PCrNi3Mo钢表面磁控溅射CrN涂层工艺优化及性能
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摘要
采用磁控溅射技术在PCrNi3Mo钢表面沉积了CrN涂层。利用激光共聚焦显微镜、扫描电镜(SEM)、纳米压痕仪、X射线衍射仪(XRD)对涂层的形貌、硬度与弹性模量和相结构进行了表征,研究了基体负偏压、溅射电流和N2/Ar流量比对溅射涂层结构和力学性能的影响。结果表明:在基体负偏压为100 V、溅射电流为0.2 A、N2/Ar流量比为1时溅射的CrN涂层质量最佳,其硬度和弹性模量分别为21.38 GPa和272.71 GPa,较PCrNi3Mo钢基体的硬度(5.57 GPa)与弹性模量(258 GPa)明显提高。
CrN coating was deposited on PCrNi3 Mo steel surface by magnetron sputtering technology. The morphology,hardness,elasticity modulus and phase structure of the coatings were characterized by means of laser confocal scanning microscopy,scanning electron microscopy( SEM),nanoindentation test and X-ray diffraction( XRD). The effects of substrate negative bias voltage,sputtering current and N2/Ar flow ratio on the structure and mechanical property of the coatings were investigated. The results show that the Cr N coating has the best quality when the negative bias is 100 V,the sputtering current is 0. 2 A and N2/Ar flow ratio is 1,and the hardness and elasticity modulus are 21. 38 GPa and 272. 71 GPa,respectively,which are higher than that of the PCrNi3Mo steel substrate hardness( 5. 57 GPa)and elastic modulus( 258 GPa).
CrN coating was deposited on PCrNi3 Mo steel surface by magnetron sputtering technology. The morphology,hardness,elasticity modulus and phase structure of the coatings were characterized by means of laser confocal scanning microscopy,scanning electron microscopy( SEM),nanoindentation test and X-ray diffraction( XRD). The effects of substrate negative bias voltage,sputtering current and N2/Ar flow ratio on the structure and mechanical property of the coatings were investigated. The results show that the Cr N coating has the best quality when the negative bias is 100 V,the sputtering current is 0. 2 A and N2/Ar flow ratio is 1,and the hardness and elasticity modulus are 21. 38 GPa and 272. 71 GPa,respectively,which are higher than that of the PCrNi3Mo steel substrate hardness( 5. 57 GPa)and elastic modulus( 258 GPa).
引文
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[2]Sanche'z J E,Sanche'z O M,Ipaz L,et al.Mechanical,tribological,and electrochemical behavior of Cr1-xAlxN coatings deposited by r.f.reactive magnetron co-sputtering method[J].Applied Surface Science,2010,256(8):2380-2387.
[3]Kolk G V D,Hurkmans T,Strondl C,et al.Perspective for replacement of hard chrome by PVD[J].Surface and Coatings Technology,2000,55(295):38-47.
[4]Li W Z,Chen Q Z,Polcar T,et al.Influence of Zr alloying on the mechanical properties,thermal stability and oxidation resistance of Cr-Al-N coatings[J].Applied Surface Science,2014,317:269-277.
[5]金浩,李德元,郭策安,等.PCr Ni3Mo钢表面磁控溅射Cr Al N的结构及力学性能分析[J].铸造技术,2015,36(6):1467-1470.JIN Hao,Li De-yuan,GUO Ce-an,et al.Study on mechanical property and microstructure of Cr Al N coatings on PCr Ni3Mo steel deposited by magnetron sputtering[J].Foundry Technology,2015,36(6):1467-1470.
[6]谈淑咏,张旭海,李纪宏,等.基底负偏压对直流磁控溅射Cr N涂层择优取向及表面形貌的影响[J].功能材料,2010,41(6):1015-1018.TAN Shu-yong,ZHANG Xu-hai,LI Ji-hong,et al.Effects of substrate negative bias voltages on preferred orientation andnsurface morphology of Cr N films deposited by DC reactive magnetron sputtering[J].Journal of Functional Materials,2010,41(6):1015-1018.
[7]张剑.磁控溅射纳米硬质膜工艺及力学性能研究[D].沈阳:沈阳理工大学,2014.ZHANG Jian.Research on process and mechanical properties of nano-hardness films deposited by magnetron sputtering[D].Shen yang:Shenyang Ligong University,2014.
[8]Beake B D,Vishnyakov V M,Colligon J S.Nano-impact testing of Ti Fe N and Ti Fe Mo N coating for dynamic toughness evaluation[J].Journal of Physics D Applied Physics,2011,44(8):085301.
[9]Chen J,Ji R,Khan R H U,et al.Effects of mechanical properties and layer structure on the cyclic dynamic loading of Ti N-based coatings[J].Surface and Coatings Technology,2011,206(2):522-529.
[10]Lin J,Wu Z L,Zhang X H,et al.A comparative study of Cr Nx,coatings synthesized by dc and pulsed dc magnetron sputtering[J].Thin Solid Coating,2009,517(6):1887-1894.
[11]朱圣龙,王福会,吴维畦.反应溅射动力学理论及应用[M].北京:中国科学技术出版社.1999.
[12]李戈扬,张俊秋,韩增虎,等.氮分压对Cr Nx涂层相结构与力学性能的影响[J].电子显微学报,2002,21(5):629-630.1999.LI Ge-yang,ZHANG Jun-qiu,HAN Zeng-hu,et al.Effect of nitrogen partial pressure on phase structure and mechanical properties of Cr Nx coating[J].Journal of Chinese Electron Microscopy Society,2002,21(5):629-630.1999.
[13]田俊红.磁控溅射制备Cr Nx涂层及其结构和性能研究[J].真空与低温,2007,13(3):159-162TIAN Jun-hong.The structural and mechanical properties of Cr Nx thin films prepared by reactive magnetron sputtering[J].Vacuum and Cryogenics,2007,13(3):159-162.
[14]谈淑咏,张旭海,吴湘君,等.氮流量比对直流反应磁控溅射射频制备氮化铬涂层组织和性能的影响[J].机械工程材料,2010,34(7):34-37.TAN Shu-yong,ZHANG Xu-hai,WU Xiang-jun,et al.Synthesis and corrosion resistance of magnetron sputtered Cr N coatings[J].Chinese Journal of Vacuum Science and Technology,2010,34(7):34-37.
[15]Meunier C,Vives S,Bertrand G.X-ray diffractometry analysis of r.f.-magnetron-sputtered chromium/chromium nitride coatings[J].Surface and Coatings Technology,1998,107(2):149-158.
[16]乔保卫,刘正堂,李阳平.工艺参数对磁控溅射反应溅射Al N涂层沉积速率的影响[J].西北工业大学学报,2004,22(2):260-263.QIAO Bao-wei,LIU Zheng-tang,LI Yang-ping.Effect of technical parameters on deposition rate of Al N films prepared by magnetron reactive sputtering[J].Journal of Northwestern Polytechnical University,2004,22(2):260-263.