工作压强对PECVD法制备DLC薄膜微观结构与力学性能的影响
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摘要
采用脉冲等离子体增强化学气相沉积方法(Pulse-PECVD)于316L不锈钢基体上制备类金刚石(DLC)薄膜,研究不同工作气压对DLC薄膜的沉积速率、表面形貌、微观结构、纳米硬度、弹性模量以及结合强度的影响规律。结果表明:随沉积气压增大,薄膜的沉积速率随之增大,压强在3 Pa时沉积速率可高达1. 4μm/h;不同气压下沉积的DLC薄膜均体现出平整光滑的表面形貌和高于不锈钢基体3倍以上的纳米硬度;沉积气压为2 Pa时,DLC薄膜在拉曼光谱中具有最小的ID/IG值,对应最高的纳米硬度16. 1 GPa和弹性模量152. 7 GPa,以及最低的粗糙度和摩擦因数0. 206。
Diamond-like carbon( DLC) films were prepared on 316L stainless steel by pulsed plasma-enhanced chemical vapor deposition( Pulse-PECVD). Effects of deposition pressure on the deposition rate,surface morphology,microstructure,nanoindentation hardness and Young's modulus,bonding strength of the DLC films were investigated. The results show that the deposition rate of the DLC film increases as the deposition pressure increases,and the maximum deposition rate reaches 1. 4 μm/h at 3 Pa. The DLC films deposited at different working pressure represent smooth morphology and nanoindentation hardness three times higher than that of 316L stainless steel matrix. The DLC films deposited at 2 Pa has the maximum nanoindentation hardness 16. 1 GPa and Young's modulus 152. 7 GPa,which is consistent with the smallest ID/IGdeduced from Raman spectra. That is also responsible for the lowest roughness and friction coefficient 0. 206.
Diamond-like carbon( DLC) films were prepared on 316L stainless steel by pulsed plasma-enhanced chemical vapor deposition( Pulse-PECVD). Effects of deposition pressure on the deposition rate,surface morphology,microstructure,nanoindentation hardness and Young's modulus,bonding strength of the DLC films were investigated. The results show that the deposition rate of the DLC film increases as the deposition pressure increases,and the maximum deposition rate reaches 1. 4 μm/h at 3 Pa. The DLC films deposited at different working pressure represent smooth morphology and nanoindentation hardness three times higher than that of 316L stainless steel matrix. The DLC films deposited at 2 Pa has the maximum nanoindentation hardness 16. 1 GPa and Young's modulus 152. 7 GPa,which is consistent with the smallest ID/IGdeduced from Raman spectra. That is also responsible for the lowest roughness and friction coefficient 0. 206.
引文
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[6]赵飞.多环境适应性超润滑复合类金刚石碳基薄膜的制备及其性能研究[D].兰州:中国科学院兰州化学物理研究所,2010.
[7]李敬财,何玉定,胡社军,等.类金刚石薄膜的应用[J].新材料产业,2004(3):39-42.
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[9]梅倩,赵斌元,李荣斌,等.类金刚石薄膜的气相沉积新型工艺发展[J].材料导报,2014(S1):94-99.Mei Qian,Zhao Binyuan,Li Rongbin,et al.New vapor deposition technology development of diamond-like films[J].Materials Review,2014(S1):94-99.
[10]熊礼威,彭环洋,汪建华,等.PECVD法制备掺硼纳米金刚石薄膜的工艺研究进展[J].表面技术,2016,45(10):40-48.Xiong Liwei,Peng Huanyang,Wang Jianhua,et al.Research progress in preparation of boron doped nanocrystalline diamond films by PECVDmethod[J].Surface Technology,2016,45(10):40-48.
[11]凌晓,俞树荣,张俊彦.沉积气压对类金刚石薄膜结构和性能的影响[J].红外与激光工程,2014,43(6):1878-1882.Ling Xiao,Yu Shurong,Zhang Junyan.Influence of working pressure on structure and properties of diamond-like carbon films[J].Infrared and Laser Engineering,2014,43(6):1878-1882.
[12]胡恒宁,杜昊,李洪林,等.沉积压强对类金刚石薄膜组织和性能的影响[J].工具技术,2015,49(10):28-31.Hu Hengning,Du Hao,Li Honglin,et al.Effect of deposition pressure on structure and properties of DLC films[J].Tool Engineering,2015,49(10):28-31.
[13]Dai W,Wang A.Deposition and properties of Al-containing diamondlike carbon films by a hybrid ion beam sources[J].Journal of Alloys and Compounds,2011,509(13):4626-4631.
[14]伍林,欧阳兆辉,曹淑超,等.拉曼光谱技术的应用及其研究进展[J].光散射学报,2005.17(2):180-186.Wu Lin,Ouyang Zhaohui,Cao Shuchao,et al.Research development and application of Raman scattering technology[J].Chinese Journal of Light Scattering,2005,17(2):180-186.
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