TiAl镀膜靶材制备工艺对硬质涂层的性能影响研究
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摘要
采用常压烧结和热压烧结分别制备了TiAl合金靶材,并采用溅射镀膜法制备了TiAl硬质涂层。对两种工艺所制备靶材的硬质涂层进行显微组织和相成分分析,并进行耐高温氧化性和力学性能测试。结果表明:采用常压烧结制备的靶材硬质涂层分散不均匀,且致密性较差,氧化速率较快,显微硬度仅为1 798 HV;而采用热压烧结制备的靶材硬质涂层具有高致密度、低孔隙率,晶粒尺寸细小且分布较为均匀,抗氧化性能显著提高,显微硬度高达3 165 HV,较前者提高了76%。
TiAl alloy targets were prepared by pressureless sintering and hot pressing sintering respectively,and TiAl hard coatings were prepared by sputtering deposition method. The microstructure and phase composition of the hard coatings were analyzed,and the high temperature oxidation resistance and mechanical properties of the coatings were also tested. The results show that the hard coating of target material prepared by pressureless sintering is poor in compactness,uneven in dispersion,fast in oxidation rate and only 1 798 HV in microhardness.While the hard coating of target material prepared by hot pressing sintering has the advantages of high density,low porosity,fine grain size,uniform distribution,significantly improved oxidation resistance,which microhardness is as high as 3 165 HV,76% higher than the former.
TiAl alloy targets were prepared by pressureless sintering and hot pressing sintering respectively,and TiAl hard coatings were prepared by sputtering deposition method. The microstructure and phase composition of the hard coatings were analyzed,and the high temperature oxidation resistance and mechanical properties of the coatings were also tested. The results show that the hard coating of target material prepared by pressureless sintering is poor in compactness,uneven in dispersion,fast in oxidation rate and only 1 798 HV in microhardness.While the hard coating of target material prepared by hot pressing sintering has the advantages of high density,low porosity,fine grain size,uniform distribution,significantly improved oxidation resistance,which microhardness is as high as 3 165 HV,76% higher than the former.
引文
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[3]贾国斌,冯寅楠,贾英.磁控溅射用难熔金属靶材制作、应用与发展[J].金属功能材料,2016,23(6):48.
[4]陈希,黄蓉,邬晔.钛铝合金溅射镀膜靶材的研究进展[J].湖南有色金属,2012,28(1):51.
[5]陈利.Ti-Al-N基硬质涂层的热稳定性能/微结构及其力学/切削性能的研究[D].长沙:中南大学,2009.
[6]童洪辉.物理气相沉积硬质涂层技术进展[J].金属热处理,2008,33(1):91.
[7]董亭义,万小勇,章程,等.磁控溅射钛靶材的发展概述[J].金属功能材料,2017,24(5):57.
[8]董亭义,户赫龙,于文军,等.集成电路用钛靶材和铜铬合金背板扩散焊接技术研究[J].金属功能材料,2017,24(6):23.
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