低阻高透柔性导电膜制作技术
|
摘要
介绍低阻高透柔性导电膜膜层结构以及膜层厚度配比,根据物质的理化性能(附着力、光学性能、电学性能等)进行搭配,导电层由ITO/Ag/ITO膜层组成,在导电层和柔性基底之间引入折射率膜层SiO_x,PET基材经过等离子设备预处理后,工艺室的阴极依次镀制SiO_X、ITO、Ag、ITO等膜系。按照控制变量法,通过对导电层以及折射层膜厚设计,经工艺调整得到市场所需指标产品。
Introduced the structure of low resistance and high permeability flexible conductive film layer and the ratio of film layer thickness. According to the physical and chemical properties(adhesion, optical properties, electrical properties, etc.)of the material, the conductive layer consists of ITO/Ag/ITO film layer. The refractive index film layer SiO_x is introduced between the conductive layer and the flexible substrate. After the PET substrate is pretreated by the plasma device, the cathode of the process room is successively plated with the membranes of SiO_x, ITO, Ag, ITO, etc.. Through the control variable method,through the conductive layer and refracting layer film thickness design, do the process adjustment to obtain the market required index products.
Introduced the structure of low resistance and high permeability flexible conductive film layer and the ratio of film layer thickness. According to the physical and chemical properties(adhesion, optical properties, electrical properties, etc.)of the material, the conductive layer consists of ITO/Ag/ITO film layer. The refractive index film layer SiO_x is introduced between the conductive layer and the flexible substrate. After the PET substrate is pretreated by the plasma device, the cathode of the process room is successively plated with the membranes of SiO_x, ITO, Ag, ITO, etc.. Through the control variable method,through the conductive layer and refracting layer film thickness design, do the process adjustment to obtain the market required index products.
引文