膜厚对直流反应磁控溅射沉积NiO薄膜的结构与电致变色性能的影响
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摘要
采用直流反应磁控溅射法在FTO玻璃基片上沉积了不同厚度的氧化镍(NiO)薄膜。用X射线衍射仪(XRD)、场发射扫描电子显微镜(SEM)、X射线光电子能谱仪(XPS)、台阶仪、紫外可见分光光度计、电化学工作站,研究了NiO薄膜厚度对其微观结构、形貌,以及电致变色性能的影响。结果表明,随着溅射时间增加,NiO薄膜厚度增加,试样的初始态可见光谱透过率逐渐降低,(200)晶面的XRD衍射峰强度逐渐增加;以1 M KOH溶液作为电解质,随着NiO薄膜厚度增加,薄膜电荷储存量逐渐增大。NiO薄膜厚度为920 nm的试样着色效率最高,达到了23.46 cm2/C;80 nm厚度的薄膜试样光学调制幅度最大,波长550 nm处为40.85%。薄膜越厚,着、褪色时间越长;所有试样着色时间均大于褪色时间,80 nm厚度的薄膜试样的着色、褪色时间最快,分别为4.47 s和2.28 s。
Nickel Oxide( NiO) thin films of various thicknesses were grown on glass substrates by dc reactive magnetron sputtering technique. Structural and electrochromic properties of NiO films as a function with various thickness were investigated by using X-ray diffraction, scanning electron microscope,X-ray photoelectron spectroscopy, step profiler, spectrophotometer and electrochemical workstation. XRD analysis revealed that( 200) is the preferred orientation,and the peak intensity increases with thickness suggesting an improvement of the crystallinity. The transmittance of as-deposited films decreased as the thickness of films increased. Using 1 M KOH for electrolyte,the charge capacity increases with thickness. The coloration efficiency increases with thickness,reaching 23. 46 cm~2/C for the sample with 920 nm after 30 cycles. Transmittance modulation of NiO films reaches 40. 85% at 550 nm for the sample with 80 nm. We used chronoamperometry to calculate coloration/bleaching time of NiO films,and coloration time was long than bleaching time for all the samples. Coloration and bleaching time increases with thickness,and they are 4. 47 s and 2. 28 s for the sample with 80 nm,respectively.
Nickel Oxide( NiO) thin films of various thicknesses were grown on glass substrates by dc reactive magnetron sputtering technique. Structural and electrochromic properties of NiO films as a function with various thickness were investigated by using X-ray diffraction, scanning electron microscope,X-ray photoelectron spectroscopy, step profiler, spectrophotometer and electrochemical workstation. XRD analysis revealed that( 200) is the preferred orientation,and the peak intensity increases with thickness suggesting an improvement of the crystallinity. The transmittance of as-deposited films decreased as the thickness of films increased. Using 1 M KOH for electrolyte,the charge capacity increases with thickness. The coloration efficiency increases with thickness,reaching 23. 46 cm~2/C for the sample with 920 nm after 30 cycles. Transmittance modulation of NiO films reaches 40. 85% at 550 nm for the sample with 80 nm. We used chronoamperometry to calculate coloration/bleaching time of NiO films,and coloration time was long than bleaching time for all the samples. Coloration and bleaching time increases with thickness,and they are 4. 47 s and 2. 28 s for the sample with 80 nm,respectively.
引文
[1]Niklasson G A,Granqvist C G.Electrochromics for smart windows:thin films of tungsten oxide and nickel oxide,and devices based on these[J].Journal of Materials Chemistry,2006,17(2):127-156.
[2]Granqvist C G.Electrochromics for smart windows:Oxide-based thin films and devices[J].Thin Solid Films,2014,564(8):1-38.
[3]Senthilkumar V,Murali K R.Optoelectronic and electrochemical properties of nickel oxide(Ni O)films deposited by DC reactive magnetron sputtering[J].Physica B Physics of Condensed Matter,2008,403(21):4104-4110.
[4]Avenda1o E,Berggren L,Niklasson G A,et al.Electrochromic materials and devices:brief survey and new data on optical absorption in tungsten oxide and nickel oxide films[J].Thin Solid Films,2006,496(1):30-36.
[5]Ahn K S,Nah Y C,Sung Y E.Thickness-dependent microstructural and electrochromic properties of sputter-deposited Ni oxide films[J].Journal of Vacuum Science Technology,2002,20(4):1468-1474.
[6]Chen H L,Lu Y M,Hwang W S.Thickness dependence of electrical and optical properties of sputtered Nickel oxide films[J].Thin Solid Films,2006,514(1-2):361-365.
[7]Pereira S,Gon9alves A,Correia N,et al.Electrochromic behavior of Ni O thin films deposited by e-beam evaporation at room temperature[J].Solar Energy Materials&Solar Cells,2014,120(1):109-115.
[8]Deloach J D,Aita C R.Thickness-dependent crystallinity of sputter-deposited titania[J].Journal of Vacuum Science&Technology A Vacuum Surfaces&Films,1998,16(3):1963-1968.
[9]Kim K S,Winograd N.X-ray photoelectron spectroscopic studies of nickel-oxygen surfaces using oxygen and argon ion-bombardment[J].Surface Science,1974,43(2):625-643.
[10]Oswald S,Brückner W.XPS depth profile analysis of non-stoichiometric Ni O films[J].Surface&Interface Analysis,2004,36(1):17-22.
[11]Jiang S R,Yan P X,Feng B X,et al.The response of a Ni Ox,thin film to a step potential and its electrochromic mechanism[J].Materials Chemistry&Physics,2003,77(2):384-389.
