柔性FEP基底修饰对ZnO:Al薄膜透明导电与附着力性能的影响研究
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摘要
采用O_2等离子体对柔性氟化乙烯丙烯共聚物(FEP)进行表面处理,然后,利用射频磁控溅射法在柔性氟化乙烯丙烯共聚物(FEP)上沉积修饰一层超薄SiO_2,再沉积生长ZnO:Al薄膜。主要研究探讨柔性FEP基底修饰对ZnO:Al薄膜结构、薄膜界面结合状态、薄膜形貌、电学性能、弯曲后电学性能退化、光学性能和薄膜附着力的影响机理,利用XRD、XPS、AFM、SEM、UV-Vis-NIR分光光度计、ScotchTM粘附力测试、PPMS、四探针等表征手段对薄膜结构、成分、形貌、界面及薄膜物理性能进行表征。实验表明:柔性FEP基底经修饰后生长的ZnO:Al薄膜的结晶性能得到明显的提升、薄膜内应力有效降低、SiO_2与柔性基底之间产生少量的化学键合。FEP柔性基底经修饰后,ZnO∶Al薄膜的电学性能、缓减弯曲后的电学性能变化等到明显改善、薄膜附着力有明显提高。
The ultrathin flexible Fluorinated Ethylene Propylene(FEP) substrate was treated by O_2 plasma, then deposited SiO_2 nano layer、ZnO:Al film successively by Radio Frequency magnetron sputtering.We investigate the impacts and mechanism of modifications of flexible FEP substrate, on the film structure, interface bonding states, surface morphology, adhesion, optical and electrical properties of ZnO:Al thin film. The XRD, XPS, AFM, SEM, UV-Vis-NIR spectrophotometer, ScotchTM tape adhension tester, PPMS, four point probe were applied to analysis the film structure, element, surface morphology, interface, and physical properties of ZnO:Al thin film. The experimental results shows that after the flexible substrate modified, the crystalline of ZnO:Al thin film was perfected, the internal stress becoming smaller, few chemical bonding between SiO_2 layer and substrate were produced, hence, the electrical properties, Bending resistance and film-substrate cohesion of ZnO:Al thin film were improved.
The ultrathin flexible Fluorinated Ethylene Propylene(FEP) substrate was treated by O_2 plasma, then deposited SiO_2 nano layer、ZnO:Al film successively by Radio Frequency magnetron sputtering.We investigate the impacts and mechanism of modifications of flexible FEP substrate, on the film structure, interface bonding states, surface morphology, adhesion, optical and electrical properties of ZnO:Al thin film. The XRD, XPS, AFM, SEM, UV-Vis-NIR spectrophotometer, ScotchTM tape adhension tester, PPMS, four point probe were applied to analysis the film structure, element, surface morphology, interface, and physical properties of ZnO:Al thin film. The experimental results shows that after the flexible substrate modified, the crystalline of ZnO:Al thin film was perfected, the internal stress becoming smaller, few chemical bonding between SiO_2 layer and substrate were produced, hence, the electrical properties, Bending resistance and film-substrate cohesion of ZnO:Al thin film were improved.
引文
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[26]Maniv,S.,Westwood,W.D,Colombini,E.Pressure and angle of incidence effects in reactive planar magnetron sputtered ZnO layers[J].Journal of Vacuum Science& Technology,1982,20:162-170.
[27]Dasilva,W.,Entenberg,A.,Kahn,B.,et al.Adhesion of copper to poly(tetrafluoroethylene-co- hexafluoropropylene)(FEP)surfaces modified by vacuum UV photo-oxidation downstream from Ar microwave plasma[J].J.Adhes.Sci.Technol.,2004,18,1465-1481.
[28]Minami,T.,Tsukada,S.,Minamino,Y,et al.Preparation of transparent and conductive multicomponent Zn- In-Sn oxide thin films by vacuum arc plasma evaporation[J].Journal of Vacuum Science&Technology A,2005,23:1128-1132.
[2]Kim,J.H.Park,J.W.Improving the flexibility of large-area transparent conductive oxide electrodes on polymer substrates for flexible organic light emitting diodes by introducing surface roughness[J].Org Electron,2013,14:3444-3452.
[3]Koidis,C.,Logothetidis,S.,Ioakeimidis,A.,et al.Key factors to improve the efficiency of roll-to-roll printed organic photovoltaics[J].Org Electron,201,14:1744-1748.
[4]Sibinski,M.Comparison of ZnO∶Al,ITO and carbon nanotube transparent conductive layers in flexible solar cells applications[J].Mater Sci Eng B-Adv,2012 177,1292-1298.
[5]Tekoglu,S.,Hernandez-Sosa,G.,Kluge,E.,et al.Gravure printed flexible small-molecule organic light emitting diodes[J].Org Electron,2013,14:3493-3499.
