激光诱导钡化合物化学反应刻蚀石英玻璃的机理
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摘要
提出了两种利用红外激光诱导钡化合物化学反应刻蚀石英玻璃的新方法,钡化合物分别选用BaCrO_4和Ba(OH)_2。通过能谱分析进行推理和利用X射线衍射图谱分析和验证,发现激光诱导BaCrO_4化学反应刻蚀石英玻璃过程中得到的微通道出现崩边和微裂纹现象,BaCrO_4分解生成的Ba O在高温条件下与SiO_2发生化学反应生成BaSiO_3,因此这种方法能直接用于刻蚀石英玻璃;在激光诱导Ba(OH)_2化学反应刻蚀石英玻璃的过程中,Ba(OH)_2以及其分解生成的Ba O在高温条件下都会与SiO_2发生化学反应生成BaSiO_3,也能直接刻蚀石英玻璃。两种方法的刻蚀机理不同,故刻蚀效果存在较大差异。
Two new methods for etching quartz glass by infrared-laser-induced chemical reactions of barium compounds are proposed, where the two barium compounds are BaCrO_4 and Ba(OH)_2,respectively. Via the deduction by the energy dispersive X-ray spectrometer and the analysis and test by the X-ray diffraction( XRD), it is found that micro-cracks and edges occur in the micro-channels obtained in the process of etching quartz glass by laser-induced chemical reactions of BaCrO_4. Meanwhile, the decomposition of BaCrO_4 produces Ba O, which has a chemical reaction with SiO_2 to generate BaSiO_3 at high temperature, and thus this method can be used for etching quart glass directly. In the process of etching quartz glass by laser-induced chemical reactions of Ba(OH)_2, both Ba(OH)_2 and its decomposed Ba O have chemical reactions with SiO_2 at high temperature to generate BaSiO_3, and thus this method can also be used for etching quartz glass directly. Different etching mechanisms for these two methods lead to relatively obvious difference of etching quality.
Two new methods for etching quartz glass by infrared-laser-induced chemical reactions of barium compounds are proposed, where the two barium compounds are BaCrO_4 and Ba(OH)_2,respectively. Via the deduction by the energy dispersive X-ray spectrometer and the analysis and test by the X-ray diffraction( XRD), it is found that micro-cracks and edges occur in the micro-channels obtained in the process of etching quartz glass by laser-induced chemical reactions of BaCrO_4. Meanwhile, the decomposition of BaCrO_4 produces Ba O, which has a chemical reaction with SiO_2 to generate BaSiO_3 at high temperature, and thus this method can be used for etching quart glass directly. In the process of etching quartz glass by laser-induced chemical reactions of Ba(OH)_2, both Ba(OH)_2 and its decomposed Ba O have chemical reactions with SiO_2 at high temperature to generate BaSiO_3, and thus this method can also be used for etching quartz glass directly. Different etching mechanisms for these two methods lead to relatively obvious difference of etching quality.
引文
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[2]Yang G S,Chen T,Chen H.The study on crack-free of silica glass micro-groove etched by 248 nm excimer laser[J].Chinese Journal of Lasers,2017,44(9):0902004.杨桂栓,陈涛,陈虹.248 nm准分子激光无裂损刻蚀石英玻璃表面微通道的实验研究[J],中国激光,2017,44(9):0902004.
[3]Xing S L,Liu L,Zou G S,et al.Effect of femtosecond laser parameters on hole drilling of silica glass[J].Chinese Journal of Lasers,2015,42(4):0403001.邢松龄,刘磊,邹贵生,等.飞秒激光参数对石英玻璃微孔加工的影响[J],中国激光,2015,42(4):0403001.
[4]Cheng Z,Guo W,Liu L,et al.Mechanical properties of microweld of silica glass to silica by femtosecond laser[J].Chinese Journal of Lasers,2015,42(9):0906004.程战,郭伟,刘磊,等.石英玻璃与硅的飞秒激光微连接及其接头性能研究[J].中国激光,2015,42(9):0906004.
