水肥一体化条件下施氮量对小麦旗叶叶绿素荧光特性及产量的影响
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  • 英文篇名:Effect of Nitrogen Application Rate on Flag Leaf Chlorophyll Fluorescence Characteristics and Yield in Wheat under Integration of Water and Fertilizer
  • 作者:郭培武 ; 石玉 ; 赵俊晔 ; 于振文
  • 英文作者:GUO Peiwu;SHI Yu;ZHAO Junye;YU Zhenwen;Ministry of Agriculture Key Laboratory of Crop Ecophysiology and Farming System,Shandong Agricultural University;Agricultural Information Institute,Chinese Academy of Agricultural Sciences;
  • 关键词:小麦 ; 水肥一体化 ; 施氮量 ; 旗叶叶绿素荧光特性 ; 产量
  • 英文关键词:Wheat;;Integration of water and fertilizer;;Nitrogen application rate;;Flag leaf chlorophyll fluorescence characteristics;;Grain yield
  • 中文刊名:MLZW
  • 英文刊名:Journal of Triticeae Crops
  • 机构:山东农业大学农业部作物生理生态与耕作重点实验室;中国农业科学院农业信息研究所;
  • 出版日期:2018-07-24 11:28
  • 出版单位:麦类作物学报
  • 年:2018
  • 期:v.38;No.250
  • 基金:农业部现代小麦产业技术体系项目(CARS-3-1-19);; 国家自然科学基金项目(31601243);; 山东省科技发展计划项目(2014GNC111017)
  • 语种:中文;
  • 页:MLZW201808016
  • 页数:7
  • CN:08
  • ISSN:61-1359/S
  • 分类号:110-116
摘要
为探讨水肥一体化条件下施氮量对小麦旗叶叶绿素荧光特性及籽粒产量的影响,以小麦品种济麦22为试验材料,设每公顷施纯氮0(N0)、150(N1)、180(N2)、210(N3)和240kg(N4)五个处理,通过大田试验分析了不同处理间小麦旗叶PSⅡ最大光化学量子效率(F_v/F_m)、PSⅡ实际光化学效率(ΦPSⅡ)、叶绿素相对含量、籽粒灌浆速率及产量的差异。结果表明,花后14~35d,小麦旗叶F_v/F_m在N3和N4处理间无显著差异,但二处理显著高于其他处理。花后0~35d,N3处理的旗叶ΦPSⅡ最高,施氮量再增加至N4时,ΦPSⅡ无显著变化。花后14~28d,N3和N4处理的旗叶叶绿素相对含量显著高于其他处理;花后35d,N3处理显著高于N4处理。粒重和灌浆速率在灌浆前期均随施氮量增加而降低;灌浆后期N3与N4处理间粒重和灌浆速率无显著差异,但二处理显著高于其他处理。籽粒产量在N3处理下最高;在施氮量增加至N4时,籽粒产量不再增加,且氮肥生产效率和氮肥农学效率分别下降了14.6%和24.0%。在本试验条件下,210kg·hm~(-2)是兼顾高产和高效的最佳施氮量。
        In order to explore the effects of nitrogen application rate on flag leaf chlorophyll fluorescence characteristics and grain yield under integration of micro-sprinkler irrigation and fertilization conditions of wheat,using wheat Jimai 22 as the test material,five nitrogen treatments were set up at 0(N0),150(N1),180(N2),210(N3)and 240(N4)kg·hm~(-2) levels.The flag leaf maximum photochemical quantum yield of PSⅡ(F_v/F_m),the actual photochemical efficiency(ΦPSⅡ),the relative content of flag leaf chlorophyll,grain filling rate and yield under different treatments were analyzed.The results showed that,during 14 to 35 days after anthesis of wheat,there was no significant difference in flag leaf maximum photochemical quantum yield of PSⅡ(F_v/F_m)between flag leaves of N3 and N4,which was significantly higher than that under other treatments;during 0 to 35 days after anthesis,the actual photochemical efficiency(ΦPSⅡ)of N3 was the highest.When the nitrogen application amount increased to N4,no significant increase was found inΦPSⅡ.Compared with other treatments,therelative content of flag leaf chlorophyll of N3 and N4 was significantly elevated during 14 to 28 days after anthesis,and that of N3 was significantly higher than that of N4 at 35 days after anthesis.At earlier grain filling stage,grain weight and grain filling rate were decreased with the increase of nitrogen application rate;at later filling stage,those of N3 and N4 treatments were significantly higher than those under other treatments,and no significant difference was found between N3 and N4.The highest grain yield was obtained at nitrogen application rate of 210 kg·hm~(-2).When nitrogen application amount was increased to 240 kg·hm~(-2),the grain yield was increased no longer,but the nitrogen fertilizer efficiency and the nitrogen agronomic efficiency were decreased by 14.6% and 24.0%,respectively.Under this test conditions,210 kg·hm~(-2) is the best nitrogen application level with both high yield and high nitrogen efficiency.
引文
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