摘要
本文探索了以CuSO4·5H2O为铜源,乳酸为络合剂,应用恒电位法在导电玻璃(ITO)上沉积Cu2O薄膜的工艺条件。主要研究了Cu2+与络合剂乳酸的摩尔比、络合时间、溶液的pH及电镀面积对薄膜结构的影响规律。通过X-射线衍射分析(XRD)和扫描电子显微镜(SEM)对其结构和形貌进行了表征。结果表明:在Cu2+与乳酸的摩尔比为1∶4~1∶7,pH=9~11的特定参数范围内的Cu2O膜为砖红色,膜面均匀致密,属于立方晶系结构,晶体择优(200)面生长。
The Cu2O thin films were electrodeposited on the ITO conductive glass substrate by potentiostaic method.The preparation processes,in which CuSO4·5H2O and lactic acid were used as the source of copper and complexing agent,were studied in this paper.The main influences on Cu2O thin films' structure,such as molar ratio of Cu2+to lactic acid and complexation reactions time,electrolyte solution pH value and the substrates' plating area,were discussed in this paper.When Cu2+and lactic acid molar ratio range was between 1∶4and 1∶7and electrolyte solution pH value range was between 9and 12,the uniform,compact and brick-red Cu2O thin films were obtained.The electrodeposited films' structure and morphology were characterized by X-ray diffraction analysis(XRD)and scanning electron microscope(SEM),respectively.Results show that thin films were of cubic crystal system structure and exhibited a pronounced preferential orientation of(200)planes.
引文
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