基于胶体晶体构筑银纳米薄膜及其抑制微放电性能研究
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摘要
近年来,微放电效应的抑制研究在加速器、大功率微波器件等领域得到了广泛的关注。采用聚苯乙烯(PS)胶体晶体模板辅助磁控溅射法制备了类空心球结构的银薄膜,通过调节PS模板尺寸及溅射时间(镀银层厚度),得到具有抑制微放电效应的银薄膜。采用SEM表征银薄膜的形貌与结构,并用二次电子发射系数(SEY)测试平台表征银薄膜的SEY。结果表明,PS模板尺寸及溅射时间对银薄膜形貌及其二次电子抑制作用有显著的影响,当溅射时间为600s,模板尺寸为1 000nm时,银薄膜的SEY较小,即对二次电子的抑制作用较为显著,与初始镀银铝合金样品相比,其SEY值降低了48%。
In recent years,multipactor suppression has been widely concerned in the accelerator,high-power microwave devices and other related fields.In this study,hollow sphere-like silver film was obtained via magnetron sputtering assisted by polystyrene(PS)colloidal crystal template.The second electron suppression effect of the silver film was adjusted by the size of PS template and the sputtering time(thickness of the silver layer).The morphology of silver films was characterized by SEM,and the SEY of silver films was characterized by secondary electron emission(SEY)test platform.The results show that size of PS template and sputtering time have significant effect on the morphology of silver film and its secondary electron suppression.When the sputtering time was 600 sand the template size was 1 000 nm,the maximum SEY of the silver film was relatively low,which meant the second electron suppression effect was more significant.Compared with the initial silver-plated aluminum alloy samples,the SEY value decreased by 48%.
In recent years,multipactor suppression has been widely concerned in the accelerator,high-power microwave devices and other related fields.In this study,hollow sphere-like silver film was obtained via magnetron sputtering assisted by polystyrene(PS)colloidal crystal template.The second electron suppression effect of the silver film was adjusted by the size of PS template and the sputtering time(thickness of the silver layer).The morphology of silver films was characterized by SEM,and the SEY of silver films was characterized by secondary electron emission(SEY)test platform.The results show that size of PS template and sputtering time have significant effect on the morphology of silver film and its secondary electron suppression.When the sputtering time was 600 sand the template size was 1 000 nm,the maximum SEY of the silver film was relatively low,which meant the second electron suppression effect was more significant.Compared with the initial silver-plated aluminum alloy samples,the SEY value decreased by 48%.
引文
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3 Costa Pinto P,Calatroni S,Neupert H,et al.Carbon coatings with low secondary electron yield[J].Vacuum,2013,98(4):29.
4 Pivi M,King F K,Kirby R E,et al.Sharp reduction of the secondary electron emission yield from grooved surfaces[J].Journal of Applied Physics,2008,104(10):104904.
5 Ye M,He Y N,Hu S G,et al.Investigation into anomalous total secondary electron yield for micro-porous Ag surface under oblique incidence conditions[J].Journal of Applied Physics,2014,63(14):
350 (in Chinese).叶鸣,贺永宁,王瑞,等.基于微陷阱结构的金属二次电子发射系数抑制研究[J].物理学报,2014,63(14):350.
6 Bao Y,Zhang Y,Ma J,et al.Controllable fabrication of one-dimensional ZnO nanoarrays and their application in constructing silver trap structures[J].RSC Advances,2014,4(63):33198.
7 Wanke M C,Lehmann O,Müller K,et al.Laser rapid prototyping of photonic band-gap microstructures[J].Science,1997,275(5304):1284.
8 Ye Xin,Zhou Xinda,Huang Jin,et al.Influence of particle concentration on 2Dcolloidal crystals assembled by dip-coating[J].Atomic Energy Science and Technology,2011(4):447(in Chinese).叶鑫,周信达,黄进,等.浓度对提拉组装二维胶晶模板及其缺陷的影响[J].原子能科学技术,2011(4):447.
9 Chen J,Dong P,Di D,et al.Controllable fabrication of 2Dcolloidal-crystal films with polystyrene nanospheres of various diameters by spin-coating[J].Applied Surface Science,2013,270:6.
10 Liau L C K,Chen Y P.Effects of voltage operating strategy on electrophoretic self-assembly deposition of spherical SiO2 particles in water[J].Colloidal and Surfaces A-Physicochemical and Engineering Aspects,2013,429:121.
11 Li Z,Wang W,Zhang L,et al.Magnetically modulated critical current densities of Co/Nb hybrid[J].Scientific reports,2015,5:18601.
12 Zhang H,Duan G,Liu G,et al.Layer-controlled synthesis of WO3ordered nanoporous films for optimum electrochromic application[J].Nanoscale,2013,5(6):2460.
13 Cheng J Y,Ross C A,Chan V Z H,et al.Fabrication of nanopatterned thin films using self-assembled block copolymer lithography[J].Advanced Materials,2001,13:1174.
14 Stewart M E.Quantitative multispectral biosensing and imaging using plasmonic crystals[M].Ann Arbor:ProQuest,2008.
15 Lee K B,Park S J,Mirkin C A,et al.Protein nanoarrays generated by dip-pen nanolithography[J].Science,2002,295(5560):1702.
16 Denkov N,Velev O,Kralchevski P,et al.Mechanism of formation of two-dimensional crystals from latex particles on substrates[J].Langmuir,1992,8(12):3183.
17 Ye X,Li Y,Dong J,et al.Facile synthesis of ZnS nanobowl arrays and their applications as 2Dphotonic crystal sensors[J].Journal of Materials Chemistry C,2013,1(38):6112.
18 Li C,Hong G,Qi L.Nanosphere lithography at the gas/liquid interface:A general approach toward free-standing high-quality nanonets[J].Chemistry of Materials,2009,22(2):476.
19 Kei C C,Chen T H,Chang C M,et al.Preparation of periodic arrays of metallic nanocrystals by using nanohoneycomb as reaction vessel[J].Chemistry of Materials,2007,19(24):5833.
20 Yu J,Yan Q,Shen D.Co-self-assembly of binary colloidal crystals at the air-water interface[J].ACS Applied Materials&Interfaces,2010,2(7):1922.
21 Gao S,Koshizaki N,Li Y,et al.Unique hexagonal non-closepacked arrays of alumina obtained by plasma etching/deposition with catalytic performance[J].Journal of Materials Chemistry,2011,21(7):2087.
22 Montero I,Aguilera L,Dávila M E,et al.Novel types of antiecloud surfaces[J].Physics,doi:10.5170/CERN-2013-002.153.