Formation of Zr-contained Amorphous Alloy Films by Magnetron Co-sputtering
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摘要
In order to explore the application of magnetron co-sputtering in fabricating the amorphous alloy, Zr-contained amorphous films were prepared by this technique and investigated by scanning electron microscope, energy disperse spectroscopy and X-ray diffraction. The results show that the co-sputtered films are in fully amorphous state or with amorphous-nanocrystalline structure. The XRD patterns of the Zr-Cu and Zr-Ni amorphous films exhibit a double-peak phenomenon. There is a shift of diffusive peak with changing the sputtering current which is possibly attributed to the change of Zr-Ni and Zr-Cu intermetallic like short range orders. In addition, Zr-Cu-Ni ternary co-sputtered films have a sharper peak at high angle. The sputtering yield of element during co-sputtering ranks as Cu>Ni>Zr, which can be ascribed to the contribution of melting and boiling temperature, atomic size and electrical conductivity of elements.
In order to explore the application of magnetron co-sputtering in fabricating the amorphous alloy, Zr-contained amorphous films were prepared by this technique and investigated by scanning electron microscope, energy disperse spectroscopy and X-ray diffraction. The results show that the co-sputtered films are in fully amorphous state or with amorphous-nanocrystalline structure. The XRD patterns of the Zr-Cu and Zr-Ni amorphous films exhibit a double-peak phenomenon. There is a shift of diffusive peak with changing the sputtering current which is possibly attributed to the change of Zr-Ni and Zr-Cu intermetallic like short range orders. In addition, Zr-Cu-Ni ternary co-sputtered films have a sharper peak at high angle. The sputtering yield of element during co-sputtering ranks as Cu>Ni>Zr, which can be ascribed to the contribution of melting and boiling temperature, atomic size and electrical conductivity of elements.
In order to explore the application of magnetron co-sputtering in fabricating the amorphous alloy, Zr-contained amorphous films were prepared by this technique and investigated by scanning electron microscope, energy disperse spectroscopy and X-ray diffraction. The results show that the co-sputtered films are in fully amorphous state or with amorphous-nanocrystalline structure. The XRD patterns of the Zr-Cu and Zr-Ni amorphous films exhibit a double-peak phenomenon. There is a shift of diffusive peak with changing the sputtering current which is possibly attributed to the change of Zr-Ni and Zr-Cu intermetallic like short range orders. In addition, Zr-Cu-Ni ternary co-sputtered films have a sharper peak at high angle. The sputtering yield of element during co-sputtering ranks as Cu>Ni>Zr, which can be ascribed to the contribution of melting and boiling temperature, atomic size and electrical conductivity of elements.
引文
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[22]Chou H S,Huang J C,Lai Y H,et al.Amorphous and Nanocrystalline Sputtered Mg-Cu Thin Films[J].Journal of Alloys and Compounds,2009,483:341-345
[23]Miyazaki H.Fabrication of YbAl 3 Film via Annealing Amorphous Yb-Al Film Deposited by RF Magnetron Sputtering[J].Vacuum,2008,83:416-418
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[26]Sigmund P.Theory of Sputtering.I.Sputtering Yield of Amorphous and Polycrystalline Targets[J].Physical Review,1969,184:383-315
[27]Dean J A.Lange's Handbook of Chemistry[M].New York:McGrawHill,Inc.,1999
[2]Johnson W L.Bulk Amorphous Metal-An Emerging Engineering Material[J].JOM-Journal of the Minerals Metals&Materials Society,2002,54:40-43
[3]Schultz L,Eckert J.Glassy Metals III[M].Berlin:Springer Varlag,1994