[6]Tseng,S.F.Laser scribing of indium tin oxide(ITO)thin films deposited on various substrates for touch panels[J].Appl.Surf.Sci.,2010,257:1487-1494.
[7]Wang,P.C.MacD iarmid,A.G.Integration of polymerdispersed liquid crystal composites with conducting polymer thin films toward the fabrication of flexible display devices[J].Displays,2007,28:101-104.
[8]Yu,X.H.,Wang,Z.,Yu,S.Y.,et al.Micropatterning and transferring of polymeric semiconductor thin films by hot lift-off and polymer bonding lithography in fabrication of organic field effect transistors(OFETs)on flexible substrate[J].Appl.Surf.Sci,2011,257,9264-9268.
[9]陈义川,胡克艳,张效华,等.Al-Sn共掺杂浓度对ZnO薄膜的结构和光电性能的影响[J].中国陶瓷,2018,54(07):1-7.
[10]Fortunato,E.Transparent,conductive ZnO∶Al thin film deposited on polymer substrates by RF magnetron sputtering[J].Surf.Coat.Technol.,2002,151:247-251.
[11]Nomura,K.et al.Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors[J]. Nature,2004,432:488-492.
[12]Moon,C.S.,Chung,Y.M.,Jung,W.S.,et al.The low temperature process design for Al doped ZnO film synthesis on polymer[J].Surf.Coat.Technol,2007,201:5035-5038.
[13]Fahland,M.,Karlsson,P,Charton,C.Low resisitivity transparent electrodes for displays on polymer substrates[J].Thin Solid Films,2001,392:334-337.
[14]Azrak,R.G.Surface property variations in melt-formed thermoplastics[J].J.Colloid Interface Sci,1974,47,779- 794.
[15]郝雷,刁训刚,胡小草.柔性衬底ITO薄膜的制备及其光电性能研究[J].真空科学与技术学报,2008,28:256-260.
[16]高劲松,孙连春,郑宣明,等.在有机玻璃上射频溅射ITO组合薄膜[J].光学技术,2001,27,501-502.
[17]Chiou,B.-S,Hsieh,S.-T.R.f.magnetron-sputtered indium tin oxide film on a reactively ion-etched acrylic substrate[J].Thin Solid Films,1993,229,146-155.
[18]王立铎,李扬,常春,等.聚酰亚胺缓冲层改善氧化铟锡导电阳极在聚乙烯基对苯二酸酯柔性基片上附着力的研究[J].科学通报,2004,24:2536-2539.
[19]Kim,H.M,Kwon,O.J.Enhanced Properties of Transparent Conductive Oxide Films Prepared on PEN Substrates with a(SiO2)(40)(ZnO)(60)Gas Barrier Layer[J].J.Korean Phys.Soc,2009,55;197-201.
[20]De Carvalho,C.N.et al.ITO films with enhanced electrical properties deposited on unheated ZnO- coated polymer substrates[J].Mat Sci Eng B-Solid,2005,118:66-69.
[21]Pei,Z.L.Transparent conductive ZnO∶Al thin films deposited on flexible substrates prepared by direct current magnetron sputtering[J].Thin Solid Films,2006,497:20-23.
[22]Yang,W.J.Fabrication and Characterization of Transparent Conductive ZnO∶Al Thin Films Deposited on Polyethylene Terephthalate Substrates[J].J Am Ceram Soc,2012,95,2140-2147.
[23]Park Jin Woo,K.Y.,Lim Hyuntaek in Materials Research Society(MRS)814((US),2004).
[24]Danson N.,Safi I.,Hall G.W,et al.Techniques for the sputtering of optimum indium-tin oxide films on to room-temperature substrates[J].Surf.Coat.Technol.,1998,99,147-160.
[25]Mote,V.,Purushotham,Y,Dole,B.Williamson-Hall analysis in estimation of lattice strain in nanometer- sized ZnO particles[J].Journal of Theoretical and Applied Physics,2012,6,6.
[26]Maniv,S.,Westwood,W.D,Colombini,E.Pressure and angle of incidence effects in reactive planar magnetron sputtered ZnO layers[J].Journal of Vacuum Science& Technology,1982,20:162-170.
[27]Dasilva,W.,Entenberg,A.,Kahn,B.,et al.Adhesion of copper to poly(tetrafluoroethylene-co- hexafluoropropylene)(FEP)surfaces modified by vacuum UV photo-oxidation downstream from Ar microwave plasma[J].J.Adhes.Sci.Technol.,2004,18,1465-1481.
[28]Minami,T.,Tsukada,S.,Minamino,Y,et al.Preparation of transparent and conductive multicomponent Zn- In-Sn oxide thin films by vacuum arc plasma evaporation[J].Journal of Vacuum Science&Technology A,2005,23:1128-1132.