摘要
采用等离子体增强化学气相沉积复合磁控溅射法制备了WC/a-C:H薄膜.使用X射线衍射仪、扫描电镜、X射线光电子能谱、拉曼光谱和透射电镜表征了薄膜结构和组成,并使用球盘往复摩擦试验机测试薄膜在不同体系乳化液环境中的摩擦学性能.结果表明:WC/a-C:H薄膜具有典型的类金刚石结构,WC以β-WC1-x相的形式存在. WC在碳基薄膜中的掺杂使WC/a-C:H薄膜的硬度和弹性模量分别变化至11和140 GPa.油膜、水膜与转移膜的协同润滑效应能够提升其耐磨能力.适宜的浓度配比和薄膜表面石墨化程度是影响摩擦的关键因素.
The WC/a-C:H film was prepared by plasma-enhanced chemical vapor deposition combined magnetron sputtering. The structure and composition of the film were characterized by X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy, Raman spectroscopy and transmission electron microscopy. The tribological properties of the WC/a-C:H film in different emulsion systems were tested using a reciprocating friction tester.The results show that the WC/a-C: H film had a typical diamond-like structure and the WC was in the form of β-WC1-X phase. The WC/a-C:H film preferentially grew on the(200) plane. The doping of WC in the carbon-based film changed the hardness and elastic modulus of the WC/a-C:H film to 11 and 140 GPa, respectively. Collaborative lubrication can enhance its wear resistance. The appropriate ratio and graphitization were the key factor affecting the friction.
引文
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