微波电子回旋共振等离子体阴极电子束的实验研究
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摘要
介绍了实验室研制的微波电子回旋共振(ECR)等离子体阴极电子束系统及初步研究结果,该系统包括微波ECR等离子体源、电子束引出极、聚焦线圈等。通过测量水冷靶电流和靶上的束斑尺寸,实验研究了微波ECR等离子体阴极电子束的流强、聚束性能等随电子束系统工作条件的变化。结果表明:微波输入功率越高、引出电压越高,引出电子束流强越大;工作气压对电子束流强的影响较复杂,随气压增加呈现出先降低后升高的特点;在7×10-4Pa的极低气压下电子束流强可达75m A,引出电压9kV;能量利用率可达0.6;调整聚焦线圈的驱动电流,电子束的束斑直径从20mm减小到13mm,电子束流强未有明显变化。
The generation and control of microwave electron cyclotron resonance(ECR) plasma cathode electron beam is studied experimentally. A complete set of discharge, electron beam extraction, focusing and measuring system was set up. The characteristics and performance of microwave ECR plasmas as electron beam extraction source were studied by measuring the current of water cooling target and the beam spot size on the target. Experimental results indicated that both microwave input power and accelerating voltage are conducive to improving electron beam current. The influence of gas pressure on the electron beam current was complex. With the increase of gas pressure, the electron beam current is characterized by decreasing first and then increasing. The extracted electron current of microwave ECR plasma cathode can reach 75 mA at gas pressure of 7×10-4 Pa, and the energy of the electron beam can reach 9 keV. The energy utilization can reach 0.6. By adjusting the current of the focusing coil, the diameter of electron beam spot is reduced from 20 mm to 13 mm and the electron beam current keeps the value unchanged.
The generation and control of microwave electron cyclotron resonance(ECR) plasma cathode electron beam is studied experimentally. A complete set of discharge, electron beam extraction, focusing and measuring system was set up. The characteristics and performance of microwave ECR plasmas as electron beam extraction source were studied by measuring the current of water cooling target and the beam spot size on the target. Experimental results indicated that both microwave input power and accelerating voltage are conducive to improving electron beam current. The influence of gas pressure on the electron beam current was complex. With the increase of gas pressure, the electron beam current is characterized by decreasing first and then increasing. The extracted electron current of microwave ECR plasma cathode can reach 75 mA at gas pressure of 7×10-4 Pa, and the energy of the electron beam can reach 9 keV. The energy utilization can reach 0.6. By adjusting the current of the focusing coil, the diameter of electron beam spot is reduced from 20 mm to 13 mm and the electron beam current keeps the value unchanged.
引文
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[27]Weatherford B R,Foster J E,Kamhawi H.Electron current extraction from a permanent magnet waveguide plasma cathode[J].Rev.Sci.Instrum.,2011,82(9):093507.
[28]Takao Y,Hiramoto K,Nakagawa Y,et al.Electron extraction mechanisms of a micro ECR neutralizer[J].Japanese Journal of Applied Physics,2016,55(7S2):07LD09.
[2]Hirt L,Reiser A,Spolenak R,et al.Additive manufacturing of metal structures at the micrometer scale[J].Advanced Materials,2017,29(17):1604211.
[3]Galchenko N K,Kolesnikova K A,Semenov G V,et al.Application of electron beam equipment based on a plasma cathode gun in additive technology[C].AIPPublishing LLC,2016.020059.
[4]Pedrini D,Albertoni R,Paganucci F,et al.Modeling of LaB6 hollow cathode performance and lifetime[C].64th International Astronautical Congress,2015.170?178.
[5]Ozur G E,Proskurovsky D I,Rotshtein V P,et al.Production and application of low-energy,high-current electron,beams[J].Laser&Particle Beams,2003,21(2):157?174.
[6]Oks E M.Plasma cathode electron sources:physics,technology,applications[M].Wiley VCH,2006.
[7]Dan M G,Katz I.Fundamentals of electric propulsion:ion and hall thrusters[M].California:John Wiley&Sons,Inc.,2008.
