典型功能脆性材料磨削
详细信息    查看全文 | 推荐本文 |
  • 英文篇名:Grinding of typical functional brittle materials
  • 作者:袁巨龙 ; 张韬杰 ; 凌洋 ; 王洁 ; 杭伟
  • 英文作者:YUAN Ju-long;ZHANG Tao-jie;LIN Yang;WANG Jie;HANG Wei;Key Laboratory of Special Equipment Manufacturing and Advanced Processing Technology,Ministry of Education,Zhejiang University of Technology;Fair Friend Institute of Electromechanics,Hangzhou Vocational &Technical College;
  • 关键词:脆性材料 ; 比磨削能 ; 磨削力分布 ; 主轴功率增加率
  • 英文关键词:brittle materials;;specific energy;;distribution of grinding force;;increasing rate of spindle power
  • 中文刊名:GXJM
  • 英文刊名:Optics and Precision Engineering
  • 机构:浙江工业大学特种装备制造与先进加工技术教育部重点实验室;杭州职业技术学院友嘉机电学院;
  • 出版日期:2019-05-15
  • 出版单位:光学精密工程
  • 年:2019
  • 期:v.27
  • 基金:国家自然科学基金资助项目(No.51605440,No.51575492);; 中国博士后科学基金资助项目(No.2017M621966);; 浙江省公益技术研究项目(No.LGG19E050021)
  • 语种:中文;
  • 页:GXJM201905012
  • 页数:7
  • CN:05
  • ISSN:22-1198/TH
  • 分类号:103-109
摘要
为了研究典型功能脆性材料钽酸锂和硅片的磨削特性,建立了端面磨削模型来计算晶片的比磨削能及其表面的磨削力的分布,并通过实验分析脆性材料的磨削特性。以进给速度作为变量,选取砂轮端主轴磨削过程中功率增加率作为评价磨削特性的指标进行磨削实验,同时采集砂轮端主轴的功率值信号,滤波后计算晶片比磨削能和磨削力的分布。通过端面磨削模型计算可得:钽酸锂的比磨削能是147.46J/mm~3,比硅的大44%,表明磨削去除相同体积的钽酸锂需要更多的能量,钽酸锂晶片表面分布的磨削力比硅片大。磨削过程的主轴功率增加率是预测钽酸锂加工结果的重要指标,在本实验中一旦增加率大于临界值0.6W/s,钽酸锂表面就会产生裂纹。而在相同加工条件下,无论进给速度如何变化,硅片的磨削主轴的功率增加率始终保持稳定,而钽酸锂的主轴磨削过程的功率增加率则与进给速度呈现线性增加关系,这一现象与钽酸锂的机械性质无关,而与物理性质有关系。
        To evaluate the grinding performance of typical functional brittle materials,a back-face grinding model was established and subsequently the specific energy of the wafer material and the distribution of grinding force was calculated during the grinding process according to this model.First,a series of grinding experiments were conducted at different feed rates.The rate of increase of spindle power was then chosen to evaluate the grinding performance;the recorded data of grinding power varied significantly,so it was filtered for the subsequent analysis.The experimental results indicate that the specific energy of LiTaO_3(LT)is 147.46J/mm~3,which is 44%larger than that of Si,and that the grinding force of LT is larger than that of Si at the same distance from the center of the wafer.The rate of increase of spindle power played a critical role in the machining of LiTaO_3.It was found that,above the threshold value of 0.6W/s,cracks were initiated and resulted in the breakdown of the wafer.Compared with the grinding of Si,spindle power in the LiTaO_3grinding experiments exhibited a linear relationship with the increase in feed rate under the same experimental conditions,which indicated that the physical properties other than the mechanical properties may also play a critical role in the grinding process.
引文
[1]HANG W,ZHOU L B,ZHANG K H,et al..Study on grinding of LiTaO3using effective cooling and electrolyte solution[J].Precision Engineering,2016,44:62-69.
