AlGaN/GaN异质结重构层结构及其性质的理论研究
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摘要
AlGaN/GaN由于其高电子迁移率而被广泛应用于高压、高能以及高温电子设备。AlGaN/GaN异质结界面常常生长在GaN晶体[001]方向并展现出高密度的二维电子气(2DEG)特性。以往研究认为AlGaN/GaN表面的捐赠态是2DEG的主要产生来源。2010年,Miao等人1,2依据电子计数规则(ECR)和化学组分匹配(OS)构建了8种不同的AlGaN/GaN(大约2层厚度)氧化重构结构解释了2DEG的现象来源。然而,对AlGaN异质结表/界面可能的微观结构以及2DEG具体产生的机制仍有待进一步地探索。本文利用粒子群(PSO)进化算法对AlGaN/GaN所有可能的氧化层结构进行了系统的结构搜索,搜索结果不仅很好地重现了以往的结构,还发现了一些能量更低更具有竞争力的结构。通过对这些新结构的电子结构计算,我们认为OS双层结构在能量上更具有竞争性,其表面捐赠态是AlGaN/GaN异质结形成2DEG的主要原因。
AlGaN/GaN and t transistor(HEMTs) have received intensive attention for their wide applications in high-voltage, high-power, and high-temperature microwave electron devices due to the associated high electron mobility. In this paper, we apply Particle Swarm Optimization(PSO) Algorithm to predict the possible surface reconstructions on realistic GaN and AlN [001] surfaces, which are invariably oxidized. All the structures proposed by previous reports were reproduced and a number of new stable surface reconstructions with lower formation energy were identified. Further electronic structure calculations reveal that the oxide-stoichiometry(OS)-matching bilayer structures have more advantages in energy compared to the electron counting(EC)-matching structures and are the main source of the two-dimensional electron gas(2DEG) at the AlGaN/GaN interface.
引文
[1]Miao,M.;Janotti,A.;Van de Walle,C.Physical Review B2009,80,155319
    [2]Miao,M.S.;Weber,J.R.;Van de Walle,C.G.J Appl Phys2010,107,123713.

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