946—948(王哲,邢汝博,韩艳春,李滨耀.高等学校化学学报,2003,24(5),946—948)
[20]Liu J.P.,Yang X.M.,Zhong H.J.,Wang L.X.,Huang Y.,Materials Review,2010,24(10),84—86(刘建平,杨小敏,钟铧均,王龙祥,黄玉.材料导报,2010,24(10),84—86)
[21]Hiroshi Y.,Masatsugu S.,Langmuir,2005,21,1709—1711
[22]Lu N.,Weng Y.Y.,Acta Phys.Sinica,2014,62(22),393—399(陆乃彦,翁雨燕.物理学报,2014,62(22),393—399)
[23]Su B.,Wu Y.Z.,Meng J.H.,LüJ.J.,Journal of Materal Science&Engineering,2013,31(4),621—626(苏博,吴有智,孟军虎,吕晋军.材料科学与工程学报,2013,31(4),621—626)
[24]Venkateshwar R.D.,Madivala G.B.,J.Phys.Chem.B,2015,119,3860—3867
[25]Tadashi K.,Daisaku K.,Masao D.,Langmuir,2008,24,12369—12374
[26]Liu S.S.,Zhang C.H.,Liu J.M.,Acta Phys.Sinica,2010,59(10),6902—6907(刘思思,张朝辉,刘俊铭.物理学报,2010,59(10),6902—6907)
[27]Guillaume B.,Anna H.,Adrian D.,Kavehpour H.P.,Francois L.,Laurent L.,Journal of Colloid and Interface Science,2012,370,155—161
[28]Yasushi M.,Satoshi W.,Minoru T.M.,Langmuir,2015,31,4121—4128
[29]Ye X.D.,Research on Polymer Mold Fabrication and Variant Nano-imprint Lithography,Xi’an Jiaotong University,Xi’an,2010(叶向东.基于聚合物模板的变种压印工艺研究,西安:西安交通大学,2010)