亚波长光栅偏振片的纳秒脉冲激光损伤特性
|
摘要
偏振片在诸多光学系统中有着重要的应用。亚波长介质光栅可用作正入射偏振片,在高能激光系统中有着广泛的应用前景。为了探究波长为1 064nm的纳秒脉冲激光对于亚波长全介质光栅的诱导损伤特性,使用了粒子群优化算法结合严格耦合波分析设计了光栅的几何参数,计算表明亚波长光栅偏振片在入射光波长1 064nm附近带宽0.5nm内,平均消光比为1 500。使用了紫外曝光配合离子束刻蚀的工艺制备了HfO2光栅,并对其纳秒脉冲激光损伤阈值进行了测试。测试结果表明S光损伤阈值约为P光损伤阈值的5倍,且都大于5J/cm2。结果表明亚波长全介质光栅偏振片可广泛用于正入射激光系统中。
Polarizers are important components for many optical systems.Sub-wavelength dielectric gratings can be used as polarizers under normal incidence,and these have broad application prospects in high-energy laser systems.In order to investigate the induced damage characteristics of nanosecond pulse laser with wavelength of 1 064 nm for subwavelength all dielectric gratings,the particle swarm optimization algorithm was used to design the geometric parameters of the grating with rigorous coupled wave analysis.The calculation results show that the subwavelength grating polarizer has 0.5 nm bandwidth and a theoretical extinction ratio of 1 500 at wavelength of 1 064 nm.This grating was fabricated by ultraviolet(UV)exposure and ion beam etching,and its nanosecond pulsed laser damage threshold was tested.The test results show that the laser induced damage threshold of S polarized light is about 5 times of that of P polarized light,and all of them are greater than 5 J/cm2.The results indicate that the sub-wavelength all dielectric grating polarizers can be widely used in laser system under normal incidence.
Polarizers are important components for many optical systems.Sub-wavelength dielectric gratings can be used as polarizers under normal incidence,and these have broad application prospects in high-energy laser systems.In order to investigate the induced damage characteristics of nanosecond pulse laser with wavelength of 1 064 nm for subwavelength all dielectric gratings,the particle swarm optimization algorithm was used to design the geometric parameters of the grating with rigorous coupled wave analysis.The calculation results show that the subwavelength grating polarizer has 0.5 nm bandwidth and a theoretical extinction ratio of 1 500 at wavelength of 1 064 nm.This grating was fabricated by ultraviolet(UV)exposure and ion beam etching,and its nanosecond pulsed laser damage threshold was tested.The test results show that the laser induced damage threshold of S polarized light is about 5 times of that of P polarized light,and all of them are greater than 5 J/cm2.The results indicate that the sub-wavelength all dielectric grating polarizers can be widely used in laser system under normal incidence.
引文
[1]LI Shujun,JIANG Huilin,ZHU Jingping,et al.De-velopment status and key technologies of polarizationimaging detection[J].Chinese Optics,2013,6(6):803-809.李淑军,姜会林,朱京平,等.偏振成像探测技术发展现状及关键技术[J].中国光学,2013,6(6):803-809.
[2]KIMEL A V,KIRILYUK A,RASING T.Femto-second opto-magnetism:ultrafast laser manipulationof magnetic materials[J].Laser &Photonics Re-views,2007,1(3):275-287.
[3]MAX B,EMIL W.Principles of optics[M].7th ed.Beijing:Electronie Industry Press,2006:699-701.马科斯·玻恩,埃米尔·沃尔夫.光学原理[M].7版,杨葭荪,译.北京:电子工业出版,2006:699-701.
[4]EKINCI Y,SOLAK H H,DAVID C,et al.BilayerAl wire-grids as broadband and high-performance po-larizers[J]. Optics Express, 2006, 14(6):2323-2334.
[5]TAMADA H,DOUMUKI T,YAMAGUCHI T,etal.Al wire-grid polarizer using the s-polarization res-onance effect at the 0.8-microm-wavelength band[J].Optics Letters,1997,22(6):419-421.
[6]TANG Jinfa,GU Peifu,LIU Xu,et al.Modern op-tical thin film technology[M].Hangzhou:ZhejiangUniversity Press,2007:167-171.唐晋发,顾培夫,刘旭,等.现代光学薄膜技术[M],杭州,浙江大学出版社,2007:167-171.
[7]LEE K J,CURZAN J,SHOKOOH-SAREMI M,etal.Resonant wideband polarizer with single siliconlayer[J]. Applied Physics Letters, 2011,98(21):211112.
