摘要
采用水热法以Cu片为基底,Cu(NO_3)_2为铜源,十二烷基苯磺酸钠(SDBS)为添加剂,通过调节Ag~+浓度,制备不同Ag掺杂Cu_2O(Ag/Cu_2O)薄膜。研究了样品的光电性能及电容-电压特性等,并用X射线衍射(XRD)、扫描电子显微镜(SEM)和能谱仪(EDS)对其晶体结构、形貌及组成进行了表征。结果表明,当体系中Ag~+浓度为0.03 mmol/L时,Ag/Cu_2O薄膜的光电性能最佳,光电压和光电流密度分别为0.458 5 V和3.011 mA·cm~(-2),比Cu_2O薄膜分别提高了0.205 1 V和1.359 mA·cm~(-2);Ag/Cu_2O薄膜的载流子浓度达到3.10×10~(20) cm~(-3),比Cu_2O薄膜提高了2.38×10~(20) cm~(-3)。XRD,SEM和EDS结果显示,Ag/Cu_2O薄膜的结晶性比Cu_2O薄膜好,但其粒径有所增大,Ag/Cu_2O薄膜中Ag元素的原子数分数为0.13%。
Using hydrothermal method,the Ag-doped Cu_2O(Ag/Cu_2O) film was prepared by adjusting the Ag~+ concentration, with Cu films as the substrate, Cu(NO_3)_2 as the copper source, and sodium dodecyl benzene sulfonate(SDBS) as the additive. The photoelectric properties and capacitance-voltage characteristics of the samples were studied. And the crystal structure, morphology and composition were characterized by the X-ray diffraction(XRD), scanning transmission electron microscopy(SEM)and energy dispersive spectroscopy(EDS). The results show that the Ag/Cu_2O film has the best photo-electric property when the Ag~+ concentration in the system is 0.03 mmol/L. The photovoltage and photocurrent densities were 0.458 5 V and 3.011 mA·cm~(-2), respectively, which were 0.205 1 V and 1.359 mA·cm~(-2) higher than those of the Cu_2O film. The carrier concentration of the Ag/Cu_2O film was 3.10×10~(20) cm~(-3), and the concentration of the Ag/Cu_2O film was 2.38×10~(20) cm~(-3) higher than that of the Cu_2O film. The results of the XRD, SEM and EDS show that the crystallinity of the Ag/Cu_2O film is better than that of the Cu_2O film, and the particle size of Ag/Cu_2O is increased. The atom fraction of Ag element in Ag/Cu_2O film is 0.13%.
引文
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