基于质谱诊断的C_4H_8/H_2等离子体状态在放电腔室的径向分布研究
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摘要
利用质谱研究了不同工艺参数下C_4H_8/H_2等离子体的离子组分和能量的径向分布规律,并分析了CH片段的裂解与聚合过程。结果表明,当工作压强较低时(≤7Pa),小分子CH片段的相对密度随径向距离的增大而逐渐减小,大分子CH片段则逐渐增多;随着工作压强的增大,CH片段的相对密度达到极值所对应的径向距离逐渐增大。当射频功率一定时,小分子CH片段的相对密度随径向距离增大而减小,大分子CH片段则逐渐增多。此外,离子能量随径向距离的增大均呈现出逐渐减小的趋势。当工作压强为3Pa、射频功率为20 W时,C_4H_8/H_2等离子体中CH片段的径向分布最均匀,有利于提高辉光放电聚合物薄膜结构与组分的均匀性。
The plasmas of C_4H_8/H_2 mixture gas at different technological parameters were studied using the energy-resolved mass spectrometer.The dissociation,ionization and polymerization during the deposition of glow discharge polymer(GDP)were analyzed.The results show that the relative intensities of small molecule CH fragment ions decrease with increasing radial distance at low work pressure(≤7 Pa),whereas the large CH molecule fragment ions are on the contrary.With the increasing working pressure,the radial distance increases when the relative intensities of CH fragment ions reached the maximum value.At the different radio frequency(RF)power,the relative intensities of small CH molecule fragment ions decrease with increasing radial distance,while the large CH molecule fragment ions increase.Besides,the ion energy decreases with the increase of radial distance at all technological parameters.The radial distribution of relative intensities of CH fragment ions is most uniform under the work pressure of 3 Pa and RF power of 20 W,which contribute to improve the homogeneity of structure and composition of glow discharge polymer film.
The plasmas of C_4H_8/H_2 mixture gas at different technological parameters were studied using the energy-resolved mass spectrometer.The dissociation,ionization and polymerization during the deposition of glow discharge polymer(GDP)were analyzed.The results show that the relative intensities of small molecule CH fragment ions decrease with increasing radial distance at low work pressure(≤7 Pa),whereas the large CH molecule fragment ions are on the contrary.With the increasing working pressure,the radial distance increases when the relative intensities of CH fragment ions reached the maximum value.At the different radio frequency(RF)power,the relative intensities of small CH molecule fragment ions decrease with increasing radial distance,while the large CH molecule fragment ions increase.Besides,the ion energy decreases with the increase of radial distance at all technological parameters.The radial distribution of relative intensities of CH fragment ions is most uniform under the work pressure of 3 Pa and RF power of 20 W,which contribute to improve the homogeneity of structure and composition of glow discharge polymer film.
引文
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23Jiao C Q,Ganguly B N,Garscadden A.Mass spectrometry study of decomposition of exo-tetrahydrodicyclopentadiene by low-power,low-pressure rf plasma[J].Journal of Applied Physics,2009,105(3):1886.
24 Bauer M,Schwarz-Selinger T,Jacob W,et al.Growth precursors for a-C∶H film deposition in pulsed inductively coupled methane plasmas[J].Journal of Applied Physics,2005,98(7):3097.
2 Zhang L,Chen G,He X S,et al.Study of a-C∶H thin film surface morphology evolution mechanism based on dynamic scaling[J].Atomic Energy Science and Technology,2017,51(4):740(in Chinese).张玲,陈果,何小珊,等.基于动力学标度法的a-C∶H薄膜表面微观形貌的演变机理研究[J].原子能科学技术,2017,51(4):740.
3 Plisson T,Colinlalu P,Huser G,et al.Measurement of the equation of state and of the index of refraction of an amorphous glow discharge polymer up to 45GPa[J].Journal of Applied Physics,2016,120(8):1444.
4 Jia X Q,He Z B,Niu Z C.Influnce of heat treatment on the structure and optical properties of glow discharge polymer films[J].Acta Physica Sinica,2013,62(5):056804.
5 Grotjahn T,Aslanbas O,Mee M,et al.Plasma parameter investigation during plasma-enhanced chemical vapor deposition of siliconcontaining diamond-like carbon films[J].Surface and Coatings Technology,2013,237:126.
6 Denysenko I B,Xu S,Long J D,et al.Inductively coupled Ar-CH4-H2plasmas for low-temperature deposition of ordered carbon nanostructures[J].Journal of Applied Physics,2004,98(5):2713.
