Low-temperature synthesis of SiC nanowires with Ni catalyst
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  • 英文篇名:Low-temperature synthesis of SiC nanowires with Ni catalyst
  • 作者:Wei-Li ; Xie ; Xiao-Dong ; Zhang ; Wen-Hui ; Liu ; Qi ; Xie ; Guang-Wu ; Wen ; Xiao-Xiao ; Huang ; Jian-Dong ; Zhu ; Fei-Xiang ; Ma
  • 英文作者:Wei-Li Xie;Xiao-Dong Zhang;Wen-Hui Liu;Qi Xie;Guang-Wu Wen;Xiao-Xiao Huang;Jian-Dong Zhu;Fei-Xiang Ma;School of Material Science and Engineering,Harbin Institute of Technology;Department of Prosthodontics,School of Stomatology,Harbin Medical University;School of Material Science and Engineering,Harbin Institute of Technology at Weihai;
  • 英文关键词:SiC nanowires;;Single crystalline silicon;;Ni catalyst;;Growth mechanism
  • 中文刊名:XYJS
  • 英文刊名:稀有金属(英文版)
  • 机构:School of Material Science and Engineering,Harbin Institute of Technology;Department of Prosthodontics,School of Stomatology,Harbin Medical University;School of Material Science and Engineering,Harbin Institute of Technology at Weihai;
  • 出版日期:2019-03-15
  • 出版单位:Rare Metals
  • 年:2019
  • 期:v.38
  • 基金:financially supported by the National High Technology Research and Development Program (No. 2007AA03Z340);; the National Natural Science Foundation of China (Nos. 51202045,51021002, 51172050, 51102063, 51372052 and 50672018);; the Fundamental Research Funds for the Central Universities(No. HIT. NSRIF. 2013004);; the Key Technology Research and Development Program of Heilongjiang Province (No. GC12C305-3)
  • 语种:英文;
  • 页:XYJS201903003
  • 页数:4
  • CN:03
  • ISSN:11-2112/TF
  • 分类号:20-23
摘要
SiC nano wires were fabricated on the silicon substrate dipped with a layer of Ni catalyst at 900 ℃ by gas pressure annealing processing. The morphologies and crystal structures were determined by scanning electron microscopy(SEM), transmission electron microscopy(TEM)and X-ray diffraction(XRD). The results show that the assynthesized nanowires are β-SiC single crystalline with diameter range of 50-100 nm, and length of tens of micron by directly annealing at 900 ℃. The SiC nano wires grow along the [111] direction with highly uniform morphology. And the possible growth mechanism of SiC nano wires is proposed.The present work provides an efficient strategy for the production of high-quality SiC nano wires.
        SiC nano wires were fabricated on the silicon substrate dipped with a layer of Ni catalyst at 900 ℃ by gas pressure annealing processing. The morphologies and crystal structures were determined by scanning electron microscopy(SEM), transmission electron microscopy(TEM)and X-ray diffraction(XRD). The results show that the assynthesized nanowires are β-SiC single crystalline with diameter range of 50-100 nm, and length of tens of micron by directly annealing at 900 ℃. The SiC nano wires grow along the [111] direction with highly uniform morphology. And the possible growth mechanism of SiC nano wires is proposed.The present work provides an efficient strategy for the production of high-quality SiC nano wires.
引文
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