    [2]KIM W Y,LEE H C.Low-voltage nonvolatile multi-bit memory fabricated by the patterning and transferring of ferroelectric polymer film[J].Organic Elec.,2015,19:1-6.
    [3]PANG L L,WANG Z G,SUN J R,et al..Evolution of optical absorption and strain in LiTaO3crystal implanted by energetic He-ion[J].Materials and Atoms,2015,354:301-304.
    [4]MA C,LU F,MA Y.Study of the effect of H implantation and annealing on LiTaO3surface blistering[J].Nuclear Instruments and Methods in Physics Research Section B:Beam Interactions with Materials and Atoms,2015,342:76-81.
    [5]SHI L,SHEN Q,QIU Z.Concentration-dependent upconversion emission in Er-doped and Er/Yb-codoped LiTaO3 polycrystals[J].Journal of Luminescence,2014,148:94-97.
    [6]WU X,ZHENG W.Theoretical explanation of g factors for Ti 3+ions in LiNbO3and LiTaO3crystals[J].Optik-International Journal for Light and Electron Optics,2014,125(6):1753-1755.
    [7]LIU X.Influence of Scions on optical properties of Ce:LiTaO3crystals[J].Optik-International Journal for Light and Electron Optics,2013,124(18):3646-3648.
    [8]BELIVICHIS J,RIMEIKA R,?IPLYS D.Acousto-optic interaction with leaky surface acoustic waves in Y-cut LiTaO3 crystals[J].Ultrasonics,2012,52(5):593-597.
    [9]SHI Y L,ZHANG C,ZHANG H,et al..Low(sub-1-volt)halfwave voltage polymeric electro-optic modulators achieved by controlling chromophore shape[J].Science,2000,288(5463):119-122.
    [10]SAITO Y,TAKAO H.High performance leadfree piezoelectric ceramics in the(K,Na)NbO3-LiTaO3solid solution system[J].Optics Letters,2006,338(1):17-32.
    [11]邓乾发,袁巨龙,文东辉,等.半固着磨具在非晶态NiPdP合金薄膜铜片衬底精密研磨中的应用[J].表面技术,2009,38(8):1-6.DENG Q F,YUAN J L,WEN D H,et al..Approach to semi-fixed abrasive grinding plate on surface lapping copper substrates of amorphous NiPd-P alloy films[J].Surface Technology,2009,38(8):1-6.(in Chinese)
    [12]王紫光,高尚,朱祥龙,等.硅片低损伤磨削砂轮及其磨削性能[J].光学精密工程,2017,25(10):2689-2696.WANG Z G,GAO SH,ZHU X L,et.al.Grinding wheel for low-damage grinding of silicon wafers and its grinding performance[J].Opt.Precision Eng.,2017,25(10):2689-2696.(in Chinese)
    [13]胡中伟,邵铭剑,郭建民,等.蓝宝石不同晶面磨削特性比较[J].光学精密工程,2017,25(5):1250-1258.HU ZH W,SHAO M J,GUO J M,et al..Comparison of grinding characteristics of different crystal surfaces for sapphire[J].Opt.Precision Eng.,2017,25(5):1250-1258.(in Chinese)
    [14]马振芳,王丽,姜雪,等.镁铝尖晶石的塑性域磨削[J].光学精密工程,2017,25(4):963-968.MA ZH F,WANG L,JIANG X,et al..Ductile grinding of MgAl2O4 spinel[J].Opt.Precision Eng.,2017,25(4):963-968.(in Chinese)
    [15]HANG W,ZHOU L B,SHIMIZU J,et al..Study on the thermal influence of grinding process on LiTaO3[J].Advanced Material Research,2013,797:252-257.
    [16]HANG W,ZHOU L B,SHIMIZU J,et al..Study on the mechanical properties of lithium tantalite and the influence on its machinability[J].International Journal of Automation Technology,2013,7(6):644-653.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700