电压对TC4合金K_2ZrF_6–Na_2SiO_3–(NaPO_3)_6体系微弧氧化膜性能的影响
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  • 英文篇名:Effect of voltage on properties of micro-arc oxidation film on TC4 alloy prepared in K_2ZrF_6–Na_2SiO_3–(NaPO_3)_6
  • 作者:崔嵬 ; 呼丹 ; 高广睿 ; 屈静
  • 英文作者:CUI Wei;HU Dan;GAO Guang-rui;QU Jing;Qing'an Group Co.,Ltd.;
  • 关键词:钛合金 ; 微弧氧化 ; 电压 ; 微观结构 ; 结合强度 ; 红外发射率
  • 英文关键词:titanium alloy;;micro-arc oxidation;;voltage;;microstructure;;adhesion strength;;infrared emissivity
  • 中文刊名:DDTL
  • 英文刊名:Electroplating & Finishing
  • 机构:庆安集团有限公司;西安赛福斯材料防护有限责任公司;西北有色金属研究院;
  • 出版日期:2019-01-15
  • 出版单位:电镀与涂饰
  • 年:2019
  • 期:v.38;No.331
  • 语种:中文;
  • 页:DDTL201901005
  • 页数:6
  • CN:01
  • ISSN:44-1237/TS
  • 分类号:26-31
摘要
在K_2ZrF_6–Na_2SiO_3–(NaPO_3)_6电解液中研究了电压(420~510 V)对TC4合金表面微弧氧化(MAO)的影响。通过扫描电镜(SEM)、X射线衍射仪(XRD)、X射线光电子能谱仪(XPS)及拉伸试验机表征了膜层的微观形貌、相组织、元素组成和结合强度,用傅里叶变换红外光谱仪(FT–IR)测试了它们的红外发射率。结果表明:随着电压的升高,膜层厚度、粗糙度和结合强度均增大;膜层的主要相组成为TiO_2,Si、Zr、P元素分别以SiO_2、ZrO_2、NaH_2PO_4与Na_4P-2O_7的形式存在。膜层的红外发射率随电压增大而先升高后降低,在电压为480 V时达到最大值0.87,比420 V下所得膜层的红外发射率提高了7.4%。
        The effect of voltage on micro-arc oxidation(MAO) of TC4 titanium alloy in a K_2ZrF_6–Na_2SiO_3–(NaPO_3)_6 electrolytes was studied.The micromorphology,phase structure,elemental composition,and adhesion strength of MAO film were analyzed using scanning electron microscope(SEM),energy-dispersive spectrometer(EDS),X-ray diffractometer(XRD),X-ray photoelectron spectroscope(XPS),and tensile testing machine.The infrared emissivity was measured by Fourier-transform infrared spectroscopy(FT-IR).The results showed that the thickness,roughness,and adhesion strength of MAO film were increased with the increasing of oxidation voltage.The main phase in MAO film was TiO_2,and there existed Si as SiO_2,Zr as ZrO_2,and P as NaH_2PO_4 and Na_4P_2O_7.The infrared emissivity of MAO film was increased initially and then decreased with the increasing of oxidation voltage,and reached the maximum of 0.87 when the voltage was 480 V,which was 7.4% higher than that of the MAO film obtained at 420 V.
引文
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