取向硅钢细化磁畴技术专利分析
详细信息    查看官网全文
摘要
通过对细化磁畴技术在全球的专利申请情况进行分析,得出细化磁畴技术的发展特点、主要的研究区域、主要专利权人、各个主要企业的竞争力等信息,并且对各主要企业的研发方向进行简要阐述。
Through the analysis of the patent retrieval application situation of the refinement of magnetic domain technology in the global,we could come to conclusions,such as the development characteristics of the refining technology of magnetic domain,the main research fields and patentees,the competitive power of the main enterprises.At last,this article briefly expounded the research and development direction.
引文
[1]秦利波.激光刻痕降低取向硅钢铁损技术研究[D].沈阳:东北大学,2011.
    [2]何忠治,赵宇等.电工钢[M].北京:冶金工业出版社,2012.
    [3]朱业超,王良芳等.表面处理细化取向硅钢磁畴的方法与机理[J].钢铁研究,2006,34(6):50.
    [4]Hideo Mat suoka,Osamu Honjo.Current Status and Future Prospects for Elect Rical Steels[J].Soft and Hard Magnetic Materials With Applications,2000(2):126.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700