溅射功率对Fe_(81)Ga_(19)薄膜结构和磁性的影响
|
摘要
采用射频磁控溅射技术在Sr Ti O_3(100)衬底上制备Fe_(81)Ga_(19)薄膜。利用XRD、AFM和VSM表征了Fe_(81)Ga_(19)薄膜的生长取向、内应力、表面形貌和磁性,研究了不同溅射功率(60~100 W)对Fe_(81)Ga_(19)薄膜结构和磁性能的影响。结果表明,所有薄膜主要以A_2相和L1_2相存在。随着溅射功率的增大,A_2相衍射峰的强度缓慢降低,内应力显著增加,表面粗糙度降低,薄膜的剩余磁化强度和饱和磁化强度明显减小,而矫顽力保持不变,都为50 Oe。
Fe_(81)Ga_(19) thin films were deposited on SrTiO_3(100) substrate by RF magnetron sputtering technique. In order to investigate the effects of sputtering power(60-100 W) on the structure and magnetic properties of Fe_(81)Ga_(19) thin films, the growth orientation, internal stress, surface morphology and magnetic properties of Fe_(81)Ga_(19) films were characterized by X-ray diffraction(XRD), atomic force microscopy(AFM) and vibrating sample magnetometer(VSM). The results show that A_2 and L_(12) phases are main phases in all of these films. With the increase of sputtering power, the intensity of the diffraction peak of the A_2 phase decreases slowly, the internal stress gradually decreases, the surface roughness increases, and the residual magnetization and saturation magnetization of the deposited film decrease obviously, but the coercive force retains the same value, which is 50 Oe.
Fe_(81)Ga_(19) thin films were deposited on SrTiO_3(100) substrate by RF magnetron sputtering technique. In order to investigate the effects of sputtering power(60-100 W) on the structure and magnetic properties of Fe_(81)Ga_(19) thin films, the growth orientation, internal stress, surface morphology and magnetic properties of Fe_(81)Ga_(19) films were characterized by X-ray diffraction(XRD), atomic force microscopy(AFM) and vibrating sample magnetometer(VSM). The results show that A_2 and L_(12) phases are main phases in all of these films. With the increase of sputtering power, the intensity of the diffraction peak of the A_2 phase decreases slowly, the internal stress gradually decreases, the surface roughness increases, and the residual magnetization and saturation magnetization of the deposited film decrease obviously, but the coercive force retains the same value, which is 50 Oe.
引文
[1]Wilson S A,Jourdain R P J,Zhang Q,et al.New materials for micro-scale sensors and actuators:An engineering review[J].Materials Science&Engineering,2009,56(1):120-129.
[2]Olabi A G,Grunwald A.Design and application of magnetostrictive materials[J].Materials&Design,2008,29(2):469-483.
[3]Braghin F,Cinquemani S,Resta F.A model of magnetostrictive actuators for active vibration control[J].Sensors&Actuators A Physical,2011,165(2):342-350.
[4]谢海涛,斯永敏,杨德明,等.超磁致伸缩薄膜材料及其应用[J].中国有色金属学报,2000(S1):266-270.
[5]潘津,张晨曙,罗亮,等.磁控溅射制备Fe-Ga薄膜研究[J].热加工工艺,2013,42(16):123-125.
[6]Wa ng B W,Li S Y,Zhou Y,et al.Structure,magnetic properties and magnetostriction of Fe81Ga19 thin films[J].Journal of Magnetism&Magnetic Materials,2008,320(5):769-773.
[7]潘津.Fe-Ga合金和Fe-Ga薄膜的组织成分和性能研究[D].南昌:南昌航空大学,2013.
[8]Butera A,Gómez J,Barnard J A,et al.Magnetic anisotropy in Fe81Ga19/Mg O(100)films sputtered at different powers[J].Physica B Condensed Matter,2006,384(1):262-264.
[9]晏建武,彭阿芳,罗亮等.热处理对Fe84Ga16合金薄膜中内应力的影响[J].金属热处理,2015(4):85-88.
[10]Nivedita L R,Kumar V V S,Asokan K,et al.Growth and magnetic properties of RF sputtered Fe-Ga thin films[J].Mat Res,2015,18(5):946-952.
[2]Olabi A G,Grunwald A.Design and application of magnetostrictive materials[J].Materials&Design,2008,29(2):469-483.
[3]Braghin F,Cinquemani S,Resta F.A model of magnetostrictive actuators for active vibration control[J].Sensors&Actuators A Physical,2011,165(2):342-350.
[4]谢海涛,斯永敏,杨德明,等.超磁致伸缩薄膜材料及其应用[J].中国有色金属学报,2000(S1):266-270.
[5]潘津,张晨曙,罗亮,等.磁控溅射制备Fe-Ga薄膜研究[J].热加工工艺,2013,42(16):123-125.
[6]Wa ng B W,Li S Y,Zhou Y,et al.Structure,magnetic properties and magnetostriction of Fe81Ga19 thin films[J].Journal of Magnetism&Magnetic Materials,2008,320(5):769-773.
[7]潘津.Fe-Ga合金和Fe-Ga薄膜的组织成分和性能研究[D].南昌:南昌航空大学,2013.
[8]Butera A,Gómez J,Barnard J A,et al.Magnetic anisotropy in Fe81Ga19/Mg O(100)films sputtered at different powers[J].Physica B Condensed Matter,2006,384(1):262-264.
[9]晏建武,彭阿芳,罗亮等.热处理对Fe84Ga16合金薄膜中内应力的影响[J].金属热处理,2015(4):85-88.
[10]Nivedita L R,Kumar V V S,Asokan K,et al.Growth and magnetic properties of RF sputtered Fe-Ga thin films[J].Mat Res,2015,18(5):946-952.