7 Herrendorf A P,Sushkov V,Hippler R.Mass spectrometric investigations of plasma chemical reactions in a radiofrequency discharge with Ar-C2H2and Ar-C2H2-O2gas mixtures[J].Journal of Applied Physics,2017,121:123303.
8 Hatten C D,Kaskey K R,Warner B J,et al.Thermal decomposition products of butyraldehyde[J].The Journal of Chemical Physics,2013,139:214303.
9 Li R,He Z B,He X S,et al.Influence of radio-frequency power on the state of H2/C4H8 glowing discharge plasma[J].Acta Physica Sinica,2012,61(21):215203(in Chinese).李蕊,何智兵,何小珊,等.射频功率对辉光放电H2/C4H8等离子状态的影响[J].物理学报,2012,61(21):215203.
10 Li R,He Z B,Yang X D,et al.Influence of working pressure on the state of H2/C4H8glowing discharge plasma[J].Acta Physica Sinica,2013,62(5):058104(in Chinese).李蕊,何智兵,杨向东,等.工作压强对射频辉光放电H2/C4H8等离子状态的影响[J].物理学报,2013,62(5):058104.
11 Zhang L,He X S,Chen G,et al.Effects of rf power on chemical composition and surface roughness of glow discharge polymer films[J].Applied Surface Science,2016,366:499.
12 Chen G,Zhang L,He X S,et al.Effect of flow ratio of T2B/H2on glow discharge plasma composition and surface roughness of polymer thin film[J].Atomic Energy Science and Technology,2016,50(9):1658(in Chinese).陈果,张玲,何小珊,等.反式二丁烯与氢气流量比对辉光放电等离子体组分与聚合物薄膜表面粗糙度的影响[J].原子能科学技术,2016,50(9):1658.
13 Colin-Lalu P,Recoules V,Salin G,et al.Dissociation along the principal Hugoniot of the laser Mégajoule ablator material[J].Physical Review E,2016,94:023204.
14 Lu H Y,He X D,Meng J,et al.Reconstruction of Ge spatial distribution in ICF target using PIXE-T[J].Fusion Engineering and Design,2016,113:43.
15 Fang X,Qin L L,Bai G.An introduction to quadrupole mass filter[J].Journal of Chinese Mass Spectrometry Society,2005,26(4):234(in Chinese).方向,覃莉莉,白岗.四极杆质量分析器的研究现状及进展[J].质谱学报,2005,26(4):234.
16 Grill A.Cold plasma materials fabrication:From fundamentals to applications[M].New York:Wiley-IEEE Press,1994:451.
17Jiang X Z,Liu Y X,Bi Z H,et al.Radial density uniformity of dual frequency capacitively coupled plasma[J].Acta Physica Sinica,2012,61(1):15204(in Chinese).蒋相站,刘永新,毕振华,等.双频容性耦合等离子体密度径向均匀性研究[J].物理学报,2012,61(1):15204.
18 Zhang L,Chen G,He Z B,et al.Investigation of working pressure on the surface roughness controlling technology of glow discharge polymer films based on the diagnosed plasma[J].Plasma Science and Technology,2017,19:075505.
19 Lee H C,Lee M H,Chung C W.Experimental observation of the transition from nonlocal to local kinetics in inductively coupled plasmas[J].Applied Physics Letters,2010,96(4):940.
20李定,陈银,马锦,等.等离子体物理学[M].北京:科学出版社,1994.
21 Chen G.Effect of glow discharge plasma on the growth mechanism of a-C∶H films[D].Mianyang:China Academy of Engineering Physics,2016(in Chinese).陈果.辉光放电等离子体状态对α-C∶H薄膜生长规律的影响研究[D].绵阳:中国工程物理研究院,2016.
22 Lee H C,Chung C W.Effect of antenna size on electron kinetics in inductively coupled plasmas[J].Physics of Plasmas,2013,20(10):728.
23Jiao C Q,Ganguly B N,Garscadden A.Mass spectrometry study of decomposition of exo-tetrahydrodicyclopentadiene by low-power,low-pressure rf plasma[J].Journal of Applied Physics,2009,105(3):1886.
24 Bauer M,Schwarz-Selinger T,Jacob W,et al.Growth precursors for a-C∶H film deposition in pulsed inductively coupled methane plasmas[J].Journal of Applied Physics,2005,98(7):3097.