掩模台水平向的二维衍射平面光栅测量模型验证
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  • 英文篇名:Validation of a Two-Dimensional Diffraction Planar Grating Measuring Model in the Horizontal Direction of the Reticle Stage
  • 作者:郝春晓 ; 张文涛 ; 王献英 ; 黄逊志
  • 英文作者:Hao Chunxiao;Zhang Wentao;Wang Xianying;Huang Xunzhi;School of Electrical Engineering and Automation, Guilin University of Electronics Technology;Shanghai Mirco Electronics Equipment(Group) CO.,LTD.;
  • 关键词:平面光栅尺 ; 模型 ; 自由度 ; 误差
  • 英文关键词:planar grating;;model;;DOF;;error
  • 中文刊名:DZYQ
  • 机构:桂林电子科技大学电子工程与自动化学院;上海微电子装备(集团)股份有限公司;
  • 出版日期:2019-05-20
  • 出版单位:仪器仪表用户
  • 年:2019
  • 期:v.26;No.172
  • 基金:国家科技重大专项(2017ZX02101007-003);; 国家自然科学基金(61565004)
  • 语种:中文;
  • 页:DZYQ201906022
  • 页数:3
  • CN:06
  • ISSN:12-1334/TH
  • 分类号:73-75
摘要
为了降低掩模台位置测量的位置误差,首先阐述了二维衍射平面光栅尺在掩模台上的布局与信号采集模块;然后运用两个二维衍射平面光栅尺建立掩模台位置测量模型;最后以双频激光干涉仪作为参考测量系统,对比两个测量系统的不确定度。实验证明:二维衍射平面光栅尺测量系统的不确定度比较低,可以有效地实现掩模台的三自由度位置超高精密测量。
        In order to reduce the position error of the reticle stage's position measurement, this paper first expounds the layout and signal acquisition module of the two-dimensional diffraction plane scale on the reticle stage, and then uses two two-dimensional diffraction plane grating to establish the reticle stage's position measurement. Model; finally, the dual-frequency laser interferometer is used as a reference measurement system to compare the uncertainty of the two measurement systems. The experiment proves that the uncertainty of the two-dimensional diffraction plane grating measuring system is relatively low, which can effectively realize the ultra-high precision measurement of the three-degree-of-freedom displacement of the reticle stage.
引文
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