[4]Guo L Y,Geng S N,Pang J,et al.Structural Transformation and Property Improvement of Fe78Si9B13 Amorphous Ribbon by Pulsed Laser Processing[J].Materials&Design,2018,160:538-548
[5]Jia C G,Pang J,Pan S P,et al.Tailoring the Corrosion Behavior of Fe-based Metallic Glasses through Inducing Nb-triggered Netlike Structure[J].Corrosion Science,2019,147:94-107
[6]Wang X,Pang J,Guo L Y,et al.Thermal Analysis of Directional Pressure Annealed Fe78Si9B13 Amorphous Ribbons[J].Thermochimica Acta,2018,661:67-77
[7]Risti?R,Stubi?ar M,Babi?E.Correlation between Mechanical,Thermal and Electronic Properties in Zr-Ni,Cu Amorphous Alloys[J].Philosophical Magazine,2007,87:5 629-5 637
[8]Basu J,Murty B S,Ranganathan S.Glass Forming Ability:Miedema Approach to(Zr,Ti,Hf)-(Cu,Ni)Binary and Ternary Alloys[J].Journal of Alloys and Compounds,2008,465:163-172
[9]Chen C J,Huang J C,Chou H S,et al.On the Amorphous and Nanocrystalline Zr-Cu and Zr-Ti Co-sputtered Thin Films[J].Journal of Alloys and Compounds,2009,483:337-340
[10]Jing Q,Xu Y,Zhang X Y,et al.Zr-Cu Amorphous Films Prepared by Magnetron Co-sputtering Deposition of Pure Zr and Cu[J].Chinese Physics Letters,2009,26:086 109-086 112
[11]Marshall A F,Walmsley R G,Stevenson D A.Crystallization of an Amorphous Cu88Zr20 Alloy Prepared by Magnetron Sputter Deposition[J].Materials Science and Engineering,1984,63:215-227
[12]Luo S,Yan B X,Shen J.Enhanced Photoelectric Property of Mo-CCodoped TiO2 Films Deposited by RF Magnetron Cosputtering[J].Journal of Wuhan University of Technology-Mater.Sci.Ed.,2017,32:223-228
[13]Li B J,Huang L J,Zhou M,et al.Preparation and Spectral Analysis of Gold Nanoparticles using Magnetron Sputtering and Thermal Annealing[J].Journal of Wuhan University of Technology-Mater.Sci.Ed.,2014,29:651-655
[14]Liu C Y,He F,Yan N N,et al.Influence of Deposition Pressure on Properties of ZnO:Al Films Fabricated by RF Magnetron Sputtering[J].Journal of Wuhan University of Technology-Mater.Sci.Ed.,2016,31:1 235-1 239
[15]Swann S.Magnetron Sputtering[J].Physics in Technology,1988,19:67
[16]Zalnezhad E.Effect of Structural Evolution on Mechanical Properties of ZrO2 Coated Ti-6Al-7Nb-biomedical Application[J].Applied Surface Science,2016,370:32-39
[17]Baradaran S,Zalnezhad E,Basirun W J,et al.Statistical Optimization and Fretting Fatigue Study of Zr/ZrO2 Nanotubular Array Coating on Ti-6Al-4V[J].Surface and Coatings Technology,2014,258:979-990
[18]Carcia P F,McLean R S,Reilly M H,et al.Transparent ZnO Thin-film Transistor Fabricated by RF Magnetron Sputtering[J].Applied Physics Letters,2003,82:1 117-1 119
[19]Dudonis J,Bru?as R,Miniotas A.Synthesis of Amorphous Zr-Cu Alloys by Magnetron Co-sputtering[J].Thin Solid Films,1996,275:164-167
[20]Xu Y.Study on the Preparation and Crystallization Process of Zr-Cu Amorphous Alloy Thin Films[D].Qinghuangdao:Yanshan University,2005
[21]Li Y,Guo Q,Kalb J A,et al.Matching Glass-Forming Ability with the Density of the Amorphous Phase[J].Science,2008,322:1 816-1 819
[22]Chou H S,Huang J C,Lai Y H,et al.Amorphous and Nanocrystalline Sputtered Mg-Cu Thin Films[J].Journal of Alloys and Compounds,2009,483:341-345
[23]Miyazaki H.Fabrication of YbAl 3 Film via Annealing Amorphous Yb-Al Film Deposited by RF Magnetron Sputtering[J].Vacuum,2008,83:416-418
[24]Mattern N,Kühn U,Gebert A,et al.Microstructure and Thermal Behavior of Two-phase Amorphous Ni-Nb-Y Alloy[J].Scripta Materialia,2005,53:271-274
[25]Antonian Z,Tu G H,Strom-Olsen J O.Crystallization Characteristics of Ni-Zr Metallic Glasses from Ni20Zr80 to Ni70Zr30[J].Journal of Applied Physics,1983,54:3 111-3 116
[26]Sigmund P.Theory of Sputtering.I.Sputtering Yield of Amorphous and Polycrystalline Targets[J].Physical Review,1969,184:383-315
[27]Dean J A.Lange's Handbook of Chemistry[M].New York:McGrawHill,Inc.,1999