[12]Granqvist C G.Handbook of inorganic electrochromic materials[M].Elsevier,1995.
[13]Liu H,Zheng W,Yan X,et al.Studies on electrochromic properties of nickel oxide thin films prepared by reactive sputtering[J].Journal of Alloys&Compounds,2008,462(1-2):356-361.
[14]Azens A,Kullman L,Vaivars G,et al.Sputter-deposited nickel oxide for electrochromic applications[J].Solid State Ionics,1998,113(6):449-456.
[15]Liu Q,Dong G,Xiao Y,et al.Electrolytes-relevant cyclic durability of nickel oxide thin films as an ion-storage layer in an all-solid-state complementary electrochromic device[J].Solar Energy Materials&Solar Cells,2016,157:844-852.
[16]Al-Ghamdi A A,Abdel-Wahab M S,Farghali A A,et al.Structural,optical and photo-catalytic activity of nanocrystalline Ni O thin films[J].Materials Research Bulletin,2016,75:71-77.
[17]Ren Y,Chim W K,Guo L,et al.The coloration and degradation mechanisms of electrochromic nickel oxide[J].Solar Energy Materials&Solar Cells,2013,116(9):83-88.
[18]Bouessay I,Rougier A,Poizot P,et al.Electrochromic degradation in nickel oxide thin film:a self-discharge and dissolution phenomenon[J].Electrochimica Acta,2005,50(18):3737-3745.
[19]Gorenstein A,Decker F,Estrada W,et al.Electrochromic Ni OxHy,hydrated films:cyclic voltammetry and ac impedance spectroscopy in aqueous electrolyte[J].Journal of Electroanalytical Chemistry&Interfacial Electrochemistry,1990,277(1-2):277-290.
[2]Granqvist C G.Electrochromics for smart windows:Oxide-based thin films and devices[J].Thin Solid Films,2014,564(8):1-38.
[3]Senthilkumar V,Murali K R.Optoelectronic and electrochemical properties of nickel oxide(Ni O)films deposited by DC reactive magnetron sputtering[J].Physica B Physics of Condensed Matter,2008,403(21):4104-4110.
[4]Avenda1o E,Berggren L,Niklasson G A,et al.Electrochromic materials and devices:brief survey and new data on optical absorption in tungsten oxide and nickel oxide films[J].Thin Solid Films,2006,496(1):30-36.
[5]Ahn K S,Nah Y C,Sung Y E.Thickness-dependent microstructural and electrochromic properties of sputter-deposited Ni oxide films[J].Journal of Vacuum Science Technology,2002,20(4):1468-1474.
[6]Chen H L,Lu Y M,Hwang W S.Thickness dependence of electrical and optical properties of sputtered Nickel oxide films[J].Thin Solid Films,2006,514(1-2):361-365.
[7]Pereira S,Gon9alves A,Correia N,et al.Electrochromic behavior of Ni O thin films deposited by e-beam evaporation at room temperature[J].Solar Energy Materials&Solar Cells,2014,120(1):109-115.
[8]Deloach J D,Aita C R.Thickness-dependent crystallinity of sputter-deposited titania[J].Journal of Vacuum Science&Technology A Vacuum Surfaces&Films,1998,16(3):1963-1968.
[9]Kim K S,Winograd N.X-ray photoelectron spectroscopic studies of nickel-oxygen surfaces using oxygen and argon ion-bombardment[J].Surface Science,1974,43(2):625-643.
[10]Oswald S,Brückner W.XPS depth profile analysis of non-stoichiometric Ni O films[J].Surface&Interface Analysis,2004,36(1):17-22.
[11]Jiang S R,Yan P X,Feng B X,et al.The response of a Ni Ox,thin film to a step potential and its electrochromic mechanism[J].Materials Chemistry&Physics,2003,77(2):384-389.
[12]Granqvist C G.Handbook of inorganic electrochromic materials[M].Elsevier,1995.
[13]Liu H,Zheng W,Yan X,et al.Studies on electrochromic properties of nickel oxide thin films prepared by reactive sputtering[J].Journal of Alloys&Compounds,2008,462(1-2):356-361.
[14]Azens A,Kullman L,Vaivars G,et al.Sputter-deposited nickel oxide for electrochromic applications[J].Solid State Ionics,1998,113(6):449-456.
[15]Liu Q,Dong G,Xiao Y,et al.Electrolytes-relevant cyclic durability of nickel oxide thin films as an ion-storage layer in an all-solid-state complementary electrochromic device[J].Solar Energy Materials&Solar Cells,2016,157:844-852.
[16]Al-Ghamdi A A,Abdel-Wahab M S,Farghali A A,et al.Structural,optical and photo-catalytic activity of nanocrystalline Ni O thin films[J].Materials Research Bulletin,2016,75:71-77.
[17]Ren Y,Chim W K,Guo L,et al.The coloration and degradation mechanisms of electrochromic nickel oxide[J].Solar Energy Materials&Solar Cells,2013,116(9):83-88.
[18]Bouessay I,Rougier A,Poizot P,et al.Electrochromic degradation in nickel oxide thin film:a self-discharge and dissolution phenomenon[J].Electrochimica Acta,2005,50(18):3737-3745.
[19]Gorenstein A,Decker F,Estrada W,et al.Electrochromic Ni OxHy,hydrated films:cyclic voltammetry and ac impedance spectroscopy in aqueous electrolyte[J].Journal of Electroanalytical Chemistry&Interfacial Electrochemistry,1990,277(1-2):277-290.