脉冲磁场对Al-20Si合金中初生Si的影响
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摘要
研究了不同脉冲电压和脉冲频率对Al-20Si合金中初生Si分布和形态的影响。结果表明,在脉冲磁场的作用下,初生Si主要表现为偏聚和粗化,为梯度材料的制备提供了可能;当脉冲电压为80V时,初生Si有所粗化且偏聚,其大量集中在边部,心部几乎不含初生Si;当脉冲电压为160V时,初生Si进一步粗化且有所团聚,但整体上分布趋于均匀化;当脉冲电压增加至240V时,初生Si团聚和粗化现象有所减弱,且其分布也较均匀。当脉冲频率变化较小时(1~5Hz),初生Si的分布和形态不会随脉冲频率的增加而改变;当脉冲频率增加到10Hz时,初生Si出现了偏聚和粗化的现象。
Effects of different pulsed voltage and pulsed frequency on distribution and morphology of primary silicon in Al-20Si alloy were investigated.The results show that primary silicon mainly presents segregation and coarsening under pulsed magnetic field,which provides possibility for the preparation of gradient materials.When the pulse voltage is 80 V,the primary silicon is coarsened with segregation,which is concentrated in the edge not in the core position.With the pulsed voltage of 160 V,primary silicon tends to be coarsened and agglomeration,however the whole distribution tends to be uniform.When the pulse voltage is 240 V,the agglomeration and coarseness of primary silicon is weakened with more uniform distribution.When the pulsed frequency is 1~5 Hz,the distribution and morphology of primary silicon will be independent on the increase of the pulse frequency.However,when the pulse frequency is increased to 10 Hz,the primary silicon presents segregation and coarsening effects.
Effects of different pulsed voltage and pulsed frequency on distribution and morphology of primary silicon in Al-20Si alloy were investigated.The results show that primary silicon mainly presents segregation and coarsening under pulsed magnetic field,which provides possibility for the preparation of gradient materials.When the pulse voltage is 80 V,the primary silicon is coarsened with segregation,which is concentrated in the edge not in the core position.With the pulsed voltage of 160 V,primary silicon tends to be coarsened and agglomeration,however the whole distribution tends to be uniform.When the pulse voltage is 240 V,the agglomeration and coarseness of primary silicon is weakened with more uniform distribution.When the pulsed frequency is 1~5 Hz,the distribution and morphology of primary silicon will be independent on the increase of the pulse frequency.However,when the pulse frequency is increased to 10 Hz,the primary silicon presents segregation and coarsening effects.
引文
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[2]姚书芳,毛卫民,赵爱民,等.过共晶铝硅合金细化变质剂的研究[J].特种铸造及有色合金,2000(5):1-3.
[3]李小松,蔡安辉,罗云,等.不同Sr添加量对Al-20%Si合金组织和性能的影响[J].铸造,2009,58(8):831-835.
[4]刘相法,乔进国,刘玉先,等.Al-P中间合金对共晶和过共晶Al-Si合金的变质机制[J].金属学报,2004,40(5):471-476.
[5]毛卫民,李树索,赵爱民,等.电磁搅拌Al-24Si合金的显微组织[J].中国有色金属学报,2001,11(5):819-823.
[6]于思荣,庞宇平,任露泉,等.Al-20Si合金梯度材料的组织与性能[J].机械工程材料,2003,27(4):27-29.
[7]宋长江,许振明,刘向阳,等.电磁分离技术制备过共晶Al-Si合金自生功能梯度材料[J].上海交通大学学报,2005,39(7):1089-1 093.
[8]陈东风,曹志强,杨淼,等.高频磁场下制备表面增强自生梯度复合材料[J].铸造,2006,55(8):821-824.
[9]JIE J C,ZOU Q C,SUN J L,et al.Separation mechanism of the primary Si phase from the hypereutectic Al-Si alloy using a rotating magnetic field during solidification[J].Acta Materialia,2014,72(7):57-66.
[10]ZHANG L,LI W,YAO J P,et al.Microstructures and thermal stability of the semi-solid 2024aluminum alloy prepared using the pulsed magnetic field process:Effects of technological parameters[J].Journal of Alloys&Compounds,2013,554(6):156-161.
[11]ZHANG L,ZHOU W,HU P H,et al.Microstructural characteristics and mechanical properties of Mg-Zn-Y alloy containing icosahedral quasicrystals phase treated by pulsed magnetic field[J].Journal of Alloys&Compounds,2016,688:868-874.
[12]杨院生,付俊伟,罗天骄,等.镁合金低压脉冲磁场晶粒细化[J].中国有色金属学报,2011,21(10):2 639-2 649.
[13]LI Y J,MA X P,YANG Y S,et al.Grain refinement of as-cast superalloy IN718under action of low voltage pulsed magnetic field[J].Transaction of Nonferrous Metals Society of China,2011,21(6):1 277-1 282.
[14]许可,赵玉涛,陈刚,等.脉冲磁场下Al-ZrSiO4体系原位合成复合材料及其微观组织[J].铸造,2007,56(6):615-617.