镍磷化学镀温度对活塞杆用45钢表面Ni-P/TiN/DLC三层膜结合及划痕性能的影响
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摘要
为了提高Ni-P/Ti N/类金刚石(DLC)三层膜的结合及划痕性能,选择45钢作为基体材料在不同温度下化学镀Ni-P层,然后利用过滤阴极真空电弧(FCVA)技术在其上依次沉积Ti N过渡层及DLC层制备得到了NiP/Ti N/DLC三层膜,对三层膜试样采用纳米压痕仪、拉曼光谱仪以及光学显微镜进行了相关性能测试。结果表明:随镍磷化学镀温度的上升,试样的G峰与M峰往更高波段处发生偏移,两者积分强度比AG/AM也随之增加;当镍磷化学镀温度到达500℃时,AG/AM比值迅速增大为3.64,石墨相数量增加,降低了三层膜的脆性;在初期压头刚压入三层膜时,试样的硬度都表现为随压入深度增加而减小的变化规律;在临界载荷F_1处形成了半圆形的裂痕,并且沿着和划动方向相反的方向发生弯曲。
In order to improve the binding and scratch performances of the Ni-P/Ti N/DLC three-layer film,the Ni-P layer was electroless plated on the 45 steel at different temperatures,and then the Ti N intermediate layer and the diamond-like carbon( DLC) layer were prepared by filtered cathodic vacuum arc( FCVA) method successively to obtain the Ni-P/Ti N/DLC three-layer film. The properties of three-layer film were studied by nanometer indentation instrument,Raman spectrometer and optical microscope. Results showed that with the increase of the nickel-phosphorus electroless plating temperature,the G peak and M peak of the sample deviated towards higher wavelength,and the integral intensity ratios of AG/AM also increased and more graphite phase formed in the surface DLC film of the three-layer film,which reduced the brittleness of the film. When the nickel-phosphorus electroless plating temperature reached 500 ℃,the AG/AM ratio increased to 3.64 rapidly. Moreover,when the initial press head was pressed into the three-layer film,the hardness of samples showed the change rule of decreasing as the depth of injection increasing. At the critical load F1,a semi-circular crack formed and curved along the direction opposite to the direction of the stroke.
In order to improve the binding and scratch performances of the Ni-P/Ti N/DLC three-layer film,the Ni-P layer was electroless plated on the 45 steel at different temperatures,and then the Ti N intermediate layer and the diamond-like carbon( DLC) layer were prepared by filtered cathodic vacuum arc( FCVA) method successively to obtain the Ni-P/Ti N/DLC three-layer film. The properties of three-layer film were studied by nanometer indentation instrument,Raman spectrometer and optical microscope. Results showed that with the increase of the nickel-phosphorus electroless plating temperature,the G peak and M peak of the sample deviated towards higher wavelength,and the integral intensity ratios of AG/AM also increased and more graphite phase formed in the surface DLC film of the three-layer film,which reduced the brittleness of the film. When the nickel-phosphorus electroless plating temperature reached 500 ℃,the AG/AM ratio increased to 3.64 rapidly. Moreover,when the initial press head was pressed into the three-layer film,the hardness of samples showed the change rule of decreasing as the depth of injection increasing. At the critical load F1,a semi-circular crack formed and curved along the direction opposite to the direction of the stroke.
引文
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[2]WU K,YUAN H Z,LIANG X Q.Size Dependence of Buckling Strains of Cr Films,Cu Films and Cu/Cr Multilayers on Compliant Substrates[J].Scripta Materialia,2018,146(1):1-4.
[3]XU Z Y,SUN H,LENG Y X,et al.Effect of Modulation Periods on the Microstructure and Mechanical Properties of DLC/Ti C Multilayer Films Deposited by Filtered Cathodic Vacuum Arc Method[J].Applied Surface Science,2015,328(9):319-324.
[4]贺腾飞,吴有智,许佼,等.不同调制周期MoS2/DLC多层薄膜结构及摩擦学性能[J].摩擦学学报,2017,37(1):36-43.
[5]王飞飞,何乃如,吉利,等.Cr/Cr2O3三层膜的制备、力学及摩擦学性能研究[J].摩擦学学报,2016,36(2):226-232.
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[7]PATRU M,GABOR C,CRISTEA D,et al.Mechanical and Wear Characteristics of a-C:H/Cr/Al N/Ti Multilayer Films Deposited by PVD/PACVD[J].Surface and Coatings Technology,2017,320(7):284-292.
[8]SETSUO N,TAKASHI K,TAKU S,et al.Conductive Diamond-like Carbon Films Prepared by High Power Pulsed Magnetron Sputtering with Bipolar Type Plasma Based Ion Implantation System[J].Diamond&Related Materials,2017,77(4):122-130.
[9]TOMK,MIROSLAV J,PETR P,et al.Diamond-like Carbon Layers Modified by Ion Bombardment during Growth and Researched by Resonant Ultrasound Spectroscopy[J].Applied Surface Science,2017,417(7):213-217.
[10]HABIBI A,KHOIE M M A,MAHBOUBI F,et al.Raman Spectroscopy of Thin DLC Film Deposited by Plasma Electrolysis Process[J].Surface and Coatings Techology,2017,309(45):945-950.