基于EPNP算法的单目视觉测量系统研究
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  • 英文篇名:Monocular vision measurement system based on EPNP algorithm
  • 作者:张慧娟 ; 熊芝 ; 劳达宝 ; 周维虎
  • 英文作者:Zhang Huijuan;Xiong Zhi;Lao Dabao;Zhou Weihu;School of Mechanical Engineering, Hubei University of Technology;Institute of Optics, Chinese Academy of Sciences;
  • 关键词:计算机视觉 ; 姿态 ; EPNP ; 平面靶标
  • 英文关键词:computer vision;;pose;;EPNP;;plane target
  • 中文刊名:HWYJ
  • 英文刊名:Infrared and Laser Engineering
  • 机构:湖北工业大学机械学院;中国科学院光电研究院;
  • 出版日期:2018-12-29 09:33
  • 出版单位:红外与激光工程
  • 年:2019
  • 期:v.48;No.295
  • 基金:中国科学院重点部署项目(KFZD-SW-415-1);中国科学院装备研制项目(YZ201618);; 国家重点研发计划重大科学仪器设备开发(2017YFF0107300);; 大尺寸多站异构网络动态测量与空间位姿溯源方法与技术(2017YFF0204802)
  • 语种:中文;
  • 页:HWYJ201905026
  • 页数:6
  • CN:05
  • ISSN:12-1261/TN
  • 分类号:190-195
摘要
利用计算机视觉进行姿态测量的方法已广泛应用于现代控制、导航、跟踪等多个领域中。研究并设计了一种基于P4P矩形分布的平面靶标和EPNP算法结合的单目视觉姿态测量方法。首先,利用单相机获取平面靶标图像,经图像处理后得到四个特征点的像素坐标,并使用EPNP算法进行姿态解算;其次,对姿态角测量误差进行了仿真分析,为提高姿态测量精度提供了理论指导和依据;最后,提出一种与高精度二维转台结合的坐标系配准方法,利用该方法对三个方向姿态角精度进行验证。实验结果表明:当绕x和y轴的转动角度在[-6°, 6°]时,姿态测量误差小于0.1°,可以满足测量应用需求。
        The method of pose measurement using computer vision is widely used in modern control,navigation, tracking and other fields. A monocular visual pose measurement method was studied and designd based on P4 P rectangular distribution of planar target and EPNP algorithm in this paper. Firstly, a single camera was used to obtain the plane target image. After the image processing, the pixel coordinates of the four feature points were obtained, and the EPNP algorithm was used to perform the attitude calculation. Secondly, the simulation analysis of pose error measurement provides theoretical guidance and basis for improving attitude measurement accuracy. Finally, a coordinate system registration method combined with a high-precision two-dimensional turntable was proposed. The method was used to verify the accuracy of the three-direction attitude angles. The experimental results show that the rotation angle around the x and y axes is [-6°, 6°], the pose measurement error is less than 0.1° to meet the measurement application requirements.
引文
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