[8]LEE K J,GIESE J,AJAYI L,et al.Resonant grat-ing polarizers made with silicon nitride,titanium di-oxide,and silicon:design,fabrication,and charac-terization[J]. Optics Express,2014,22(8):9271-9281.
[9]WANG S S,Magnusson R.Theory and applicationsof guided-mode resonance filters[J].Applied Optics,1993,32(14):2606-2613.
[10]MOHARAM M G,GAYLORD T K.Rigorous cou-pled-wave analysis of planar-grating diffraction[J].Journal of the Optical Society of America,1981,71(7):811-818.
[11]MOHARAM M G,POMMET D A,GRANN E B,et al.Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings:enhancedtransmittance matrix approach[J].Journal of theOptical Society of America A, 1995,12(5):1077-1086.
[12]WANG Xudi,XU Xiangdong,LIU Ying,et al.Ionbeam etching of HfO2film[J].Optics &PrecisionEngineering,2004,12(5):454-458.王旭迪,徐向东,刘颖,等.HfO2薄膜的离子束刻蚀特性研究[J].光学精密工程,2004,12(5):454-458.
[13]XU Xiangdong,LIU Ying,QIU Keqiang,et al.Ionbeam etching of multilayer dielectric pulse compres-sor gratings with top layer of HfO2[J].Acta PhysicaSinica,2013,62(23):165-172.徐向东,刘颖,邱克强,等.HfO2顶层多层介质膜脉宽压缩光栅的离子束刻蚀[J].物理学报,2013,62(23):165-172.
[2]KIMEL A V,KIRILYUK A,RASING T.Femto-second opto-magnetism:ultrafast laser manipulationof magnetic materials[J].Laser &Photonics Re-views,2007,1(3):275-287.
[3]MAX B,EMIL W.Principles of optics[M].7th ed.Beijing:Electronie Industry Press,2006:699-701.马科斯·玻恩,埃米尔·沃尔夫.光学原理[M].7版,杨葭荪,译.北京:电子工业出版,2006:699-701.
[4]EKINCI Y,SOLAK H H,DAVID C,et al.BilayerAl wire-grids as broadband and high-performance po-larizers[J]. Optics Express, 2006, 14(6):2323-2334.
[5]TAMADA H,DOUMUKI T,YAMAGUCHI T,etal.Al wire-grid polarizer using the s-polarization res-onance effect at the 0.8-microm-wavelength band[J].Optics Letters,1997,22(6):419-421.
[6]TANG Jinfa,GU Peifu,LIU Xu,et al.Modern op-tical thin film technology[M].Hangzhou:ZhejiangUniversity Press,2007:167-171.唐晋发,顾培夫,刘旭,等.现代光学薄膜技术[M],杭州,浙江大学出版社,2007:167-171.
[7]LEE K J,CURZAN J,SHOKOOH-SAREMI M,etal.Resonant wideband polarizer with single siliconlayer[J]. Applied Physics Letters, 2011,98(21):211112.
[8]LEE K J,GIESE J,AJAYI L,et al.Resonant grat-ing polarizers made with silicon nitride,titanium di-oxide,and silicon:design,fabrication,and charac-terization[J]. Optics Express,2014,22(8):9271-9281.
[9]WANG S S,Magnusson R.Theory and applicationsof guided-mode resonance filters[J].Applied Optics,1993,32(14):2606-2613.
[10]MOHARAM M G,GAYLORD T K.Rigorous cou-pled-wave analysis of planar-grating diffraction[J].Journal of the Optical Society of America,1981,71(7):811-818.
[11]MOHARAM M G,POMMET D A,GRANN E B,et al.Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings:enhancedtransmittance matrix approach[J].Journal of theOptical Society of America A, 1995,12(5):1077-1086.
[12]WANG Xudi,XU Xiangdong,LIU Ying,et al.Ionbeam etching of HfO2film[J].Optics &PrecisionEngineering,2004,12(5):454-458.王旭迪,徐向东,刘颖,等.HfO2薄膜的离子束刻蚀特性研究[J].光学精密工程,2004,12(5):454-458.
[13]XU Xiangdong,LIU Ying,QIU Keqiang,et al.Ionbeam etching of multilayer dielectric pulse compres-sor gratings with top layer of HfO2[J].Acta PhysicaSinica,2013,62(23):165-172.徐向东,刘颖,邱克强,等.HfO2顶层多层介质膜脉宽压缩光栅的离子束刻蚀[J].物理学报,2013,62(23):165-172.