FAS-17含量对大气压Ar介质阻挡放电特性的影响
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摘要
为了研究十七氟癸基三甲氧基硅烷(FAS-17)含量对大气压氩DBD放电特性的影响,首先可通过电气特性测量及光学特性诊断,然后根据计算得出放电功率、传输电荷以及主要活性粒子的变化趋势,并结合机理分析,得到最优条件。实验结果表明:随FAS-17的增加,放电电流幅值略微下降,放电脉冲个数增加,放电功率和传输电荷都有一定程度的增加;放电细丝宽度变细、密度变小,放电颜色也由淡紫色转变为蓝紫色; Ar原子的活性粒子逐渐降低,F原子的发射光谱强度则呈现出先上升后降低的趋势,在FAS-17为5%时达到最大值。
In order to study the influence of seventeen fluorine decyl alkoxy silane( FAS-17) on discharge characteristics of argon DBD under atmospheric. First,measuring electrical characteristics and optical properties of the diagnosis,then calculating discharge power,transmission charge and the change trend of the main active particles,combining with the mechanism analysis,getting the optimum condition.The experimental results show that,with the increase of FAS-17,the discharge current amplitude decreases slightly,the number of discharge pulse increases,the discharge power and transmission have a certain degree of increase; the width of the discharge filaments becomes thin,density becomes smaller,and the discharge color changes from lavender to blue-violet; the active particles of Ar atom decreased gradually,the emission of F atom showed the trend of increasing first and then decreasing,reached the maximum when FAS-17 was 5%.
In order to study the influence of seventeen fluorine decyl alkoxy silane( FAS-17) on discharge characteristics of argon DBD under atmospheric. First,measuring electrical characteristics and optical properties of the diagnosis,then calculating discharge power,transmission charge and the change trend of the main active particles,combining with the mechanism analysis,getting the optimum condition.The experimental results show that,with the increase of FAS-17,the discharge current amplitude decreases slightly,the number of discharge pulse increases,the discharge power and transmission have a certain degree of increase; the width of the discharge filaments becomes thin,density becomes smaller,and the discharge color changes from lavender to blue-violet; the active particles of Ar atom decreased gradually,the emission of F atom showed the trend of increasing first and then decreasing,reached the maximum when FAS-17 was 5%.
引文
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[2] Pappas D. Status and potential of atmospheric plasma processing of materials[J]. Journal of Vacuum Science&Technology A,2011,29(2):020801.
[3] Lee Y H,Yeom G Y. Properties and applications of a modified dielectric barrier discharge generated atatmospheric pressure[J]. Japanese Journal of Applied Physics,2005,44(2):1076-1080.
[4] Wagner H E,Brandenburg R,Kozlov K V,et al. The barrier discharge:basic properties and applications to surface treatment[J]. Vacuum,2003,71(3):417-436.
[5] Borcia G,Brown N M D. Hydrophobic coatings on selected polymers in an atmospheric pressure dielectric barrier discharge[J]. Journal of Physics D Applied Physics,2007,40(7):1927.
[6] Jacobs T,Morent R,Geyter N D,et al. Effect of He/CF4, DBD Operating Parameters on PET Surface Modification[J]. Plasma Processes&Polymers,2009,6(Supplement 1):S412–S418.
[7]高松华,闻立时,周克省,等. CF4射频容性耦合等离子体对硅橡胶表面双疏改性的研究[J].功能材料,2009,(01):79-81.
[8]陈国平.氟代烷基硅烷-SiO2对玻璃表面的憎水改性[J].有机硅材料,2007,21(3):125-128.
[9]邵涛. Experimental Study on Hydrophobic Modification of PET Surface using Nanosecond-Pulse DBD at Atmospheric Pressure[J].强激光与粒子束,2013:0-0.
[10]陈柬,杨静,阮陈,等.射流低温等离子体处理增强环氧表面憎水性研究[J].绝缘材料,2016,(04):45-49.
[11] Yim J H,Rodriguez-Santiago V,Williams A A,et al.Atmospheric pressure plasma enhanced chemical vapor deposition of hydrophobic coatings using fluorine-based liquid precursors[J]. Surface&Coatings Technology,2013,234(10):21-32.
[12]周亦骁,方志,邵涛. Ar/O2和Ar/H2O中大气压等离子体射流放电特性的比较[J].电工技术学报,2014,29(11):229-238.
[13]郝艳捧,涂恩来,阳林,等.基于气隙伏安特性研究大气压氦气辉光放电的模式和机理[J].电工技术学报,2010,25(7):24-30.
[14] Shao X J,Zhang G J,Zhan J Y,et al. Research on surface modification of polytetrafluoroethylene coupled with argon dielectric barrier discharge plasma jet characteristics[J]. IEEE Transactions on Plasma Science,2011,39(11):3095-3102.
[15] Park G,Lee H,Kim G,et al. Global model of He/O2and Ar/O2atmospheric pressure glow discharges[J].Plasma Processes and Polymers,2008,5(6):569-576.
[16] GEORGIEVA V, BOGAERTS A, GIJBELS R.Numerical study of Ar/CF4/N2discharges in single-and dual-frequency capacitively coupled plasma reactors[J].Journal of Applied Physics,2003,94(6):3748-3756.
[17] STOFFELS W W, STOFFELS E, TACHIBANA K.Polymerization of fluorocarbons in reactive ion etching plasmas[J]. Journal of Vacuum Science&Technology A Vacuum Surfaces&Films,1998,16(1):87-95.
[18] JAUBERTEAU J L,MEEUSEN G J,HAVERLAG M,et al. Negative ions in a radio-frequency plasma in CF4[J]. Journal of Physics D Applied Physics,2000,24(3):261.
[19]丁正方,方志,许靖.四氟化碳含量对大气压Ar等离子体射流放电特性的影响[J].电工技术学报,2016,31(7):159-165.