基于CFD研究电场力对陶瓷静电施釉的影响
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  • 英文篇名:CFD-Based Study of Electric Force Impact on Electrostatic Glazing
  • 作者:韩文 ; 吴琦 ; 徐晗 ; 王伟
  • 英文作者:HAN Wen;WU Qi;XU Han;WANG Wei;School of Mechanical and Electronic Engineering,Jingdezhen Ceramic Institute;
  • 关键词:静电场 ; 施釉 ; 釉滴 ; CFD ; 粒径 ; 运动速度
  • 英文关键词:electrostatic field;;glazing;;glaze drip;;CFD;;particle diameter;;velocity
  • 中文刊名:TCXB
  • 英文刊名:Journal of Ceramics
  • 机构:景德镇陶瓷学院机械电子工程学院;
  • 出版日期:2015-06-17 15:13
  • 出版单位:陶瓷学报
  • 年:2015
  • 期:v.36
  • 语种:中文;
  • 页:TCXB201503019
  • 页数:5
  • CN:03
  • ISSN:36-1205/TS
  • 分类号:96-100
摘要
针对陶瓷在施釉过程中,制品表面釉滴分布不均匀的问题,采用欧拉-拉格朗日法构建了在静电场力作用下的DPM模型,并基于CFD软件分析了未加入电压、加入-15 k V,-30 k V电压和-50 k V电压四种情况下陶瓷静电施釉中釉滴的粒径和运动速度分布情况。结果表明:在静电场作用下,可使得喷枪的喷幅变宽、能产生较小、均匀的釉滴粒径,并能提高釉滴的运动速度且分布均匀。其中在施加-30 k V电压条件下釉滴粒径均匀,施釉的效果最好。
        In order to solve the inhomogeneity of glaze drip distribution on the ceramic surface in the progress of electrostatic spraying, the Euler-Lagrange method was adopted to establish a DPM model for the action in electrostatic field, then the CFD software was used to analyze the glaze drip diameter distribution and the velocity distribution under unapplied voltage,-15 k V,-30 k V and-50 k V. The Result showed that electrostatic glazing broadened glazing range, produced smaller and well-distributed glaze drip diameters, increased the speed of glaze droplets and made their velocities more uniform. The best glazing performance was achieved with the most evenly distributed glaze drip under the applied voltage of-30 k V.
引文
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