复杂金属表面二次电子发射能谱研究
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- 论文作者：曹猛 ; 翁明 ; 张秀生 ; 张娜 ; 王芳 ; 李永东
- 年：2016
- 作者机构：西安交通大学电子物理与器件教育部重点实验室;中国空间技术研究院西安分院空间微波技术重点实验室;
- 论文关键词：二次电子发射 ; 表面势垒 ; 表面吸附 ; 最可几能量 ; 能谱半峰宽
- 会议召开时间：2016-08-23
- 会议录名称：2016真空电子学分会第二十届学术年会论文集（下）
- 语种：中文
- 分类号：O462.2
- 学会代码：ZKDZ
- 会议名称：2016真空电子学分会第二十届学术年会
- 会议地点：中国福建厦门
- 主办单位：中国电子学会真空电子学分会、微波电真空器件国家级重点实验室
- 学会名称：中国电子学会真空电子学分会
- 页数：6
- 文件大小：596k
- 原文格式：D
- 会议级别：全国
摘要
分析了表面状态影响二次电子能谱的机制,通过引入等效表面势垒的方法考虑了这一影响的综合效果。结合内二次电子的产生和出射过程,提出了一种综合考虑表面状态影响的二次电子能谱模型,该模型通过表面势垒来描述表面状态对二次电子能谱的综合影响。针对3种不同表面状态的材料,对比分析了模型的计算结果和实验结果,发现吻合的很好。本文提出的简单模型可以描述表面状态影响二次电子能谱的综合效果。
引文
[1]Seiler H.Secondary electron emission in the scanning electron microscope[J].Journal of Applied Physics,1983,54(11):R1-R18.
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[10]Zhang HB,Hu XC,Wang R,et al.Note:Measuring effects of Ar-ion cleaning on the secondary electron yield of copper due to electron impact[J].Review of Scientific Instruments,2012,83(6):066105.
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[14]虞阳烨,曹猛,张海波.金属二次电子发射能谱的表面吸附势垒模型[J].西安交通大学学报.2015,49(10):97-102.
[15]张娜,曹猛,崔万照,张海波.高性能多功能超高真空金属二次电子发射特性测试平台[J].真空科学与技术学报,2014,34(05):554-558.
[16]CAO M,ZHANG N,HU T C,et al.Secondary electron emission from rough metal surfaces:a multi-generation model[J].J Phys D,2015,48(5):055501.
[17]HU X C,ZHANG H B,CAO M,et al.Heating-induced variations of secondary electron emission from ion-cleaned copper samples[J].Micron,2014,64(52):52-56.
[2]Reimer L.Image Formation in Low Voltage Scanning Electron Microscopy[M].Bellingham:SPIE,1993.
[3]Cazaux J.Material contrast in SEM:Fermi energy and work function effects[J].Ultramicroscopy,2010,110(3):242-253.
[4]Joy DC,Prasad MS,Meyer HM.Experimental secondary electron spectra under SEM conditions[J].Journal of Microscopy,2004,215:77—85.
[5]Cimino R,Collins IR.Vacuum chamber surface electronic properties influencing electron cloud phenomena[J].Applied Surface Science,2004,235(1-2):231-235.
[6]Kirby RE,King FK.Secondary electron emission yields from PEP-Ⅱaccelerator materials[J].Nuclear Instruments&Methods in Physics Research Section a-Accelerators Spectrometers Detectors and Associated Equipment,2001,469(1):1-12.
[7]Rumolo G,Arduini G,Metral E,et al.Dependence of the electron-cloud instability on the beam energy[J].Physical Review Letters,2008,100(14):144801.
[8]Zameroski ND,Kumar P,Watts C,et al.Secondary electron yield measurements from materials with application to collectors of high-power microwave devices[J].IEEE Transactions on Plasma Science,2006,34(3):642-651.
[9]Hoff BW,Mardahl PJ,Gilgenbach RM,et al.Microwave window breakdown experiments and simulations on the UM/L-3 relativistic magnetron[J].Review of Scientific Instruments,2009,80(9):094702.
[10]Zhang HB,Hu XC,Wang R,et al.Note:Measuring effects of Ar-ion cleaning on the secondary electron yield of copper due to electron impact[J].Review of Scientific Instruments,2012,83(6):066105.
[11]Zhang H-B,Hu X-C,Cao M,et al.The quantitative effect of thermal treatment on the secondary electron yield from air-exposed silver surface[J].Vacuum,2014,102:12-15.
[12]Bojko I,Hilleret N,Scheuerlein C.Influence of air exposures and thermal treatments on the secondary electron yield of copper[J].Journal of Vacuum Science and Technology A,2000,18(3):972-979.
[13]CHUNG M S,EVERHART T E.Simple Calculation of Energy Distribution of Low-Energy Secondary Electrons Emitted from Metals under Electron-Bombardment[J].J Appl Phys,1974,45(2):707
[14]虞阳烨,曹猛,张海波.金属二次电子发射能谱的表面吸附势垒模型[J].西安交通大学学报.2015,49(10):97-102.
[15]张娜,曹猛,崔万照,张海波.高性能多功能超高真空金属二次电子发射特性测试平台[J].真空科学与技术学报,2014,34(05):554-558.
[16]CAO M,ZHANG N,HU T C,et al.Secondary electron emission from rough metal surfaces:a multi-generation model[J].J Phys D,2015,48(5):055501.
[17]HU X C,ZHANG H B,CAO M,et al.Heating-induced variations of secondary electron emission from ion-cleaned copper samples[J].Micron,2014,64(52):52-56.