摘要
空穴注入层(HIL)在量子点发光二极管(QLEDs)中有重要作用。使用低温溶液法制作了Mo Ox纳米颗粒,将其在氧化铟锡(ITO)玻璃上旋涂成膜后使用不同温度进行退火处理,并作为空穴注入层进行量子点发光二极管的制作。实验结果表明,氧化钼薄膜有着与ITO玻璃阳极和Poly-TPD空穴传输层匹配的能级,可用作量子点发光二极管的空穴注入层,而使用经100℃退火处理后的MoO_x薄膜作为空穴注入层的器件性能最佳:器件启亮电压为2.5 V,最高外量子效率为11.6%,在偏压为10V时,器件的最高亮度达到27 100 cd/m~2。
Hole Injection Layer(HIL) plays a key role in Quantum dot-based Light Emitting Diodes(QLEDs). Herein, Mo Ox nanoparticles are prepared with a solution method under low temperature, next they are coated on the surface of Indium Tin Oxide(ITO) substrate by means of spin casting with following anneal under different temperatures, and then used as HILs to fabricate QLEDs. The experimental results show that the energy level of Mo Ox film is matched to those of the ITO and Poly-TPD, and Mo Ox is suitable to be used as HIL for QLEDs. By analyzing the performance of all the fabricated devices, it can be concluded that the QLEDs, corresponding to the Mo Ox film annealed under 100 ℃, exhibits the best turn-on voltage, External Quantum Efficiency(EQE) and brightness. In detail, this device has a low turn-on voltage of 2.5 V, a high EQE of 11.6%, and the highest brightness of 27 100 cd/m2 at 10 V.
引文
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