[8]Kornilov S Y,Osipov I V,Rempe N G.Generation of narrow focused beams in a plasma-cathode electron gun[J].Instruments&Experimental Techniques,2009,52(3):406?411.
[9]Oks E M,Schanin P M.Development of plasma cathode electron guns[J].Phys.Plasmas,1999,6(5):1649?1654.
[10]Zhirkov I S,Burdovitsin V A,Oks E M,et al.Formation of narrow-focused electron beams generated by a source with a plasma cathode in the forevacuum pressure range[J].Technical Physics,2006,51(6):786?790.
[11]Muhl S,Pérez A.The use of hollow cathodes in deposition processes:a critical review[J].Thin Solid Films,2015,579:174?198.
[12]Cothran C D,Boris D R,Compton C S,et al.Continuous and pulsed electron beam production from an uninterrupted plasma cathode[J].Surface&Coatings Technology,2015,267:111?116.
[13]张连珠,傅凤清,王增波,等.氮气空心阴极辉光放电等离子体离子的蒙特卡罗模拟研究[J].核聚变与等离子体物理,2006,26(2):135?139.
[14]Vizir A,Gushenets V,Nikolaev A,et al.Recent development and applications of electron,ion and plasma sources based on vacuum arc and low pressure glow[C].The IEEE International Conference on Plasma Science,2004.Icops 2004.IEEE Conference Record.IEEEXplore,2004.286.
[15]Oks E M.Physics and technique of plasma electron sources[J].Plasma Sources Science&Technology,1992,1(4):249.
[16]Manheimer W M,Fernsler R F,Gitlin M S.High power,fast,microwave components based on beam generated plasmas[J].IEEE Transactions on Plasma Science,2002,26(5):1543?1555.
[17]Xu J,Tian X,Gong C,et al.A plasma electron source for generating beam plasma at low gas pressures[J].Vacuum,2017,143:407?411.
[18]Vizir A V,Oks E M,Shandrikov M V,et al.A bulk plasma generator based on a plasma cathode discharge[J].Instruments&Experimental Techniques,2003,46(3):384?387.
[19]Pozo S D,Ribton C N,Smith D R.A novel RF excited plasma cathode electron beam gun design[J].IEEETransactions on Electron Devices,2014,61(6):1890?1894.
[20]Longmier B,Hershkowitz N."Electrodeless"plasma cathode for neutralization of ion thrusters[C].AIAA2005?3856,41st Joint Propulsion Conference&Exhibit,Tucson,Arizona1,2005.
[21]Goebel D M,Watkins R M.High current,low pressure plasma cathode electron gun[J].Rev.Sci.Instrum.,2000,71(2):388?398.
[22]Longmier B,Hershkowitz N.Improved operation of the nonambipolar electron source[J].Rev.Sci.Instrum.,2008,79(9):113504?61.
[23]刘明海,胡希伟,吴汉明.ECR等离子体源中基本参数的数值模拟[J].核聚变与等离子体物理,1998,18(2):36?40.
[24]杨涓,冯冰冰,罗立涛,等.氩气和氪气作为ECR中和器工质的性能比较[J].高电压技术,2015,41(9):2850?2855.
[25]Light M,Madziwa-Nussinov T G,Colestock P,et al.Electron beam generation by an electron cyclotron resonance plasma[J].IEEE Transactions on Plasma Science,2009,37(2):317?326.
[26]Manheimer W M,Fernsler R,Lampe M,et al.Theoretical overview of the large area plasma processing system(LAPPS)[C].IEEE International Conference on Plasma Science,2000.Icops 2000.IEEE Conference Record.IEEE Xplore,2000.151.
[27]Weatherford B R,Foster J E,Kamhawi H.Electron current extraction from a permanent magnet waveguide plasma cathode[J].Rev.Sci.Instrum.,2011,82(9):093507.
[28]Takao Y,Hiramoto K,Nakagawa Y,et al.Electron extraction mechanisms of a micro ECR neutralizer[J].Japanese Journal of Applied Physics,2016,55(7S2):07LD09.