[5]Wu D J,Zhou S Y,Ma G Y,et al.Experiment of quartz glass flute precise thinning by femtosecond laser[J].Chinese Journal of Lasers,2015,42(3):0303009.吴东江,周思雨,马广义,等.飞秒激光精密减薄石英玻璃凹槽实验[J].中国激光,2015,42(3):0303009.
[6]Yoshizo K,Hiroyuki N,Tadatake S,et al.A deep micro-trench on silica glass fabricated by laser induced backside wet etching(LIBWE)[J].Journal of Physics,2007,59:380-383.
[7]Wang S.A study on laser etching and polishing quartz glass technology[D].Wuhan:Huazhong University of Science and Technology,2012:4-5.王汕.激光刻蚀抛光石英玻璃工艺研究[D].武汉:华中科技大学,2012:4-5.
[8]Huang Y Y,Qian J,Shao C Y,et al.Femtosecond laser induced defects in pure silica glass with different hydroxyl concentration[J].Chinese Journal of Lasers,2017,44(1):0102011.黄媛媛,钱静,邵冲云,等.飞秒激光在不同羟基浓度纯石英玻璃内部诱导缺陷研究[J].中国激光,2017,44(1):0102011.
[9]Hao Y F,Sun M Y,Shi S,et al.Research on rear surface damage in picosecond laser ablation of K9 glass[J].Chinese Journal of Lasers,2017,44(1):0102015.郝燕飞,孙明营,时双,等.皮秒激光烧蚀K9玻璃后表面损伤研究[J].中国激光,2017,44(1):0102015.
[10]Dai Y T,Xu G,Cui J L.3D micro ablation technique of transparent materials using deep ultraviolet laser[J].Applied Laser,2009,29(5):411-414.戴玉堂,徐刚,崔健磊.透明材料的深紫外激光三维微刻蚀工艺[J].应用激光,2009,29(5):411-414.
[11]Zhang J,Sugioka K,Takahashi T,et al.Dual-beam ablation of fused silica by multiwavelength excitation process using Kr F excimer and F2lasers[J].Applied Physics A:Materials Science and Processing,2000,71(1):23-26.
[12]张霞,孙挺,韩义德,等.无机化学[M].2版.北京:冶金工业出版社,2015:281-282.
[13]Lorenz P,Ehrhardt M,Zimmer K.Laser-induced front side etching of quartz glass with Kr F excimer laser using thin chromium layers[J].Applications and Material Science,2012,209(6):1114-1118.
[14]Hamdani A H,Ansar A,Akhter R,et al.Laser induced backside dry etching of BK-7 and quartz in vacuum[J].Key Engineering Materials,2012,510/511:261-264.
[15]Zimmer K,B9hme R,Ruthe D,et al.Backside laser etching of quartz glass using liquid gallium[J].Applied Physics A:Materials Science and Processing,2006,84(4):455-458.
[16]Tsvetkova M Y,Yusupova V I,Minaeva N V,et al.On the mechanisms of single-pulse laser-induced backside wet etching[J].Optics&Laser Technology,2017,88:17-23.
[17]Nieto D,Cambronero F,Flores-Arias M T,et al.Aluminum thin film enhanced IR nanosecond laserinduced frontside etching of transparent materials[J].Optics and Lasers in Engineering,2017,88:233-242.
[18]Lan B,Hong M H,Ye K D,et al.Laser precision engineering of glass substrates[J].Japanese Journal of Applied Physics,2004,43(10):7102-7106.
[19]Ihlemann J,Wolff B,Simon P.Nanosecond and femtosecond excimer laser ablation of fused glass[J].Applied Physics A:Materials Science and Processing,1992,54(4):363-368.
[20]卢拴仓.钡化合物对双基推进剂燃烧性能及燃气红外通过率的影响[J].火炸药,1993(2):18-22.