恒电位法制备不同织构氧化亚铜薄膜工艺的研究
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摘要
本文采用恒电位法探索了CuSO4和乳酸溶液在摩尔比为1:3的条件下络合,以三电极体系在导电玻璃上沉积Cu2O薄膜的最佳工艺条件。通过分析Cu2+与络合剂乳酸在不同的溶液温度,沉积电位、以及溶液pH的条件下络合,来确定其对Cu2O薄膜的影响。采用X-射线衍射分析和扫描电子显微镜对薄膜样品结构和形貌进行表征。结果表明,在Cu2+与乳酸的摩尔比为1:3,溶液温度为65℃~75℃,沉积电位为-1.2V~-2.8V,溶液的pH=10~12的条件下,得到(111)择优取向生长的Cu2O薄膜,呈砖红色,致密均匀。Cu2O膜(200)择优取向生长的参数范围是:溶液温度65℃,沉积电位-1.2V,pH=7~9。
The processing conditions to prepare Cu2 O film on ITO substrate by potentiostatic method were explored under the condition of molar ratio of CuSO4 and lactic acid 1:3in a three electrode system.The effect of the parameters including deposition temperature,potential,and solution pH complexation on the obtained Cu2 O film were investigated in detail.The prepared Cu2 Osamples were characterized by X-ray diffractometer(XRD)and scanning electronic microscopy(SEM).The results showed that compact and uniform brick red Cu2 O films with preferential orientation in(111)direction can be obtained under the conditions:mole ratio of Cu2+and lactic acid is 1:3,deposition temperature,potential and pH are in the range of 65℃ ~75℃,-1.2V ~-2.8V,and 10~12,respectively.Whereas the(200)-oriented Cu2 O can be obtained under potential of-1.2V,pH of 7to 9,and temperature at 65 ℃.
The processing conditions to prepare Cu2 O film on ITO substrate by potentiostatic method were explored under the condition of molar ratio of CuSO4 and lactic acid 1:3in a three electrode system.The effect of the parameters including deposition temperature,potential,and solution pH complexation on the obtained Cu2 O film were investigated in detail.The prepared Cu2 Osamples were characterized by X-ray diffractometer(XRD)and scanning electronic microscopy(SEM).The results showed that compact and uniform brick red Cu2 O films with preferential orientation in(111)direction can be obtained under the conditions:mole ratio of Cu2+and lactic acid is 1:3,deposition temperature,potential and pH are in the range of 65℃ ~75℃,-1.2V ~-2.8V,and 10~12,respectively.Whereas the(200)-oriented Cu2 O can be obtained under potential of-1.2V,pH of 7to 9,and temperature at 65 ℃.
引文
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5 徐玲,刘昌龄,吴世彪,等.电化学法制备CuInSe2薄膜工艺的研究[J].合肥工业大学学报,2006,29(5):547-550.
6 Ling Xu,Haiyan Xu,Shibiao Wu,et al.,Synergy effect over electrodeposited submicron Cu2O films in photocatalytic degradation of methylene blue[J],Appl.Surf.Sci,2012,258(11):4934-4938.
7 Wang L C,De Tacconi N R,Chenthamarakshan C R,et al.,Electrodeposited copper oxide films:Effect of bath pH on grain orientation and orientation-dependent interfacial behavior[J].Thin Solid Films,2007,515(5):3090-3095.
2 Tang Y W,Chen Z G,Jia Z J,et al.,Electrodeposition and characterization of nanocrystalline cuprous oxide thin film on TiO2film[J].Materials Letters,2005,59(4):434-438.
3 Wijuesundera R P,Hidaka M,Loga K,et al.,Growth and characterisation of potentiostatically electrodeposited Cu2O and Cu thin films[J].Thin Soild Film,2006,500(1/2):241-246.
4 Sun F,Guo Y P,Song W R.et al.,Morphological control of Cu2O micro-nanostrucyture film by electrodeposited[J].Journal of Crystal Growth,2007,304(2):425-439.
5 徐玲,刘昌龄,吴世彪,等.电化学法制备CuInSe2薄膜工艺的研究[J].合肥工业大学学报,2006,29(5):547-550.
6 Ling Xu,Haiyan Xu,Shibiao Wu,et al.,Synergy effect over electrodeposited submicron Cu2O films in photocatalytic degradation of methylene blue[J],Appl.Surf.Sci,2012,258(11):4934-4938.
7 Wang L C,De Tacconi N R,Chenthamarakshan C R,et al.,Electrodeposited copper oxide films:Effect of bath pH on grain orientation and orientation-dependent interfacial behavior[J].Thin Solid Films,2007,515(5):3090-3095.